Siegfried Schwarzl

Person

Ottobrunn, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
- Patent number 8,501,373
- Issue date Aug 6, 2013
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
- Patent number 8,076,055
- Issue date Dec 13, 2011
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
- Patent number 7,859,648
- Issue date Dec 28, 2010
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reticle stages for lithography systems and lithography methods
- Patent number 7,626,682
- Issue date Dec 1, 2009
- Infineon Technologies AG
- Stefan Wurm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a radiation power and an exposure apparatus
- Patent number 7,417,736
- Issue date Aug 26, 2008
- Infineon Technologies AG
- Siegfried Schwarzl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV magnetic contrast lithography mask and manufacture thereof
- Patent number 7,407,729
- Issue date Aug 5, 2008
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor memory device with a capacitor formed therein and a m...
- Patent number 7,341,875
- Issue date Mar 11, 2008
- Infineon Technologies AG
- Joachim Nuetzel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for smoothing areas in structures by utilizing the surface t...
- Patent number 7,332,444
- Issue date Feb 19, 2008
- Infineon Technologies AG
- Wolf-Dieter Domke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for generating and/or influencing electromagnetic radiation...
- Patent number 7,323,821
- Issue date Jan 29, 2008
- Qimonda AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing an annular microstructure element
- Patent number 7,316,933
- Issue date Jan 8, 2008
- Infineon Technologies AG
- Alfred Kersch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell array and method for manufacturing it
- Patent number RE39799
- Issue date Aug 28, 2007
- Infineon Technologies AG
- Siegfried Schwarzl
- 365 - Static information storage and retrieval
Information Patent Grant
Hollow structure in an integrated circuit and method for producing...
- Patent number 7,259,441
- Issue date Aug 21, 2007
- Infineon Technologies AG
- Werner Pamler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic mask having a structure region covered by a thin...
- Patent number 7,078,134
- Issue date Jul 18, 2006
- Infineon Technologies AG
- Stefan Wurm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Integrated electrical circuit and method for fabricating it
- Patent number 7,064,439
- Issue date Jun 20, 2006
- Infineon Technologies AG
- Jörg Berthold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive coating material for a substrate and process for exp...
- Patent number 7,029,808
- Issue date Apr 18, 2006
- Infineon Technologies AG
- Jenspeter Rau
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Arrangement of microstructures
- Patent number 7,023,063
- Issue date Apr 4, 2006
- Infineon Technologies AG
- Zvonimir Gabric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell arrangement and method of fabricating it
- Patent number 6,943,393
- Issue date Sep 13, 2005
- Infineon Technologies AG
- Stefan Miethaner
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for producing an integrated circuit having at least one meta...
- Patent number 6,930,052
- Issue date Aug 16, 2005
- Infineon Technologies AG
- Siegfried Schwarzl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory having mutually crossing word and bit lines, a...
- Patent number 6,925,002
- Issue date Aug 2, 2005
- Infineon Technologies AG
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for fabricating a lithographic reflection mask in particular...
- Patent number 6,872,495
- Issue date Mar 29, 2005
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection mask for EUV-lithography and method for fabricating the...
- Patent number 6,849,365
- Issue date Feb 1, 2005
- Infineon Technologies AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating microstructures and arrangement of microstru...
- Patent number 6,825,098
- Issue date Nov 30, 2004
- Infineon Technologies AG
- Zvonimir Gabric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polyvalent, magnetoresistive write/read memory and method for writi...
- Patent number 6,717,843
- Issue date Apr 6, 2004
- Infineon Technologies AG
- Roland Thewes
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate with at least two metal structures deposited thereon, and...
- Patent number 6,686,643
- Issue date Feb 3, 2004
- Infineon Technologies AG
- Siegfried Schwarzl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetoresistive memory cell configuration and method for its produ...
- Patent number 6,630,703
- Issue date Oct 7, 2003
- Infineon Technologies AG
- Ulrich Scheler
- G11 - INFORMATION STORAGE
Information Patent Grant
Memory cell configuration and production method
- Patent number 6,605,837
- Issue date Aug 12, 2003
- Infineon Technologies AG
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE
Information Patent Grant
Memory cell configuration and method for fabricating it
- Patent number 6,579,729
- Issue date Jun 17, 2003
- Infineon Technologies AG
- Bernd Goebel
- G11 - INFORMATION STORAGE
Information Patent Grant
Magnetoresistive element and the use thereof as storage element in...
- Patent number 6,577,526
- Issue date Jun 10, 2003
- Infineon Technologies AG
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE
Information Patent Grant
Memory cell configuration and method for operating the configuration
- Patent number 6,574,138
- Issue date Jun 3, 2003
- Infineon Technologies AG
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE
Information Patent Grant
Memory cell array and method for manufacturing it
- Patent number 6,510,078
- Issue date Jan 21, 2003
- Siemens Aktiengesellschaft
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
- Publication number 20120069311
- Publication date Mar 22, 2012
- INFINEON TECHNOLOGIES AG
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
- Publication number 20100119981
- Publication date May 13, 2010
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
- Publication number 20100066991
- Publication date Mar 18, 2010
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reticle Stages for Lithography Systems and Lithography Methods
- Publication number 20100035431
- Publication date Feb 11, 2010
- Stefan Wurm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a microelectronic structure
- Publication number 20090011556
- Publication date Jan 8, 2009
- Gerhard Beitel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV Lithography System and Chuck for Releasing Reticle in a Vacuum...
- Publication number 20080204695
- Publication date Aug 28, 2008
- Siegfried Schwarzl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods of measuring power in lithography systems
- Publication number 20080073572
- Publication date Mar 27, 2008
- Siegfried Schwarzl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluids and methods of forming thereof
- Publication number 20080063982
- Publication date Mar 13, 2008
- Stefan Wurm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Determining a Radiation Power and an Exposure Apparatus
- Publication number 20080037000
- Publication date Feb 14, 2008
- Siegfried Schwarzl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle stages for lithography systems and lithography methods
- Publication number 20070242257
- Publication date Oct 18, 2007
- Stefan Wurm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor memory device with a capacitor formed therein and a m...
- Publication number 20070082413
- Publication date Apr 12, 2007
- Infineon Technologies AG
- Joachim Nuetzel
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV reflection mask and method for producing it
- Publication number 20060292459
- Publication date Dec 28, 2006
- Frank-Michael Kamm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor memory device and operating method for a semiconducto...
- Publication number 20060275928
- Publication date Dec 7, 2006
- Stefan Wurm
- G11 - INFORMATION STORAGE
Information Patent Application
Photosensitive coating material for a substrate
- Publication number 20060147839
- Publication date Jul 6, 2006
- Infineon Technologies AG
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device for generating and/or influencing electromagnetic radiation...
- Publication number 20060132046
- Publication date Jun 22, 2006
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV magnetic contrast lithography mask and manufacture thereof
- Publication number 20060029866
- Publication date Feb 9, 2006
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Passivation of multi-layer mirror for extreme ultraviolet lithography
- Publication number 20060024589
- Publication date Feb 2, 2006
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for producing an annular microstructure element
- Publication number 20050250344
- Publication date Nov 10, 2005
- Alfred Kersch
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV lithography system and chuck for releasing reticle in a vacuum...
- Publication number 20050223973
- Publication date Oct 13, 2005
- Infineon Technologies AG
- Siegfried Schwarzl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for smoothing areas in structures by utilizing the surface t...
- Publication number 20050214467
- Publication date Sep 29, 2005
- Infineon Technologies AG
- Wolf-Dieter Domke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for fabricating microstructures and arrangement of microstru...
- Publication number 20050054184
- Publication date Mar 10, 2005
- Zvonimir Gabric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory having mutually crossing word and bit lines, a...
- Publication number 20040218441
- Publication date Nov 4, 2004
- Siegfried Schwarzl
- G11 - INFORMATION STORAGE
Information Patent Application
Photosensitive coating material for a substrate and process for exp...
- Publication number 20040115563
- Publication date Jun 17, 2004
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing an integrated circuit having at least one meta...
- Publication number 20040092093
- Publication date May 13, 2004
- Siegfried Schwarzl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hollow structure in an integrated circuit and method for producing...
- Publication number 20040084749
- Publication date May 6, 2004
- Werner Pamler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating microstructures and arrangement of microstru...
- Publication number 20040033652
- Publication date Feb 19, 2004
- Zvonimir Gabric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Memory cell arrangement and method for the production thereof
- Publication number 20040004884
- Publication date Jan 8, 2004
- Stefan Miethaner
- G11 - INFORMATION STORAGE
Information Patent Application
Photolithographic mask and methods for the fabrication of the mask
- Publication number 20030232256
- Publication date Dec 18, 2003
- Stefan Wurm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflection mask for EUV-lithography and method for fabricating the...
- Publication number 20030091910
- Publication date May 15, 2003
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for fabricating a lithographic reflection mask in particular...
- Publication number 20020192571
- Publication date Dec 19, 2002
- Siegfried Schwarzl
- B82 - NANO-TECHNOLOGY

Siegfried Schwarzl

Person

Patents Grantslast 30 patents

Passivation of multi-layer mirror for extreme ultraviolet lithography

Passivation of multi-layer mirror for extreme ultraviolet lithography

Passivation of multi-layer mirror for extreme ultraviolet lithography

Reticle stages for lithography systems and lithography methods

Method for determining a radiation power and an exposure apparatus

EUV magnetic contrast lithography mask and manufacture thereof

Semiconductor memory device with a capacitor formed therein and a m...

Method for smoothing areas in structures by utilizing the surface t...

Device for generating and/or influencing electromagnetic radiation...

Method for producing an annular microstructure element

Memory cell array and method for manufacturing it

Hollow structure in an integrated circuit and method for producing...

Photolithographic mask having a structure region covered by a thin...

Integrated electrical circuit and method for fabricating it

Photosensitive coating material for a substrate and process for exp...

Arrangement of microstructures

Memory cell arrangement and method of fabricating it

Method for producing an integrated circuit having at least one meta...

Semiconductor memory having mutually crossing word and bit lines, a...

Method for fabricating a lithographic reflection mask in particular...

Reflection mask for EUV-lithography and method for fabricating the...

Method for fabricating microstructures and arrangement of microstru...

Polyvalent, magnetoresistive write/read memory and method for writi...

Substrate with at least two metal structures deposited thereon, and...

Magnetoresistive memory cell configuration and method for its produ...

Memory cell configuration and production method

Memory cell configuration and method for fabricating it

Magnetoresistive element and the use thereof as storage element in...

Memory cell configuration and method for operating the configuration

Memory cell array and method for manufacturing it

Patents Applicationslast 30 patents

Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography

Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography

Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography

Reticle Stages for Lithography Systems and Lithography Methods

Method for producing a microelectronic structure

EUV Lithography System and Chuck for Releasing Reticle in a Vacuum...

Systems and methods of measuring power in lithography systems

Fluids and methods of forming thereof

Method for Determining a Radiation Power and an Exposure Apparatus

Reticle stages for lithography systems and lithography methods

Semiconductor memory device with a capacitor formed therein and a m...

EUV reflection mask and method for producing it

Semiconductor memory device and operating method for a semiconducto...

Photosensitive coating material for a substrate

Device for generating and/or influencing electromagnetic radiation...

EUV magnetic contrast lithography mask and manufacture thereof

Passivation of multi-layer mirror for extreme ultraviolet lithography

Method for producing an annular microstructure element

EUV lithography system and chuck for releasing reticle in a vacuum...

Method for smoothing areas in structures by utilizing the surface t...

Method for fabricating microstructures and arrangement of microstru...

Semiconductor memory having mutually crossing word and bit lines, a...

Photosensitive coating material for a substrate and process for exp...

Method for producing an integrated circuit having at least one meta...

Hollow structure in an integrated circuit and method for producing...

Method for fabricating microstructures and arrangement of microstru...

Memory cell arrangement and method for the production thereof

Photolithographic mask and methods for the fabrication of the mask

Reflection mask for EUV-lithography and method for fabricating the...

Method for fabricating a lithographic reflection mask in particular...