Shoji Ikuhara

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 10,262,840
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 9,230,782
- Issue date Jan 5, 2016
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 8,992,721
- Issue date Mar 31, 2015
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,900,401
- Issue date Dec 2, 2014
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching process state judgment method and system therefor
- Patent number 8,282,849
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- G01 - MEASURING TESTING
Information Patent Grant
Etching endpoint determination method
- Patent number 8,083,960
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Hiroshige Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,038,896
- Issue date Oct 18, 2011
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,376,479
- Issue date May 20, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
System for monitoring and controlling a semiconductor manufacturing...
- Patent number 7,343,217
- Issue date Mar 11, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Etching apparatus, method for measuring self-bias voltage, and meth...
- Patent number 7,330,346
- Issue date Feb 12, 2008
- Hitachi High-Technologies Corporation
- Shoji Ikuhara
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,158,848
- Issue date Jan 2, 2007
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for controlling semiconductor processing apparatus
- Patent number 7,107,115
- Issue date Sep 12, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance method and system for plasma processing apparatus
- Patent number 7,062,347
- Issue date Jun 13, 2006
- Hitachi, Ltd.
- Hideyuki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of monitoring and/or controlling a semiconductor manufacturi...
- Patent number 7,058,470
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,058,467
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for controlling semiconductor processing apparatus
- Patent number 7,010,374
- Issue date Mar 7, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating method of vacuum processing system and vacuum processing...
- Patent number 6,941,185
- Issue date Sep 6, 2005
- Hitachi, Ltd.
- Kouji Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 6,939,435
- Issue date Sep 6, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample processing apparatus and sample processing system
- Patent number 6,939,433
- Issue date Sep 6, 2005
- Hitachi High-Technologies Corporation
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,908,529
- Issue date Jun 21, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating method of vacuum processing system and vacuum processing...
- Patent number 6,885,906
- Issue date Apr 26, 2005
- Hitachi, Ltd.
- Kouji Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing method
- Patent number 6,881,352
- Issue date Apr 19, 2005
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 6,879,867
- Issue date Apr 12, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Operating method of vacuum processing system and vacuum processing...
- Patent number 6,853,872
- Issue date Feb 8, 2005
- Hitachi, Ltd.
- Kouji Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for adjusting plasma processing through...
- Patent number 6,841,032
- Issue date Jan 11, 2005
- Hitachi High-Technologies Corporation
- Shoji Ikuhara
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor plasma processing apparatus with first and second pro...
- Patent number 6,828,165
- Issue date Dec 7, 2004
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Data processing apparatus for semiconductor processing apparatus
- Patent number 6,776,872
- Issue date Aug 17, 2004
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance method and system for plasma processing apparatus etchi...
- Patent number 6,745,096
- Issue date Jun 1, 2004
- Hitachi, Ltd.
- Hideyuki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 6,733,618
- Issue date May 11, 2004
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20150020970
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Eiji IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140277626
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Apparatus
- Publication number 20120085494
- Publication date Apr 12, 2012
- Hiroshige Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110083808
- Publication date Apr 14, 2011
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma Processing Method
- Publication number 20100297783
- Publication date Nov 25, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100288195
- Publication date Nov 18, 2010
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100132888
- Publication date Jun 3, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching process state judgment method and system therefor
- Publication number 20090253222
- Publication date Oct 8, 2009
- Toshihiro Morisawa
- G01 - MEASURING TESTING
Information Patent Application
ETCHING ENDPOINT DETERMINATION METHOD
- Publication number 20090211706
- Publication date Aug 27, 2009
- Hitachi High-Technologies Corporation
- Hiroshige Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...
- Publication number 20090120580
- Publication date May 14, 2009
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing method and apparatus
- Publication number 20070281478
- Publication date Dec 6, 2007
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Etching apparatus, method for measuring self-bias voltage, and meth...
- Publication number 20070217118
- Publication date Sep 20, 2007
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20070193687
- Publication date Aug 23, 2007
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20070162172
- Publication date Jul 12, 2007
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus
- Publication number 20060260746
- Publication date Nov 23, 2006
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20060212156
- Publication date Sep 21, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Data processing apparatus for semiconductor processing apparatus
- Publication number 20060199288
- Publication date Sep 7, 2006
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20060142888
- Publication date Jun 29, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20060124243
- Publication date Jun 15, 2006
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for controlling semiconductor processing apparatus
- Publication number 20060129264
- Publication date Jun 15, 2006
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20050284574
- Publication date Dec 29, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus and method for assisting moni...
- Publication number 20050217794
- Publication date Oct 6, 2005
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20050189070
- Publication date Sep 1, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050189320
- Publication date Sep 1, 2005
- Tomoyoshi Ichimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Remote diagnostic system for facilities and remote diagnostic method
- Publication number 20050108577
- Publication date May 19, 2005
- Kouji Nishihata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20050090914
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20050087298
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20050022932
- Publication date Feb 3, 2005
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Data processing apparatus for semiconductor processing apparatus
- Publication number 20040177924
- Publication date Sep 16, 2004
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20040173311
- Publication date Sep 9, 2004
- Tomoyoshi Ichimaru
- H01 - BASIC ELECTRIC ELEMENTS

Shoji Ikuhara

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing method and apparatus

Plasma processing apparatus

Plasma processing method and apparatus

Etching process state judgment method and system therefor

Etching endpoint determination method

Plasma processing method and apparatus

Disturbance-free, recipe-controlled plasma processing system and me...

Process monitoring device for sample processing apparatus and contr...

System for monitoring and controlling a semiconductor manufacturing...

Etching apparatus, method for measuring self-bias voltage, and meth...

Process monitoring device for sample processing apparatus and contr...

Method for controlling semiconductor processing apparatus

Maintenance method and system for plasma processing apparatus

Method of monitoring and/or controlling a semiconductor manufacturi...

Process monitoring device for sample processing apparatus and contr...

Method for controlling semiconductor processing apparatus

Operating method of vacuum processing system and vacuum processing...

Plasma processing apparatus and processing method

Sample processing apparatus and sample processing system

Plasma processing apparatus and method

Operating method of vacuum processing system and vacuum processing...

Disturbance-free, recipe-controlled plasma processing method

Process monitoring device for sample processing apparatus and contr...

Operating method of vacuum processing system and vacuum processing...

Plasma processing apparatus for adjusting plasma processing through...

Semiconductor plasma processing apparatus with first and second pro...

Data processing apparatus for semiconductor processing apparatus

Maintenance method and system for plasma processing apparatus etchi...

Disturbance-free, recipe-controlled plasma processing system and me...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS

Plasma Etching Apparatus

PLASMA PROCESSING APPARATUS

Plasma Processing Method

PLASMA PROCESSING METHOD AND APPARATUS

Plasma Processing Apparatus

Etching process state judgment method and system therefor

ETCHING ENDPOINT DETERMINATION METHOD

Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...

Plasma processing method and apparatus

Etching apparatus, method for measuring self-bias voltage, and meth...

Disturbance-free, recipe-controlled plasma processing system and me...

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus

Method of monitoring and/or controlling a semiconductor manufacturi...

Data processing apparatus for semiconductor processing apparatus

Process monitoring device for sample processing apparatus and contr...

Disturbance-free, recipe-controlled plasma processing system and me...

Method for controlling semiconductor processing apparatus

Plasma processing apparatus and processing method

Semiconductor manufacturing apparatus and method for assisting moni...

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

Plasma processing method

Remote diagnostic system for facilities and remote diagnostic method

Process monitoring device for sample processing apparatus and contr...

Method of monitoring and/or controlling a semiconductor manufacturi...

Disturbance-free, recipe-controlled plasma processing system and me...

Data processing apparatus for semiconductor processing apparatus

Plasma processing apparatus and method