Souichi Katagiri

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron source and charged particle beam device
- Patent number 11,929,230
- Issue date Mar 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and method for controlling electron beam ap...
- Patent number 11,894,211
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Erina Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermoelectric field emission electron source and electron beam app...
- Patent number 11,508,544
- Issue date Nov 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron beam application device
- Patent number 11,227,740
- Issue date Jan 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,903,037
- Issue date Jan 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 10,804,084
- Issue date Oct 13, 2020
- HITACHI HIGH-TECH CORPORATION
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion pump and charged particle beam device using the same
- Patent number 9,837,243
- Issue date Dec 5, 2017
- Hitachi, Ltd.
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,006,654
- Issue date Apr 14, 2015
- Hitachi High-Technologies Corporation
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric field discharge-type electron source
- Patent number 8,866,371
- Issue date Oct 21, 2014
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and method of controlling the same
- Patent number 8,772,735
- Issue date Jul 8, 2014
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,686,380
- Issue date Apr 1, 2014
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle radiation device
- Patent number 8,426,835
- Issue date Apr 23, 2013
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus, and method of controlling the same
- Patent number 8,319,193
- Issue date Nov 27, 2012
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and its mold
- Patent number 8,268,209
- Issue date Sep 18, 2012
- Hitachi, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam system and method for evacuation of the system
- Patent number 7,781,743
- Issue date Aug 24, 2010
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron lens and charged particle beam apparatus
- Patent number 7,759,652
- Issue date Jul 20, 2010
- Hitachi High-Technologies Corporation
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and pattern forming system
- Patent number 7,745,237
- Issue date Jun 29, 2010
- Hitachi, Ltd.
- Souichi Katagiri
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,615,765
- Issue date Nov 10, 2009
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,582,885
- Issue date Sep 1, 2009
- Hitachi High-Technologies Corp.
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and apparatus for man...
- Patent number 7,144,298
- Issue date Dec 5, 2006
- Hitachi, Ltd.
- Souichi Katagiri
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manufacturing semiconductor device and apparatus for man...
- Patent number 6,908,860
- Issue date Jun 21, 2005
- Hitachi, Ltd.
- Souichi Katagiri
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Planarizing method of semiconductor wafer and apparatus thereof
- Patent number 6,777,337
- Issue date Aug 17, 2004
- Renesas Technology Corporation
- Kan Yasui
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing a semiconductor device
- Patent number 6,734,103
- Issue date May 11, 2004
- Hitachi, Ltd.
- Souichi Katagiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device fabricating method
- Patent number 6,723,144
- Issue date Apr 20, 2004
- Hitachi, Ltd.
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing surface of semiconductor device substrate
- Patent number 6,663,468
- Issue date Dec 16, 2003
- Hitachi, Ltd.
- Yoshio Kawamura
- B24 - GRINDING POLISHING
Information Patent Grant
Method for fabricating semiconductor device and processing apparatu...
- Patent number 6,612,912
- Issue date Sep 2, 2003
- Hitachi, Ltd.
- Kan Yasui
- B24 - GRINDING POLISHING
Information Patent Grant
Processing method, measuring method and producing method of semicon...
- Patent number 6,589,871
- Issue date Jul 8, 2003
- Hitachi, Ltd.
- Yoshio Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for planarizing semiconductor device
- Patent number 6,565,424
- Issue date May 20, 2003
- Hitachi, Ltd.
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device fabricating method
- Patent number 6,524,961
- Issue date Feb 25, 2003
- Hitachi, Ltd.
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Grant
Flattening and machining method and apparatus
- Patent number 6,477,825
- Issue date Nov 12, 2002
- Hitachi, Ltd.
- Souichi Katagiri
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM APPARATUS AND METHOD FOR CONTROLLING ELECTRON BEAM AP...
- Publication number 20220351934
- Publication date Nov 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Erina KAWAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON SOURCE AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20220199349
- Publication date Jun 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMOELECTRIC FIELD EMISSION ELECTRON SOURCE AND ELECTRON BEAM APP...
- Publication number 20220037107
- Publication date Feb 3, 2022
- Hitachi High-Tech Corporation
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE
- Publication number 20200266020
- Publication date Aug 20, 2020
- Hitachi High-Technologies Corporation
- Soichiro MATSUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200090897
- Publication date Mar 19, 2020
- Hitachi High-Technologies Corporation
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON SOURCE AND ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20190198284
- Publication date Jun 27, 2019
- Hitachi High-Technologies Corporation
- Soichiro MATSUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM APPARATUS
- Publication number 20180254173
- Publication date Sep 6, 2018
- Hitachi High-Technologies Corporation
- Souichi KATAGIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PUMP AND CHARGED PARTICLE BEAM DEVICE USING THE SAME
- Publication number 20160233050
- Publication date Aug 11, 2016
- Hitachi, Ltd
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20150034835
- Publication date Feb 5, 2015
- Hitachi High-Technologies Corporation
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRIC FIELD DISCHARGE-TYPE ELECTRON SOURCE
- Publication number 20140197725
- Publication date Jul 17, 2014
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20130063029
- Publication date Mar 14, 2013
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE RADIATION DEVICE
- Publication number 20120085925
- Publication date Apr 12, 2012
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20110089336
- Publication date Apr 21, 2011
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus
- Publication number 20090294697
- Publication date Dec 3, 2009
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM
- Publication number 20080315122
- Publication date Dec 25, 2008
- Hitachi High-Technologies Corporation
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Lens and Charged Particle Beam Apparatus
- Publication number 20080067396
- Publication date Mar 20, 2008
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM
- Publication number 20070172967
- Publication date Jul 26, 2007
- Souichi Katagiri
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD AND ITS MOLD
- Publication number 20070164458
- Publication date Jul 19, 2007
- Masahiko Ogino
- G11 - INFORMATION STORAGE
Information Patent Application
Charged particle beam apparatus
- Publication number 20070102650
- Publication date May 10, 2007
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus
- Publication number 20060231773
- Publication date Oct 19, 2006
- Souichi Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device and apparatus for man...
- Publication number 20050221608
- Publication date Oct 6, 2005
- Souichi Katagiri
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method for polishing surface of semiconductor device substrate
- Publication number 20040048554
- Publication date Mar 11, 2004
- Hitachi, Ltd.
- Yoshio Kawamura
- B24 - GRINDING POLISHING
Information Patent Application
Method for manufacturing semiconductor device and apparatus for man...
- Publication number 20040043608
- Publication date Mar 4, 2004
- Souichi Katagiri
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Semiconductor device fabricating method
- Publication number 20030084998
- Publication date May 8, 2003
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for manufacturing semiconductor device
- Publication number 20020160609
- Publication date Oct 31, 2002
- Souichi Katagiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEE ATTACHED LIST (K. YASUI ET AL)
- Publication number 20020119733
- Publication date Aug 29, 2002
- KAN YASUI
- B24 - GRINDING POLISHING
Information Patent Application
Flattening and machining method and apparatus
- Publication number 20020111125
- Publication date Aug 15, 2002
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Application
Processing method, measuring method and producing method of semicon...
- Publication number 20020076933
- Publication date Jun 20, 2002
- Hitachi, Ltd.
- Yoshio Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for planarizing semiconductor device
- Publication number 20020049026
- Publication date Apr 25, 2002
- Souichi Katagiri
- B24 - GRINDING POLISHING
Information Patent Application
Planarizing method of semiconductor wafer and apparatus thereof
- Publication number 20020028581
- Publication date Mar 7, 2002
- HITACHI LTD.
- Kan Yasui
- B24 - GRINDING POLISHING

Souichi Katagiri

Person

Patents Grantslast 30 patents

Electron source and charged particle beam device

Electron beam apparatus and method for controlling electron beam ap...

Thermoelectric field emission electron source and electron beam app...

Electron gun and electron beam application device

Charged particle beam device

Vacuum apparatus

Ion pump and charged particle beam device using the same

Charged particle beam apparatus

Electric field discharge-type electron source

Charged particle beam apparatus, and method of controlling the same

Charged particle beam apparatus

Charged particle radiation device

Charged particle beam apparatus, and method of controlling the same

Pattern forming method and its mold

Charged particle beam system and method for evacuation of the system

Electron lens and charged particle beam apparatus

Pattern forming method and pattern forming system

Charged particle beam apparatus

Charged particle beam apparatus

Method for manufacturing semiconductor device and apparatus for man...

Method for manufacturing semiconductor device and apparatus for man...

Planarizing method of semiconductor wafer and apparatus thereof

Method of polishing a semiconductor device

Semiconductor device fabricating method

Method for polishing surface of semiconductor device substrate

Method for fabricating semiconductor device and processing apparatu...

Processing method, measuring method and producing method of semicon...

Method and apparatus for planarizing semiconductor device

Semiconductor device fabricating method

Flattening and machining method and apparatus

Patents Applicationslast 30 patents

ELECTRON BEAM APPARATUS AND METHOD FOR CONTROLLING ELECTRON BEAM AP...

ELECTRON SOURCE AND CHARGED PARTICLE BEAM DEVICE

THERMOELECTRIC FIELD EMISSION ELECTRON SOURCE AND ELECTRON BEAM APP...

ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE

CHARGED PARTICLE BEAM DEVICE

ELECTRON SOURCE AND ELECTRON BEAM IRRADIATION DEVICE

VACUUM APPARATUS

ION PUMP AND CHARGED PARTICLE BEAM DEVICE USING THE SAME

CHARGED PARTICLE BEAM APPARATUS

ELECTRIC FIELD DISCHARGE-TYPE ELECTRON SOURCE

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

CHARGED PARTICLE RADIATION DEVICE

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

Charged particle beam apparatus

CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM

Electron Lens and Charged Particle Beam Apparatus

PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM

PATTERN FORMING METHOD AND ITS MOLD

Charged particle beam apparatus

Charged particle beam apparatus

Method for manufacturing semiconductor device and apparatus for man...

Method for polishing surface of semiconductor device substrate

Method for manufacturing semiconductor device and apparatus for man...

Semiconductor device fabricating method

Method and apparatus for manufacturing semiconductor device

SEE ATTACHED LIST (K. YASUI ET AL)

Flattening and machining method and apparatus

Processing method, measuring method and producing method of semicon...

Method and apparatus for planarizing semiconductor device

Planarizing method of semiconductor wafer and apparatus thereof