Shulin Wang

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for forming a high quality low temperature sil...
- Patent number 7,972,663
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten nitride atomic layer deposition processes
- Patent number 7,745,329
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution assembly for use in a semiconductor work piece pro...
- Patent number 7,658,800
- Issue date Feb 9, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate electrode dopant activation method for semiconductor manufactu...
- Patent number 7,611,976
- Issue date Nov 3, 2009
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten nitride atomic layer deposition processes
- Patent number 7,429,516
- Issue date Sep 30, 2008
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for silicon nitride chemical vapor deposition
- Patent number 7,365,029
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 7,335,266
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of nano-crystal silicon using a single wafer chamber
- Patent number 7,265,036
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Sheeba J. Panayil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a high quality low temperature silicon nitride film
- Patent number 7,172,792
- Issue date Feb 6, 2007
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Patent number 7,115,499
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate electrode dopant activation method for semiconductor manufactu...
- Patent number 7,078,302
- Issue date Jul 18, 2006
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-layer silicon film and method of fabrication
- Patent number 6,991,999
- Issue date Jan 31, 2006
- Applied Materials, Inc.
- Li Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 6,982,214
- Issue date Jan 3, 2006
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Patent number 6,833,161
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Emissivity-change-free pumping plate kit in a single wafer chamber
- Patent number 6,802,906
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling the crystal structure of polycrystalline silicon
- Patent number 6,726,955
- Issue date Apr 27, 2004
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Emissivity-change-free pumping plate kit in a single wafer chamber
- Patent number 6,582,522
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doped silicon deposition process in resistively heated single wafer...
- Patent number 6,559,039
- Issue date May 6, 2003
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a silicon nitride layer on a substrate
- Patent number 6,559,074
- Issue date May 6, 2003
- Applied Materials, Inc.
- Steven A. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment of a titanium nitride film formed by chemical vapo...
- Patent number 6,555,183
- Issue date Apr 29, 2003
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a thick titanium nitride film
- Patent number 6,548,402
- Issue date Apr 15, 2003
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a titanium silicide layer on a substrate
- Patent number 6,524,952
- Issue date Feb 25, 2003
- Applied Materials, Inc.
- Ramanujapuram A. Srinivas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming insitu boron doped polycrystalline...
- Patent number 6,488,776
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming insitu boron doped polycrystalline...
- Patent number 6,410,090
- Issue date Jun 25, 2002
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for performing metallo-organic chemical vapor deposition of...
- Patent number 6,365,495
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of titanium/titanium nitride integration
- Patent number 6,326,690
- Issue date Dec 4, 2001
- Applied Materials, Inc.
- Shulin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of titanium/titanium nitride integration
- Patent number 6,214,714
- Issue date Apr 10, 2001
- Applied Materials, Inc.
- Shulin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming doped silicon in high aspect ratio openings
- Patent number 5,863,598
- Issue date Jan 26, 1999
- Applied Materials, Inc.
- Mahalingam Venkatesan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Substrate carrier with enhanced temperature uniformity
- Publication number 20100151680
- Publication date Jun 17, 2010
- OptiSolar Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Apparatus for Forming a High Quality Low Temperature Sil...
- Publication number 20100029094
- Publication date Feb 4, 2010
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES
- Publication number 20080305629
- Publication date Dec 11, 2008
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distribution assembly for use in a semiconductor work piece pro...
- Publication number 20080092815
- Publication date Apr 24, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of nano-crystal silicon using a single wafer chamber
- Publication number 20070287271
- Publication date Dec 13, 2007
- Sheeba J. Panayil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Assembly and method for delivering a reactant material onto a subst...
- Publication number 20070166459
- Publication date Jul 19, 2007
- Advanced Micro-Fabrication Equipment, Inc.
- Frank P. Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES
- Publication number 20070020924
- Publication date Jan 25, 2007
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE ELECTRODE DOPANT ACTIVATION METHOD FOR SEMICONDUCTOR MANUFACTU...
- Publication number 20060286763
- Publication date Dec 21, 2006
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
- Publication number 20060024926
- Publication date Feb 2, 2006
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin tungsten silicide layer deposition and gate metal integration
- Publication number 20060024959
- Publication date Feb 2, 2006
- APPLIED MATERIALS, INC.
- Ming Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition of nano-crystal silicon using a single wafer chamber
- Publication number 20060019469
- Publication date Jan 26, 2006
- APPLIED MATERIALS, INC.
- Sheeba J. Panayil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for silicon nitride chemical vapor deposition
- Publication number 20050255714
- Publication date Nov 17, 2005
- APPLIED MATERIALS, INC.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gate electrode dopant activation method for semiconductor manufactu...
- Publication number 20050186765
- Publication date Aug 25, 2005
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Publication number 20050176240
- Publication date Aug 11, 2005
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electron beam treatment of SixNy films
- Publication number 20040266123
- Publication date Dec 30, 2004
- APPLIED MATERIALS, INC.
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming a high quality low temperature sil...
- Publication number 20040194706
- Publication date Oct 7, 2004
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming a high quality low temperature sil...
- Publication number 20040121085
- Publication date Jun 24, 2004
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
- Publication number 20040063301
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Seedless method of forming a silicon germanium layer on a gate diel...
- Publication number 20040009680
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Lee Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon deposition process in resistively heated single wafer chamber
- Publication number 20030207547
- Publication date Nov 6, 2003
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Publication number 20030161952
- Publication date Aug 28, 2003
- APPLIED MATERIALS, INC.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming silicon containing films
- Publication number 20030124818
- Publication date Jul 3, 2003
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cycling deposition of low temperature films in a cold wall single w...
- Publication number 20030059535
- Publication date Mar 27, 2003
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bi-layer silicon film and method of fabrication
- Publication number 20030047734
- Publication date Mar 13, 2003
- APPLIED MATERIALS, INC.
- Li Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of titanium/titanium nitride integration
- Publication number 20020192396
- Publication date Dec 19, 2002
- Shulin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED SILICON DEPOSITION PROCESS IN RESISTIVELY HEATED SINGLE WAFER...
- Publication number 20020173127
- Publication date Nov 21, 2002
- APPLIED MATERIALS, INC.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming insitu boron doped polycrystalline...
- Publication number 20020162505
- Publication date Nov 7, 2002
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment of a titanium nitride film formed by chemical vapo...
- Publication number 20020155219
- Publication date Oct 24, 2002
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Emissivity-change-free pumping plate kit in a single wafer chamber
- Publication number 20020137312
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Emissivity-change-free pumping plate kit in a single wafer chamber
- Publication number 20020127508
- Publication date Sep 12, 2002
- APPLIED MATERIALS, INC.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shulin Wang

Person

Patents Grantslast 30 patents

Method and apparatus for forming a high quality low temperature sil...

Tungsten nitride atomic layer deposition processes

Gas distribution assembly for use in a semiconductor work piece pro...

Gate electrode dopant activation method for semiconductor manufactu...

Tungsten nitride atomic layer deposition processes

Method for silicon nitride chemical vapor deposition

Method of forming a controlled and uniform lightly phosphorous dope...

Deposition of nano-crystal silicon using a single wafer chamber

Method for forming a high quality low temperature silicon nitride film

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Gate electrode dopant activation method for semiconductor manufactu...

Bi-layer silicon film and method of fabrication

Method of forming a controlled and uniform lightly phosphorous dope...

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Emissivity-change-free pumping plate kit in a single wafer chamber

Method of controlling the crystal structure of polycrystalline silicon

Emissivity-change-free pumping plate kit in a single wafer chamber

Doped silicon deposition process in resistively heated single wafer...

Method of forming a silicon nitride layer on a substrate

Plasma treatment of a titanium nitride film formed by chemical vapo...

Method of depositing a thick titanium nitride film

Method of forming a titanium silicide layer on a substrate

Method and apparatus for forming insitu boron doped polycrystalline...

Method and apparatus for forming insitu boron doped polycrystalline...

Method for performing metallo-organic chemical vapor deposition of...

Method of titanium/titanium nitride integration

Method of titanium/titanium nitride integration

Method of forming doped silicon in high aspect ratio openings

Patents Applicationslast 30 patents

Substrate carrier with enhanced temperature uniformity

Method and Apparatus for Forming a High Quality Low Temperature Sil...

TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES

Gas distribution assembly for use in a semiconductor work piece pro...

Deposition of nano-crystal silicon using a single wafer chamber

Assembly and method for delivering a reactant material onto a subst...

TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES

GATE ELECTRODE DOPANT ACTIVATION METHOD FOR SEMICONDUCTOR MANUFACTU...

Method of forming a controlled and uniform lightly phosphorous dope...

Thin tungsten silicide layer deposition and gate metal integration

Deposition of nano-crystal silicon using a single wafer chamber

Method for silicon nitride chemical vapor deposition

Gate electrode dopant activation method for semiconductor manufactu...

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Electron beam treatment of SixNy films

Method and apparatus for forming a high quality low temperature sil...

Method and apparatus for forming a high quality low temperature sil...

Method of forming a controlled and uniform lightly phosphorous dope...

Seedless method of forming a silicon germanium layer on a gate diel...

Silicon deposition process in resistively heated single wafer chamber

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Method and apparatus for forming silicon containing films

Cycling deposition of low temperature films in a cold wall single w...

Bi-layer silicon film and method of fabrication

Method of titanium/titanium nitride integration

DOPED SILICON DEPOSITION PROCESS IN RESISTIVELY HEATED SINGLE WAFER...

Method and apparatus for forming insitu boron doped polycrystalline...

Plasma treatment of a titanium nitride film formed by chemical vapo...

Emissivity-change-free pumping plate kit in a single wafer chamber

Emissivity-change-free pumping plate kit in a single wafer chamber