S.M. Reza Sadjadi

Person

  • Saratoga, CA, US

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTORESIST DOUBLE PATTERNING APPARATUS

    • Publication number 20130000846
    • Publication date Jan 3, 2013
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROTECTIVE LAYER FOR IMPLANT PHOTORESIST

    • Publication number 20120328781
    • Publication date Dec 27, 2012
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

    • Publication number 20120309201
    • Publication date Dec 6, 2012
    • LAM RESEARCH CORPORATION
    • Sangheon LEE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    MINIMIZATION OF MASK UNDERCUT ON DEEP ETCH

    • Publication number 20120298301
    • Publication date Nov 29, 2012
    • LAM RESEARCH CORPORATION
    • Tamarak Pandhumsoporn
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCH WITH HIGH ETCH RATE RESIST MASK

    • Publication number 20120282780
    • Publication date Nov 8, 2012
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    DEVICE WITH GAPS FOR CAPACITANCE REDUCTION

    • Publication number 20120205819
    • Publication date Aug 16, 2012
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SPACER FORMATION FOR ARRAY DOUBLE PATTERNING

    • Publication number 20120138227
    • Publication date Jun 7, 2012
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PITCH REDUCTION USING OXIDE SPACER

    • Publication number 20120052683
    • Publication date Mar 1, 2012
    • LAM RESEARCH CORPORATION
    • Jisoo Kim
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FAST GAS SWITCHING PLASMA PROCESSING APPARATUS

    • Publication number 20110281435
    • Publication date Nov 17, 2011
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MASK TRIMMING

    • Publication number 20110030895
    • Publication date Feb 10, 2011
    • LAM RESEARCH CORPORATION
    • Supriya Goyal
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SPACER FORMATION FOR ARRAY DOUBLE PATTERNING

    • Publication number 20100178769
    • Publication date Jul 15, 2010
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

    • Publication number 20100148317
    • Publication date Jun 17, 2010
    • LAM RESEARCH CORPORATION
    • Sangheon LEE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SIDEWALL FORMING PROCESSES

    • Publication number 20100068885
    • Publication date Mar 18, 2010
    • LAM RESEARCH CORPORATION
    • Peter CIRIGLIANO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ORGANIC ARC ETCH SELECTIVE FOR IMMERSION PHOTORESIST

    • Publication number 20090311871
    • Publication date Dec 17, 2009
    • LAM RESEARCH CORPORATION
    • Helen H. Zhu
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SELECTIVE INDUCTIVE DOUBLE PATTERNING

    • Publication number 20090286397
    • Publication date Nov 19, 2009
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DOUBLE MASK SELF-ALIGNED DOUBLE PATTERNING TECHNOLOGY (SADPT) PROCESS

    • Publication number 20090215272
    • Publication date Aug 27, 2009
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROTECTIVE LAYER FOR IMPLANT PHOTORESIST

    • Publication number 20090162553
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST DOUBLE PATTERNING

    • Publication number 20090162790
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ETCH WITH HIGH ETCH RATE RESIST MASK

    • Publication number 20090163035
    • Publication date Jun 25, 2009
    • LAM RESEARCH CORPORATION
    • Andrew R. Romano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    DEVICE WITH GAPS FOR CAPACITANCE REDUCTION

    • Publication number 20090140380
    • Publication date Jun 4, 2009
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCH WITH STRIATION CONTROL

    • Publication number 20090121324
    • Publication date May 14, 2009
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MASK TRIMMING

    • Publication number 20090050271
    • Publication date Feb 26, 2009
    • LAM RESEARCH CORPORATION
    • Supriya Goyal
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MASK TRIMMING WITH ARL ETCH

    • Publication number 20090050603
    • Publication date Feb 26, 2009
    • LAM RESEARCH CORPORATION
    • Dongho Heo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEVICE WITH SELF ALIGNED GAPS FOR CAPACITANCE REDUCTION

    • Publication number 20080314521
    • Publication date Dec 25, 2008
    • LAM RESEARCH CORPORATION
    • S. M. Reza Sadjadi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Minimization of mask undercut on deep silicon etch

    • Publication number 20080308526
    • Publication date Dec 18, 2008
    • Lam Research Corporation
    • Tamarak Pandhumsoporn
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    GLUE LAYER FOR HYDROFLUOROCARBON ETCH

    • Publication number 20080146032
    • Publication date Jun 19, 2008
    • Lam Research Corporation
    • Ji Soo Kim
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Removable spacer

    • Publication number 20080111166
    • Publication date May 15, 2008
    • Lam Research Corporation
    • Ji Soo Kim
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DE-FLUORIDATION PROCESS

    • Publication number 20080083502
    • Publication date Apr 10, 2008
    • LAM RESEARCH CORPORATION
    • Dongho Heo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FIN STRUCTURE FORMATION

    • Publication number 20080017314
    • Publication date Jan 24, 2008
    • Lam Research Corporation
    • Zhi-Song Huang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Reduction of feature critical dimensions

    • Publication number 20070293050
    • Publication date Dec 20, 2007
    • Lam Research Corporation
    • Sean S. Kang
    • H01 - BASIC ELECTRIC ELEMENTS