Shuang Meng

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,935,756
- Issue date Mar 19, 2024
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,335,563
- Issue date May 17, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,607,844
- Issue date Mar 31, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,096,483
- Issue date Oct 9, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,761,457
- Issue date Sep 12, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,305,782
- Issue date Apr 5, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 8,852,851
- Issue date Oct 7, 2014
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor with reduced depletion field width
- Patent number 8,816,447
- Issue date Aug 26, 2014
- Round Rock Research, LLC
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High dielectric constant transition metal oxide materials
- Patent number 8,791,519
- Issue date Jul 29, 2014
- Micron Technology, Inc.
- Jiutao Li
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Integrated circuit having pitch reduced patterns relative to photoi...
- Patent number 8,598,632
- Issue date Dec 3, 2013
- Round Rock Research LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor with reduced depletion field width
- Patent number 8,362,576
- Issue date Jan 29, 2013
- Round Rock Research, LLC
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insitu post atomic layer deposition destruction of active species
- Patent number 8,257,497
- Issue date Sep 4, 2012
- Micron Technology, Inc.
- Demetrius Sarigiannis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,207,576
- Issue date Jun 26, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple deposition for integration of spacers in pitch multiplicat...
- Patent number 8,123,968
- Issue date Feb 28, 2012
- Round Rock Research, LLC
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,119,535
- Issue date Feb 21, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,048,812
- Issue date Nov 1, 2011
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple deposition for integration of spacers in pitch multiplicat...
- Patent number 7,884,022
- Issue date Feb 8, 2011
- Round Rock Research, LLC
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced atomic layer deposition
- Patent number 7,872,291
- Issue date Jan 18, 2011
- Round Rock Research, LLC
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition method of depositing an oxide on a substrate
- Patent number 7,838,084
- Issue date Nov 23, 2010
- Micron Technology, Inc.
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High dielectric constant transition metal oxide materials
- Patent number 7,723,767
- Issue date May 25, 2010
- Micron Technology, Inc.
- Jiutao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 7,718,540
- Issue date May 18, 2010
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 7,651,951
- Issue date Jan 26, 2010
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition method of depositing an oxide on a substrate
- Patent number 7,431,966
- Issue date Oct 7, 2008
- Micron Technology, Inc.
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of fabricating interconnects for semiconductor components
- Patent number 7,410,898
- Issue date Aug 12, 2008
- Micron Technology, Inc.
- Kyle K. Kirby
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple deposition for integration of spacers in pitch multiplicat...
- Patent number 7,390,746
- Issue date Jun 24, 2008
- Micron Technology, Inc.
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition method of forming an oxide comprising layer...
- Patent number 7,329,615
- Issue date Feb 12, 2008
- Micron Technology, Inc.
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for depositing material onto microfeature workp...
- Patent number 7,282,239
- Issue date Oct 16, 2007
- Micron Technology, Inc.
- Demetrius Sarigiannis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced atomic layer deposition
- Patent number 7,279,732
- Issue date Oct 9, 2007
- Micron Technology, Inc.
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 7,253,118
- Issue date Aug 7, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating interconnects including depositing a first m...
- Patent number 7,189,642
- Issue date Mar 13, 2007
- Micron Technology, Inc.
- Kyle K. Kirby
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20220254644
- Publication date Aug 11, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20200203171
- Publication date Jun 25, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20180286693
- Publication date Oct 4, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20170372913
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20160203993
- Publication date Jul 14, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20150021744
- Publication date Jan 22, 2015
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DIELECTRIC CONSTANT TRANSITION METAL OXIDE MATERIALS
- Publication number 20150001673
- Publication date Jan 1, 2015
- Micron Technology, Inc.
- Jiutao Li
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
TRANSISTOR WITH REDUCED DEPLETION FIELD WIDTH
- Publication number 20130140646
- Publication date Jun 6, 2013
- ROUND ROCK RESEARCH, LLC
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...
- Publication number 20120256309
- Publication date Oct 11, 2012
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...
- Publication number 20110117743
- Publication date May 19, 2011
- ROUND ROCK RESEARCH, LLC
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20110108929
- Publication date May 12, 2011
- ROUND ROCK RESEARCH, LLC
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DIELECTRIC CONSTANT TRANSITION METAL OXIDE MATERIALS
- Publication number 20100213574
- Publication date Aug 26, 2010
- Micron Technology, Inc.
- Jiutao Li
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100210111
- Publication date Aug 19, 2010
- ROUND ROCK RESEARCH, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100092891
- Publication date Apr 15, 2010
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20080251828
- Publication date Oct 16, 2008
- Micron Technology, Inc.
- Shuang Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...
- Publication number 20080149593
- Publication date Jun 26, 2008
- Micron Technology, Inc.
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING MATERIAL ONTO MICROFEATURE WORKP...
- Publication number 20080029028
- Publication date Feb 7, 2008
- Micron Technology, Inc.
- Demetrius Sarigiannis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pitch reduction technology using alternating spacer depositions dur...
- Publication number 20080008969
- Publication date Jan 10, 2008
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070161251
- Publication date Jul 12, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070138526
- Publication date Jun 21, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating interconnects for semiconductor components
- Publication number 20070141835
- Publication date Jun 21, 2007
- Kyle K. Kirby
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070128856
- Publication date Jun 7, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...
- Publication number 20070117310
- Publication date May 24, 2007
- Micron Technology, Inc.
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple deposition for integration of spacers in pitch multiplicat...
- Publication number 20070049040
- Publication date Mar 1, 2007
- MICRON TECHNOLOGY, INC., a Corporation
- Jingyi Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High dielectric constant transition metal oxide materials
- Publication number 20060267066
- Publication date Nov 30, 2006
- Jiutao Li
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Atomic layer deposition method of depositing an oxide on a substrate
- Publication number 20060257584
- Publication date Nov 16, 2006
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pitch reduced patterns relative to photolithography features
- Publication number 20060211260
- Publication date Sep 21, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High dielectric constant transition metal oxide materials
- Publication number 20060051978
- Publication date Mar 9, 2006
- Jiutao Li
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Atomic layer deposition method of forming an oxide comprising layer...
- Publication number 20060029737
- Publication date Feb 9, 2006
- Micron Technology, Inc.
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic layer deposition method of forming an oxide comprising layer...
- Publication number 20060003102
- Publication date Jan 5, 2006
- Garo J. Derderian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shuang Meng

Person

Patents Grantslast 30 patents

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Transistor with reduced depletion field width

High dielectric constant transition metal oxide materials

Integrated circuit having pitch reduced patterns relative to photoi...

Transistor with reduced depletion field width

Insitu post atomic layer deposition destruction of active species

Pitch reduced patterns relative to photolithography features

Multiple deposition for integration of spacers in pitch multiplicat...

Pitch reduced patterns relative to photolithography features

Pitch reduced patterns relative to photolithography features

Multiple deposition for integration of spacers in pitch multiplicat...

Enhanced atomic layer deposition

Atomic layer deposition method of depositing an oxide on a substrate

High dielectric constant transition metal oxide materials

Pitch reduced patterns relative to photolithography features

Pitch reduced patterns relative to photolithography features

Atomic layer deposition method of depositing an oxide on a substrate

Methods of fabricating interconnects for semiconductor components

Multiple deposition for integration of spacers in pitch multiplicat...

Atomic layer deposition method of forming an oxide comprising layer...

Systems and methods for depositing material onto microfeature workp...

Enhanced atomic layer deposition

Pitch reduced patterns relative to photolithography features

Methods of fabricating interconnects including depositing a first m...

Patents Applicationslast 30 patents

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

HIGH DIELECTRIC CONSTANT TRANSITION METAL OXIDE MATERIALS

TRANSISTOR WITH REDUCED DEPLETION FIELD WIDTH

Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...

MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...

ENHANCED ATOMIC LAYER DEPOSITION

HIGH DIELECTRIC CONSTANT TRANSITION METAL OXIDE MATERIALS

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

ENHANCED ATOMIC LAYER DEPOSITION

MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...

SYSTEMS AND METHODS FOR DEPOSITING MATERIAL ONTO MICROFEATURE WORKP...

Pitch reduction technology using alternating spacer depositions dur...

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

Methods of fabricating interconnects for semiconductor components

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICAT...

Multiple deposition for integration of spacers in pitch multiplicat...

High dielectric constant transition metal oxide materials

Atomic layer deposition method of depositing an oxide on a substrate

Pitch reduced patterns relative to photolithography features

High dielectric constant transition metal oxide materials

Atomic layer deposition method of forming an oxide comprising layer...

Atomic layer deposition method of forming an oxide comprising layer...