PATTERN FORMING METHOD AND ITS MOLD

Abstract

In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top view of a mold.

FIG. 2 is a top view when the mold is pressed against a disc substrate.

FIG. 3 is a schematic view of alignment between the mold and the disc substrate using an alignment mark.

FIG. 4 is a cross sectional view of a magnetic recording medium.

FIG. 5A to 5D are views showing the process of forming a recording layer of a disc substrate to which a concavo-convex pattern is transferred.

FIG. 6 is a view showing a pattern forming procedure by nano imprint onto a silicon wafer.

FIG. 7 is a view showing a nano imprint apparatus.

FIG. 8 is a view showing an arrangement of alignment marks of a metallic mold.

FIG. 9A is a cross sectional view of a metallic mold.

FIG. 9B is a cross sectional view of a metallic mold.

FIG. 9C is a cross sectional view of a metallic mold.

FIG. 10A is a cross sectional view of a metallic mold.

FIG. 10B is a cross sectional view of a metallic mold.

FIG. 10C is a cross sectional view of a metallic mold.

FIG. 11A is a cross sectional view of a metallic mold.

FIG. 11B is a cross sectional view of a metallic mold.

FIG. 11C is a cross sectional view of a metallic mold.

Claims

1. A pattern forming method of pressing a mold, in which a concavo-convex pattern is formed, against a substrate to which a resin film is applied, and thereby transferring this concavo-convex pattern to a surface of the substrate, wherein the mold has two or more alignment marks for determining a relative positional relation between the substrate and the mold, on a concentric circle, wherein alignment between the mold and the substrate is carried out from the relative positional relation between the alignment mark and an edge of a circular opening of the substrate.

2. The pattern forming method according to claim 1, wherein the alignment mark is formed in a symmetrical position about a center of the concentric circle.

3. The pattern forming method according to claim 2, wherein the mold has at least two or more sets of the alignment marks formed in the symmetrical position.

4. The pattern forming method according to claim 1, wherein the alignment mark is formed on a plurality of different surfaces on the mold.

5. The pattern forming method according to claim 1, wherein a fine concavo-convex pattern for the transfer and the alignment mark have different depths.

6. The pattern forming method according to claim 1, wherein the depth of the alignment mark satisfies a relationship of t(n−1)=λ/2 (1+a) (n: refractive index of the mold, t: pattern depth, λ: wavelength of irradiation light).

7. The pattern forming method according to claim 1, wherein the alignment mark is circular.

8. The pattern forming method according to claim 1, wherein a radius of the concentric circle on which the alignment mark is formed is smaller than a radius of the circular opening of the substrate.

9. A pattern forming method of pressing a mold, in which a fine concavo-convex pattern is formed, against a substrate and thereby transferring the fine concavo-convex pattern to the surface of the substrate, wherein the mold has a plurality of alignment marks for determining a relative positional relation between the substrate and the mold, the method further comprising detecting whether or not the alignment mark has a damage at the time of determining the relative position, wherein if a damaged alignment mark is detected in the detecting, alignment is carried out using alignment marks except the damaged portion.

10. The pattern forming method according to claim 9, wherein the damaged alignment mark is detected referring to a positional information.

11. The pattern forming method according to claim 9, wherein the damaged alignment mark is detected referring to a pattern shape.

12. A mold in which surface a concavo-convex pattern is formed, the mold for transferring a pattern to a substrate surface by pressing this concavo-convex shape, further comprising an alignment mark for determining a relative position to the substrate, wherein two or more of the alignment marks are formed on a concentric circle.

13. The mold according to claim 12, wherein the concavo-convex pattern is arranged on a plurality of circumferences about a predetermined position.

14. The mold according to claim 12, wherein the alignment mark is formed in a symmetrical position about the center of the concentric circle.

15. The mold according to claim 14, further comprising at least two or more sets of alignment marks formed in the symmetrical position.

16. The mold according to claim 12, wherein the alignment mark is formed on a plurality of different surfaces.

17. The mold according to claim 12, wherein the alignment mark is composed of material different from that of the mold.

18. The mold according to claim 12, wherein the concavo-convex pattern and the alignment mark have different depths.

19. The mold according to claim 18, wherein the depth of the alignment mark satisfies a relationship of t(n−1)=λ/2 (1+a) (n: refractive index of the mold, t: pattern depth, λ: wavelength of irradiation light).