Siqing Lu

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition ring for thin substrate handling via edge clamping
- Patent number 12,100,579
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin substrate handling via edge clamping
- Patent number 11,996,315
- Issue date May 28, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Common substrate and shadow ring lift apparatus
- Patent number 11,881,375
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complex showerhead coating apparatus with electrospray for lithium...
- Patent number 9,685,655
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- Fei C. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal management of inductively coupled plasma reactors
- Patent number 7,811,411
- Issue date Oct 12, 2010
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,799,704
- Issue date Sep 21, 2010
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,789,993
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a thickness of a layer of a wafer
- Patent number 7,777,483
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,740,706
- Issue date Jun 22, 2010
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,722,719
- Issue date May 25, 2010
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-piece dome with separate RF coils for inductively coupled plasm...
- Patent number 7,651,587
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,572,647
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Robert Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-cooling gas delivery apparatus under high vacuum for high dens...
- Patent number 7,510,624
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of dynamically measuring thickness of a layer...
- Patent number 7,355,394
- Issue date Apr 8, 2008
- Applied Materials, Inc.
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Grant
Valve control system for atomic layer deposition chamber
- Patent number 7,201,803
- Issue date Apr 10, 2007
- Applied Materials, Inc.
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for dynamically measuring the thickness of an...
- Patent number 7,112,961
- Issue date Sep 26, 2006
- Applied Materials, Inc.
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Grant
Valve control system for atomic layer deposition chamber
- Patent number 6,734,020
- Issue date May 11, 2004
- Applied Materials, Inc.
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Lid assembly for a processing system to facilitate sequential depos...
- Patent number 6,660,126
- Issue date Dec 9, 2003
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead with reduced contact area
- Patent number 6,461,435
- Issue date Oct 8, 2002
- Applied Materials, Inc.
- Karl A. Littau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COMMON SUBSTRATE AND SHADOW RING LIFT APPARATUS
- Publication number 20220336182
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Abhishek CHOWDHURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220285133
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Abhishek Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION RING FOR THIN SUBSTRATE HANDLING VIA EDGE CLAMPING
- Publication number 20220157572
- Publication date May 19, 2022
- Abhishek CHOWDHURY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN SUBSTRATE HANDLING VIA EDGE CLAMPING
- Publication number 20220157635
- Publication date May 19, 2022
- Applied Materials, Inc.
- Abhishek CHOWDHURY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPLEX SHOWERHEAD COATING APPARATUS WITH ELECTROSPRAY FOR LITHIUM...
- Publication number 20160020454
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- Fei C. WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Gas Baffle and Distributor for Semiconductor Processing Chamber
- Publication number 20090093129
- Publication date Apr 9, 2009
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM CHUCKING HEATER OF AXISYMMETRICAL AND UNIFORM THERMAL PROFILE
- Publication number 20090031955
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Siqing Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080185284
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188090
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MEASURING OBJECT THICKNESS
- Publication number 20080186022
- Publication date Aug 7, 2008
- Applied Materials, Inc., a Delaware corporation
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188087
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20080121179
- Publication date May 29, 2008
- Applied Materials, Inc.
- SOONAM PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20080124944
- Publication date May 29, 2008
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-CLOGGING NOZZLE FOR SEMICONDUCTOR PROCESSING
- Publication number 20080044568
- Publication date Feb 21, 2008
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for measuring object thickness
- Publication number 20070063698
- Publication date Mar 22, 2007
- Applied Materials, Inc.
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Application
Two-piece dome with separate RF coils for inductively coupled plasm...
- Publication number 20070037397
- Publication date Feb 15, 2007
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal management of inductively coupled plasma reactors
- Publication number 20070034153
- Publication date Feb 15, 2007
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and systems for increasing substrate temperature in plasma...
- Publication number 20070029046
- Publication date Feb 8, 2007
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas baffle and distributor for semiconductor processing chamber
- Publication number 20060196603
- Publication date Sep 7, 2006
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma system with sidewall magnet
- Publication number 20060177600
- Publication date Aug 10, 2006
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-cooling gas delivery apparatus under high vacuum for high dens...
- Publication number 20060130756
- Publication date Jun 22, 2006
- APPLIED MATERIALS, INC., A Delaware corporation
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic-field concentration in inductively coupled plasma reactors
- Publication number 20060075967
- Publication date Apr 13, 2006
- Applied Materials, Inc.
- Siqing Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Anti-clogging nozzle for semiconductor processing
- Publication number 20060048707
- Publication date Mar 9, 2006
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Anti-clogging nozzle for semiconductor processing
- Publication number 20050218115
- Publication date Oct 6, 2005
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Valve control system for atomic layer deposition chamber
- Publication number 20040143370
- Publication date Jul 22, 2004
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for measuring object thickness
- Publication number 20040140797
- Publication date Jul 22, 2004
- APPLIED MATERIALS, INC.
- Lawrence C. Lei
- G01 - MEASURING TESTING
Information Patent Application
Valve control system for atomic layer deposition chamber
- Publication number 20020127745
- Publication date Sep 12, 2002
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Application
Processing chamber and method of distributing process fluids therei...
- Publication number 20020121241
- Publication date Sep 5, 2002
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lid assembly for a processing system to facilitate sequential depos...
- Publication number 20020121342
- Publication date Sep 5, 2002
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Deposition ring for thin substrate handling via edge clamping

Thin substrate handling via edge clamping

Common substrate and shadow ring lift apparatus

Complex showerhead coating apparatus with electrospray for lithium...

Thermal management of inductively coupled plasma reactors

Gas baffle and distributor for semiconductor processing chamber

Internal balanced coil for inductively coupled high density plasma...

Method and apparatus for measuring a thickness of a layer of a wafer

Gas baffle and distributor for semiconductor processing chamber

Gas baffle and distributor for semiconductor processing chamber

Two-piece dome with separate RF coils for inductively coupled plasm...

Internal balanced coil for inductively coupled high density plasma...

Self-cooling gas delivery apparatus under high vacuum for high dens...

Apparatus and method of dynamically measuring thickness of a layer...

Valve control system for atomic layer deposition chamber

Method and apparatus for dynamically measuring the thickness of an...

Valve control system for atomic layer deposition chamber

Lid assembly for a processing system to facilitate sequential depos...

Showerhead with reduced contact area

Patents Applicationslast 30 patents

COMMON SUBSTRATE AND SHADOW RING LIFT APPARATUS

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

DEPOSITION RING FOR THIN SUBSTRATE HANDLING VIA EDGE CLAMPING

THIN SUBSTRATE HANDLING VIA EDGE CLAMPING

COMPLEX SHOWERHEAD COATING APPARATUS WITH ELECTROSPRAY FOR LITHIUM...

Gas Baffle and Distributor for Semiconductor Processing Chamber

VACUUM CHUCKING HEATER OF AXISYMMETRICAL AND UNIFORM THERMAL PROFILE

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

METHOD AND APPARATUS FOR MEASURING OBJECT THICKNESS

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER

GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER

ANTI-CLOGGING NOZZLE FOR SEMICONDUCTOR PROCESSING

Method and apparatus for measuring object thickness

Two-piece dome with separate RF coils for inductively coupled plasm...

Thermal management of inductively coupled plasma reactors

Methods and systems for increasing substrate temperature in plasma...

Gas baffle and distributor for semiconductor processing chamber

Inductive plasma system with sidewall magnet

Self-cooling gas delivery apparatus under high vacuum for high dens...

Magnetic-field concentration in inductively coupled plasma reactors

Anti-clogging nozzle for semiconductor processing

Anti-clogging nozzle for semiconductor processing

Valve control system for atomic layer deposition chamber

Method and apparatus for measuring object thickness

Valve control system for atomic layer deposition chamber

Processing chamber and method of distributing process fluids therei...

Lid assembly for a processing system to facilitate sequential depos...