Shinya Nishimoto

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,427,909
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment device and optical monitor device
- Patent number 8,974,628
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- G01 - MEASURING TESTING
Information Patent Grant
Temperature adjusting mechanism and semiconductor manufacturing app...
- Patent number 8,968,512
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus
- Patent number 8,485,127
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing apparatus and method of supplying micro...
- Patent number 8,327,795
- Issue date Dec 11, 2012
- Tokyo Electron Limited
- Shinya Nishimoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,267,040
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Kiyotaka Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and method for producing cool...
- Patent number 8,242,405
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Shinya Nishimoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave plasma processing apparatus and method of supplying micro...
- Patent number 8,171,880
- Issue date May 8, 2012
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 8,057,600
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,811,428
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 7,663,860
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate with dep...
- Patent number 7,566,379
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 7,282,112
- Issue date Oct 16, 2007
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,163,585
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate with dep...
- Patent number 7,147,749
- Issue date Dec 12, 2006
- Tokyo Electron Limited
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 6,837,966
- Issue date Jan 4, 2005
- Tokyo Electron Limeted
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 6,798,519
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180251895
- Publication date Sep 6, 2018
- Shinya NISHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE
- Publication number 20130180660
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND MECHANIS...
- Publication number 20110168673
- Publication date Jul 14, 2011
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD FOR PRODUCING COOL...
- Publication number 20110121058
- Publication date May 26, 2011
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Temperature adjusting mechanism and semiconductor manufacturing App...
- Publication number 20110108195
- Publication date May 12, 2011
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE AND PLASMA PROCESSING DEVICE USING THE SAME
- Publication number 20110011341
- Publication date Jan 20, 2011
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD OF SUPPLYING MICRO...
- Publication number 20090317566
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- Shinya NISHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD OF SUPPLYING MICRO...
- Publication number 20090314629
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- Shinya NISHIMOTO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20090301656
- Publication date Dec 10, 2009
- TOKYO ELECTRON LIMITED
- Shinya NISHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090194238
- Publication date Aug 6, 2009
- TOKYO ELECTRON LIMITED
- Kiyotaka Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20090133835
- Publication date May 28, 2009
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20070264441
- Publication date Nov 15, 2007
- TOKYO ELECTRON LIMITED
- Kiyotaka Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...
- Publication number 20070204794
- Publication date Sep 6, 2007
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20070102287
- Publication date May 10, 2007
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved upper electrode plate with dep...
- Publication number 20070034337
- Publication date Feb 15, 2007
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck
- Publication number 20050207088
- Publication date Sep 22, 2005
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved baffle plate in a plasma proce...
- Publication number 20050103268
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus
- Publication number 20050042881
- Publication date Feb 24, 2005
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved optical window deposition shie...
- Publication number 20040173155
- Publication date Sep 9, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved upper electrode plate with dep...
- Publication number 20040060661
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20040060516
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved baffle plate in a plasma proce...
- Publication number 20040060658
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS

Shinya Nishimoto

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma treatment device and optical monitor device

Temperature adjusting mechanism and semiconductor manufacturing app...

Processing apparatus

Microwave plasma processing apparatus and method of supplying micro...

Plasma processing apparatus and plasma processing method

Microwave plasma processing apparatus and method for producing cool...

Microwave plasma processing apparatus and method of supplying micro...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved optical window deposition shie...

Electrostatic chuck

Method and apparatus for an improved upper electrode plate with dep...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved upper electrode plate with dep...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved optical window deposition shie...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND MECHANIS...

MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD FOR PRODUCING COOL...

Temperature adjusting mechanism and semiconductor manufacturing App...

SHOWER PLATE AND PLASMA PROCESSING DEVICE USING THE SAME

MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD OF SUPPLYING MICRO...

MICROWAVE PLASMA PROCESSING APPARATUS AND METHOD OF SUPPLYING MICRO...

MICROWAVE PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PROCESSING APPARATUS

Plasma Processing Apparatus and Plasma Processing Method

METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

Method and apparatus for an improved upper electrode plate with dep...

Electrostatic chuck

Method and apparatus for an improved baffle plate in a plasma proce...

Processing apparatus

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved upper electrode plate with dep...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

Method and apparatus for an improved baffle plate in a plasma proce...