Shuhei YAMAGUCHI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Recording apparatus
- Patent number 12,208,629
- Issue date Jan 28, 2025
- Canon Kabushiki Kaisha
- Taiji Maruyama
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Connector assembly
- Patent number 11,146,004
- Issue date Oct 12, 2021
- Japan Aviation Electronics Industry, Ltd.
- Shuhei Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Long film, long polarizing plate, liquid crystal display device, an...
- Patent number 10,934,414
- Issue date Mar 2, 2021
- FUJIFILM Corporation
- Yoshinori Maeda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,545,405
- Issue date Jan 28, 2020
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,526,266
- Issue date Jan 7, 2020
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,324,374
- Issue date Jun 18, 2019
- Fujifilm Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 10,248,019
- Issue date Apr 2, 2019
- FUJIFILM Corporation
- Shohei Kataoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,120,281
- Issue date Nov 6, 2018
- FUJIFILM Corporation
- Koutarou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,101,656
- Issue date Oct 16, 2018
- FUJIFILM Corporation
- Shuhei Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,011,576
- Issue date Jul 3, 2018
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Connector
- Patent number 9,985,371
- Issue date May 29, 2018
- Japan Aviation Electronics Industry, Limited
- Kenta Ashibu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,904,168
- Issue date Feb 27, 2018
- Fujifilm Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, resist film using same, resist-coated mask blank...
- Patent number 9,798,234
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,632,410
- Issue date Apr 25, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,551,928
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,482,947
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,423,689
- Issue date Aug 23, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Route creation device
- Patent number 9,417,083
- Issue date Aug 16, 2016
- Mitsubishi Electric Corporation
- Shuhei Yamaguchi
- G01 - MEASURING TESTING
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,383,645
- Issue date Jul 5, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...
- Patent number 9,316,910
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,244,344
- Issue date Jan 26, 2016
- FUJIFILM Corporation
- Kosuke Koshijima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,235,117
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Junichi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,213,237
- Issue date Dec 15, 2015
- FUJIFILM Corporation
- Junichi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,152,049
- Issue date Oct 6, 2015
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,120,288
- Issue date Sep 1, 2015
- FUJIFILM Corporation
- Hidenori Takahashi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,081,277
- Issue date Jul 14, 2015
- FUJIFILM Corporation
- Tomoki Matsuda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 9,046,773
- Issue date Jun 2, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,034,558
- Issue date May 19, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, compound and...
- Patent number 9,023,579
- Issue date May 5, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...
- Patent number 8,940,476
- Issue date Jan 27, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SURFACE-EMITTING LASER, LIGHT SOURCE DEVICE, AND ELECTRONIC DEVICE
- Publication number 20250167514
- Publication date May 22, 2025
- SONY GROUP CORPORATION
- Shuhei YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE EMITTING LASER, SURFACE EMITTING LASER ARRAY, AND LIGHT SOU...
- Publication number 20250096527
- Publication date Mar 20, 2025
- SONY GROUP CORPORATION
- Shuhei YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRINTING APPARATUS
- Publication number 20250065636
- Publication date Feb 27, 2025
- Canon Kabushiki Kaisha
- YUKIMICHI KIMURA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
CARTRIDGE, CARTRIDGE SET, AND LIQUID EJECTION APPARATUS
- Publication number 20250065637
- Publication date Feb 27, 2025
- Canon Kabushiki Kaisha
- HIROSHI KOSHIKAWA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RECORDING APPARATUS
- Publication number 20250033391
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- SHUHEI YAMAGUCHI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LIQUID DISCHARGE APPARATUS AND CONTROL METHOD
- Publication number 20250033394
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- ATSUSHI KOHNOTOH
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RECORDING APPARATUS
- Publication number 20250023994
- Publication date Jan 16, 2025
- Canon Kabushiki Kaisha
- TOSHIYA MATSUMOTO
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
CARTRIDGE SET, AND PRINTING APPARATUS
- Publication number 20250018723
- Publication date Jan 16, 2025
- Canon Kabushiki Kaisha
- KYOHEI SATO
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250004377
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240241443
- Publication date Jul 18, 2024
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240241444
- Publication date Jul 18, 2024
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240210826
- Publication date Jun 27, 2024
- FUJIFILM CORPORATION
- Taro MIYOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE EMITTING LASER
- Publication number 20240128721
- Publication date Apr 18, 2024
- SONY GROUP CORPORATION
- SHUHEI YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE EMITTING LASER AND SURFACE EMITTING LASER ARRAY
- Publication number 20240022040
- Publication date Jan 18, 2024
- SONY GROUP CORPORATION
- RINTARO KODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE RECORDING APPARATUS
- Publication number 20230415504
- Publication date Dec 28, 2023
- Canon Kabushiki Kaisha
- Takashi Abe
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230408920
- Publication date Dec 21, 2023
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230393473
- Publication date Dec 7, 2023
- FUJIFILM CORPORATION
- Taro MIYOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230393472
- Publication date Dec 7, 2023
- FUJIFILM CORPORATION
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230384674
- Publication date Nov 30, 2023
- FUJIFILM CORPORATION
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINTING APPARATUS
- Publication number 20230322004
- Publication date Oct 12, 2023
- Canon Kabushiki Kaisha
- KOUSUKE TANAKA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20230123203
- Publication date Apr 20, 2023
- FUJIFILM CORPORATION
- Taro MIYOSHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230120139
- Publication date Apr 20, 2023
- FUJIFILM CORPORATION
- Taro MIYOSHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RECORDING APPARATUS
- Publication number 20230115030
- Publication date Apr 13, 2023
- Canon Kabushiki Kaisha
- Taiji Maruyama
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD FOR PRODUCING RESIN, METHOD FOR PRODUCING ACTINIC RAY-SENSIT...
- Publication number 20220382151
- Publication date Dec 1, 2022
- FUJIFILM CORPORATION
- Tomoaki YOSHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONNECTOR ASSEMBLY
- Publication number 20210005991
- Publication date Jan 7, 2021
- Japan Aviation Electronics Industry, Ltd.
- Shuhei YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LONG FILM, LONG POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AN...
- Publication number 20190062526
- Publication date Feb 28, 2019
- FUJIFILM CORPORATION
- Yoshinori MAEDA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20170351176
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20170168395
- Publication date Jun 15, 2017
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...
- Publication number 20160327862
- Publication date Nov 10, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160320700
- Publication date Nov 3, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Shuhei YAMAGUCHI

Person

Patents Grantslast 30 patents

Recording apparatus

Connector assembly

Long film, long polarizing plate, liquid crystal display device, an...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Active light sensitive or radiation sensitive resin composition, ac...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Active light sensitive or radiation sensitive resin composition, ac...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Connector

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Resin composition, resist film using same, resist-coated mask blank...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Route creation device

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic-ray- or radiation-sensitive resin composition, compound and...

Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...

Patents Applicationslast 30 patents

SURFACE-EMITTING LASER, LIGHT SOURCE DEVICE, AND ELECTRONIC DEVICE

SURFACE EMITTING LASER, SURFACE EMITTING LASER ARRAY, AND LIGHT SOU...

PRINTING APPARATUS

CARTRIDGE, CARTRIDGE SET, AND LIQUID EJECTION APPARATUS

RECORDING APPARATUS

LIQUID DISCHARGE APPARATUS AND CONTROL METHOD

RECORDING APPARATUS

CARTRIDGE SET, AND PRINTING APPARATUS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

SURFACE EMITTING LASER

SURFACE EMITTING LASER AND SURFACE EMITTING LASER ARRAY

IMAGE RECORDING APPARATUS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PRINTING APPARATUS

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RECORDING APPARATUS

METHOD FOR PRODUCING RESIN, METHOD FOR PRODUCING ACTINIC RAY-SENSIT...

CONNECTOR ASSEMBLY

LONG FILM, LONG POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AN...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...