Steven A. Rishton

Person

Hayward, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Scalable MOS field effect transistor
- Patent number 6,870,232
- Issue date Mar 22, 2005
- International Business Machines Corporation
- Kevin Kok Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for writing with a raster scanned beam
- Patent number 6,828,570
- Issue date Dec 7, 2004
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,617,086
- Issue date Sep 9, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus that determines charged particle beam shape codes
- Patent number 6,556,702
- Issue date Apr 29, 2003
- Applied Materials, Inc.
- Stephen A. Rishton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision alignment and assembly of microlenses and microcolumns
- Patent number 6,281,508
- Issue date Aug 28, 2001
- Etec Systems, Inc.
- Kim Y. Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Raster shaped beam, electron beam exposure strategy using a two dim...
- Patent number 6,262,429
- Issue date Jul 17, 2001
- Etec Systems, Inc.
- Stephen A. Rishton
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for controlling a beam shape
- Patent number 6,259,106
- Issue date Jul 10, 2001
- Etec Systems, Inc.
- Volker Boegli
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,251,569
- Issue date Jun 26, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microcolumn assembly using laser spot welding
- Patent number 6,195,214
- Issue date Feb 27, 2001
- Etec Systems, Inc.
- Lawrence Peter Muray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scalable MOS field effect transistor
- Patent number 6,096,590
- Issue date Aug 1, 2000
- International Business Machines Corporation
- Kevin Kok Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced parasitic resistance and capacitance field effect transistor
- Patent number 5,955,759
- Issue date Sep 21, 1999
- International Business Machines Corporation
- Khalid EzzEldin Ismail
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Technique for writing with a raster scanned beam
- Publication number 20030183782
- Publication date Oct 2, 2003
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Forming a pattern of a negative photoresist
- Publication number 20020123010
- Publication date Sep 5, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Raster shaped beam, electron beam exposure strategy using a two dim...
- Publication number 20020104970
- Publication date Aug 8, 2002
- Stacey J. Winter
- B82 - NANO-TECHNOLOGY

Steven A. Rishton

Person

Patents Grantslast 30 patents

Scalable MOS field effect transistor

Technique for writing with a raster scanned beam

Forming a pattern of a negative photoresist

Method and apparatus that determines charged particle beam shape codes

Precision alignment and assembly of microlenses and microcolumns

Raster shaped beam, electron beam exposure strategy using a two dim...

Apparatus and method for controlling a beam shape

Forming a pattern of a negative photoresist

Microcolumn assembly using laser spot welding

Scalable MOS field effect transistor

Reduced parasitic resistance and capacitance field effect transistor

Patents Applicationslast 30 patents

Technique for writing with a raster scanned beam

Forming a pattern of a negative photoresist

Raster shaped beam, electron beam exposure strategy using a two dim...