Shishi Jiang

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flowable film curing using H2 plasma
- Patent number 12,054,827
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Shishi Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable film formation and treatments
- Patent number 11,615,966
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low deposition rates for flowable PECVD
- Patent number 11,578,409
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Shishi Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D NAND etch
- Patent number 11,515,170
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition using enhanced diffusion process
- Patent number 11,227,797
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for manufacturing semiconductor structures us...
- Patent number 11,177,128
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gapfill using reactive anneal
- Patent number 11,011,384
- Issue date May 18, 2021
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND etch
- Patent number 10,886,140
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled growth of thin silicon oxide film at low temperature
- Patent number 10,818,490
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming tungsten pillars
- Patent number 10,784,107
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively deposited parylene masks and methods related thereto
- Patent number 10,714,339
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-step process for gapfilling high aspect ratio trenches with amo...
- Patent number 10,699,903
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface modification to improve amorphous silicon gapfill
- Patent number 10,643,841
- Issue date May 5, 2020
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seam healing using high pressure anneal
- Patent number 10,636,669
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Two-step process for silicon gapfill
- Patent number 10,580,642
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Abhijit Basu Mallick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seamless tungsten fill by tungsten oxidation-reduction
- Patent number 10,559,497
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry stripping of boron carbide hardmask
- Patent number 10,529,585
- Issue date Jan 7, 2020
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface modification to improve amorphous silicon gapfill
- Patent number 10,483,102
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Two-step process for gapfilling high aspect ratio trenches with amo...
- Patent number 10,460,933
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLOWABLE FILM FORMATION AND TREATMENTS
- Publication number 20220020594
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL HERMETIC FILM DEPOSITION BY CVD
- Publication number 20210210339
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D NAND Etch
- Publication number 20210118691
- Publication date Apr 22, 2021
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWABLE FILM CURING USING H2 PLASMA
- Publication number 20210025058
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Shishi JIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20210013038
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR MANUFACTURING SEMICONDUCTOR STRUCTURES US...
- Publication number 20200388486
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DEPOSITION RATES FOR FLOWABLE PECVD
- Publication number 20200385865
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Shishi Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION USING ENHANCED DIFFUSION PROCESS
- Publication number 20200161178
- Publication date May 21, 2020
- Applied Materials, Inc.
- Shishi JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFICATION TO IMPROVE AMORPHOUS SILICON GAPFILL
- Publication number 20200075329
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Pramit MANNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TWO-STEP PROCESS FOR GAPFILLING HIGH ASPECT RATIO TRENCHES WITH AMO...
- Publication number 20200051815
- Publication date Feb 13, 2020
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D NAND Etch
- Publication number 20200035505
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon Gapfill Films
- Publication number 20190393030
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Shishi Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON FILM GAPFILL FOR PATTERNING APPLICATION
- Publication number 20190237325
- Publication date Aug 1, 2019
- Applied Materials, Inc.
- Fei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM HEALING USING HIGH PRESSURE ANNEAL
- Publication number 20190228982
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVELY DEPOSITED PARYLENE MASKS AND METHODS RELATED THERETO
- Publication number 20190221422
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Fei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED GROWTH OF THIN SILICON OXIDE FILM AT LOW TEMPERATURE
- Publication number 20190189435
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Shishi JIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Seamless Tungsten Fill By Tungsten Oxidation-Reduction
- Publication number 20180358264
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUALITY IMPROVEMENT OF FILMS DEPOSITED ON A SUBSTRATE
- Publication number 20180350563
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY STRIPPING OF BORON CARBIDE HARDMASK
- Publication number 20180350621
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20180323068
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gapfill Using Reactive Anneal
- Publication number 20180294166
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFICATION TO IMPROVE AMORPHOUS SILICON GAPFILL
- Publication number 20180294154
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TWO-STEP PROCESS FOR GAPFILLING HIGH ASPECT RATIO TRENCHES WITH AMO...
- Publication number 20180286674
- Publication date Oct 4, 2018
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Two-Step Process for Silicon Gapfill
- Publication number 20180286669
- Publication date Oct 4, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shishi Jiang

Person

Patents Grantslast 30 patents

Flowable film curing using H2 plasma

Flowable film formation and treatments

Low deposition rates for flowable PECVD

3D NAND etch

Film deposition using enhanced diffusion process

Apparatus and methods for manufacturing semiconductor structures us...

Gapfill using reactive anneal

3D NAND etch

Controlled growth of thin silicon oxide film at low temperature

Methods of forming tungsten pillars

Selectively deposited parylene masks and methods related thereto

Two-step process for gapfilling high aspect ratio trenches with amo...

Surface modification to improve amorphous silicon gapfill

Seam healing using high pressure anneal

Two-step process for silicon gapfill

Seamless tungsten fill by tungsten oxidation-reduction

Dry stripping of boron carbide hardmask

Surface modification to improve amorphous silicon gapfill

Two-step process for gapfilling high aspect ratio trenches with amo...

Patents Applicationslast 30 patents

FLOWABLE FILM FORMATION AND TREATMENTS

CONFORMAL HERMETIC FILM DEPOSITION BY CVD

3D NAND Etch

FLOWABLE FILM CURING USING H2 PLASMA

Methods of Forming Tungsten Pillars

APPARATUS AND METHODS FOR MANUFACTURING SEMICONDUCTOR STRUCTURES US...

LOW DEPOSITION RATES FOR FLOWABLE PECVD

FILM DEPOSITION USING ENHANCED DIFFUSION PROCESS

SURFACE MODIFICATION TO IMPROVE AMORPHOUS SILICON GAPFILL

TWO-STEP PROCESS FOR GAPFILLING HIGH ASPECT RATIO TRENCHES WITH AMO...

3D NAND Etch

Carbon Gapfill Films

CARBON FILM GAPFILL FOR PATTERNING APPLICATION

SEAM HEALING USING HIGH PRESSURE ANNEAL

SELECTIVELY DEPOSITED PARYLENE MASKS AND METHODS RELATED THERETO

CONTROLLED GROWTH OF THIN SILICON OXIDE FILM AT LOW TEMPERATURE

Seamless Tungsten Fill By Tungsten Oxidation-Reduction

QUALITY IMPROVEMENT OF FILMS DEPOSITED ON A SUBSTRATE

DRY STRIPPING OF BORON CARBIDE HARDMASK

Methods of Forming Tungsten Pillars

Gapfill Using Reactive Anneal

SURFACE MODIFICATION TO IMPROVE AMORPHOUS SILICON GAPFILL

TWO-STEP PROCESS FOR GAPFILLING HIGH ASPECT RATIO TRENCHES WITH AMO...

Two-Step Process for Silicon Gapfill