Shuichi Ishizuka

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Process for the production of semiconductor device
- Patent number 6,727,182
- Issue date Apr 27, 2004
- Tokyo Electron Limited
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device having a fluorine c...
- Patent number 6,537,904
- Issue date Mar 25, 2003
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning plasma treatment device and plasma treatment sy...
- Patent number 6,443,165
- Issue date Sep 3, 2002
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing insulator film
- Patent number 6,419,985
- Issue date Jul 16, 2002
- Tokyo Electron Ltd.
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film forming method and plasma film forming apparatus
- Patent number 6,355,902
- Issue date Mar 12, 2002
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma film forming method and plasma film forming apparatus
- Patent number 6,215,087
- Issue date Apr 10, 2001
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating device
- Patent number 6,087,614
- Issue date Jul 11, 2000
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film forming method and apparatus and plasma processing appa...
- Patent number 5,531,834
- Issue date Jul 2, 1996
- Tokyo Electron Kabushiki Kaisha
- Shuichi Ishizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus using vertical gas inlets one on top of...
- Patent number 5,522,934
- Issue date Jun 4, 1996
- Tokyo Electron Limited
- Akira Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus and method therefor
- Patent number 5,476,182
- Issue date Dec 19, 1995
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma film forming method and plasma film forming apparatus
- Publication number 20010020608
- Publication date Sep 13, 2001
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICE
- Publication number 20010001741
- Publication date May 24, 2001
- TAKASHI AKAHORI
- H01 - BASIC ELECTRIC ELEMENTS

Shuichi Ishizuka

Person

Patents Grantslast 30 patents

Process for the production of semiconductor device

Method for manufacturing a semiconductor device having a fluorine c...

Method for cleaning plasma treatment device and plasma treatment sy...

Method for producing insulator film

Plasma film forming method and plasma film forming apparatus

Plasma film forming method and plasma film forming apparatus

Plasma treating device

Plasma film forming method and apparatus and plasma processing appa...

Plasma processing apparatus using vertical gas inlets one on top of...

Etching apparatus and method therefor

Patents Applicationslast 30 patents

Plasma film forming method and plasma film forming apparatus

PROCESS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICE