Soonam Park

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 12,009,228
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,915,950
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,834,744
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for improved semiconductor etching and componen...
- Patent number 11,735,441
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,728,139
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 11,594,428
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,591,693
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion resistant ground shield of processing chamber
- Patent number 11,562,890
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching systems and methods with secondary plasma injection
- Patent number 11,476,093
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,361,939
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity in...
- Patent number 11,355,317
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,276,559
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,276,590
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 11,195,699
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF heater pedestals
- Patent number 11,062,887
- Issue date Jul 13, 2021
- Applied Materials, Inc.
- Soonam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate supports with embedded RF shield
- Patent number 11,049,755
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- David Benjaminson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,004,661
- Issue date May 11, 2021
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 10,920,319
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma health determination in semiconductor substrate processing r...
- Patent number 10,920,320
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Junghoon Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
- Patent number 10,903,052
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for internal surface conditioning assessment in...
- Patent number 10,796,922
- Issue date Oct 6, 2020
- Applied Materials, Inc.
- Soonam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for internal surface conditioning in plasma pro...
- Patent number 10,707,061
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic induction plasma source for semiconductor processes and eq...
- Patent number 10,593,560
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for internal surface conditioning in plasma pro...
- Patent number 10,593,523
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic ring test device
- Patent number 10,551,328
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Satoru Kobayashi
- G01 - MEASURING TESTING
Information Patent Grant
Optical emission spectroscopic techniques for monitoring etching
- Patent number 10,541,184
- Issue date Jan 21, 2020
- Applied Materials, Inc.
- Soonwook Jung
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20230223281
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
- Publication number 20230203657
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER
- Publication number 20230122695
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20220148894
- Publication date May 12, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20220093364
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING
- Publication number 20210217591
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Toan Q. TRAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
- Publication number 20210189564
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
- Publication number 20200224313
- Publication date Jul 16, 2020
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER
- Publication number 20200185203
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONEN...
- Publication number 20200118845
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION
- Publication number 20200111643
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORTS WITH EMBEDDED RF SHIELD
- Publication number 20200090972
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- David Benjaminson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND PROCESSES FOR PLASMA TUNING
- Publication number 20200090907
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Junghoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE RF HEATER PEDESTALS
- Publication number 20200090912
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR INTERNAL SURFACE CONDITIONING ASSESSMENT IN...
- Publication number 20200058516
- Publication date Feb 20, 2020
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
- Publication number 20190362944
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEXTURING AND PLATING NICKEL ON ALUMINUM PROCESS CHAMBER COMPONENTS
- Publication number 20190323127
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20190326099
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF TAILORED VOLTAGE ON BIAS OPERATION
- Publication number 20190311884
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Satoru KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
- Publication number 20190311883
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES
- Publication number 20190304756
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...
- Publication number 20190272999
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
- Publication number 20190259580
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY IN...
- Publication number 20190189399
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- SATORU KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND PROCESSES FOR PLASMA FILTERING
- Publication number 20190119815
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...
- Publication number 20190108981
- Publication date Apr 11, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL EMISSION SPECTROSCOPIC TECHNIQUES FOR MONITORING ETCHING
- Publication number 20190019734
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Soonwook Jung
- H01 - BASIC ELECTRIC ELEMENTS

Soonam Park

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Low temperature chuck for plasma processing systems

Cylindrical cavity with impedance shifting by irises in a power-sup...

Multi-zone semiconductor substrate supports

Ceramic showerheads with conductive electrodes

Systems and methods for improved semiconductor etching and componen...

Process chamber for cyclic and selective material removal and etching

Low temperature chuck for plasma processing systems

Ceramic showerheads with conductive electrodes

Corrosion resistant ground shield of processing chamber

Plasma etching systems and methods with secondary plasma injection

Semiconductor processing chamber for multiple precursor flow

Methods and apparatus for dynamical control of radial uniformity in...

Semiconductor processing chamber for multiple precursor flow

Multi-zone semiconductor substrate supports

Chemical control features in wafer process equipment

Generalized cylindrical cavity system for microwave rotation and im...

High temperature RF heater pedestals

Semiconductor substrate supports with embedded RF shield

Process chamber for cyclic and selective material removal and etching

Ceramic showerheads with conductive electrodes

Plasma health determination in semiconductor substrate processing r...

Systems and methods for radial and azimuthal control of plasma unif...

Systems and methods for internal surface conditioning assessment in...

Systems and methods for internal surface conditioning in plasma pro...

Magnetic induction plasma source for semiconductor processes and eq...

Systems and methods for internal surface conditioning in plasma pro...

Flow control features of CVD chambers

Ceramic ring test device

Optical emission spectroscopic techniques for monitoring etching

Patents Applicationslast 30 patents

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING

CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER

FLOW CONTROL FEATURES OF CVD CHAMBERS

SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONEN...

PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION

SEMICONDUCTOR SUBSTRATE SUPPORTS WITH EMBEDDED RF SHIELD

SYSTEMS AND PROCESSES FOR PLASMA TUNING

HIGH TEMPERATURE RF HEATER PEDESTALS

SYSTEMS AND METHODS FOR INTERNAL SURFACE CONDITIONING ASSESSMENT IN...

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...

TEXTURING AND PLATING NICKEL ON ALUMINUM PROCESS CHAMBER COMPONENTS

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

RF TAILORED VOLTAGE ON BIAS OPERATION

SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW

SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES

MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...

OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING

METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY IN...

SYSTEMS AND PROCESSES FOR PLASMA FILTERING

PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...

OPTICAL EMISSION SPECTROSCOPIC TECHNIQUES FOR MONITORING ETCHING