Stuart A. Sieg

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Structure and method to pattern pitch lines
- Patent number 12,148,617
- Issue date Nov 19, 2024
- International Business Machines Corporation
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using a same mask for direct print and self-aligned double patterni...
- Patent number 12,080,559
- Issue date Sep 3, 2024
- International Business Machines Corporation
- Stuart Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried power rails located in a base layer including first, second,...
- Patent number 11,990,412
- Issue date May 21, 2024
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,610,780
- Issue date Mar 21, 2023
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using a same mask for direct print and self-aligned double patterni...
- Patent number 11,257,681
- Issue date Feb 22, 2022
- International Business Machines Corporation
- Stuart Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective source/drain recess for improved performance, isolation,...
- Patent number 11,205,723
- Issue date Dec 21, 2021
- International Business Machines Corporation
- Ardasheir Rahman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor devices with self-aligned gates
- Patent number 11,183,389
- Issue date Nov 23, 2021
- International Business Machines Corporation
- Wenyu Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,171,002
- Issue date Nov 9, 2021
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable hardmask for overlayer metrology contrast
- Patent number 11,121,024
- Issue date Sep 14, 2021
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,031,248
- Issue date Jun 8, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin cut profile using fin base liner
- Patent number 10,985,025
- Issue date Apr 20, 2021
- International Business Machines Corporation
- Eric R. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transport devices with greater density through modified we...
- Patent number 10,943,911
- Issue date Mar 9, 2021
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring and modeling material planarization performance
- Patent number 10,832,919
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Romain Lallement
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Vertical transistors having multiple gate thicknesses for optimizin...
- Patent number 10,811,508
- Issue date Oct 20, 2020
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistors having multiple gate thicknesses for optimizin...
- Patent number 10,811,507
- Issue date Oct 20, 2020
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling fin hardmask cut profile using a sacrificial epitaxial...
- Patent number 10,741,452
- Issue date Aug 11, 2020
- International Business Machines Corporation
- Eric R. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transport static random-access memory cells with transisto...
- Patent number 10,734,372
- Issue date Aug 4, 2020
- International Business Machines Corporation
- Brent A. Anderson
- G11 - INFORMATION STORAGE
Information Patent Grant
Controlling gate length of vertical transistors
- Patent number 10,665,715
- Issue date May 26, 2020
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Verifying planarization performance using electrical measures
- Patent number 10,642,950
- Issue date May 5, 2020
- International Business Machines Corporation
- Romain Lallement
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Approach to prevent collapse of high aspect ratio Fin structures fo...
- Patent number 10,629,489
- Issue date Apr 21, 2020
- International Business Machines Corporation
- Indira Seshadri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable hardmask for overlayer metrology contrast
- Patent number 10,622,248
- Issue date Apr 14, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,580,652
- Issue date Mar 3, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fin length variability control
- Patent number 10,535,529
- Issue date Jan 14, 2020
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistors having improved gate length control using unif...
- Patent number 10,461,172
- Issue date Oct 29, 2019
- International Business Machines Corporation
- Christopher J. Waskiewicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,410,875
- Issue date Sep 10, 2019
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned double patterning formed fincut
- Patent number 10,361,129
- Issue date Jul 23, 2019
- International Business Machines Corporation
- Stuart A. Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,312,103
- Issue date Jun 4, 2019
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistor with variable gate length
- Patent number 10,312,346
- Issue date Jun 4, 2019
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inverse tone direct print EUV lithography enabled by selective mate...
- Patent number 10,304,744
- Issue date May 28, 2019
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Margin for fin cut using self-aligned triple patterning
- Patent number 10,304,689
- Issue date May 28, 2019
- International Business Machines Corporation
- Gauri Karve
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
STACKED TRANSISTORS WITH STEPPED CONTACTS
- Publication number 20240203984
- Publication date Jun 20, 2024
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC FILLED ALIGNMENT MARK STRUCTURES
- Publication number 20240203780
- Publication date Jun 20, 2024
- International Business Machines Corporation
- Somnath Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATE EPITAXY IN MONOLITHIC STACKED AND STEPPED NANOSHEETS
- Publication number 20240178292
- Publication date May 30, 2024
- International Business Machines Corporation
- Indira Seshadri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACKED FET SUBSTRATE CONTACT
- Publication number 20240071811
- Publication date Feb 29, 2024
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20240030036
- Publication date Jan 25, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMON SELF ALIGNED GATE CONTACT FOR STACKED TRANSISTOR STRUCTURES
- Publication number 20230420503
- Publication date Dec 28, 2023
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW AND DEEP CONTACTS WITH STITCHING
- Publication number 20230411212
- Publication date Dec 21, 2023
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIA CONNECTION TO BACKSIDE POWER DELIVERY NETWORK
- Publication number 20230402318
- Publication date Dec 14, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO CONTACT STRUCTURE WITH MULTIPLE METAL STACKS
- Publication number 20230317802
- Publication date Oct 5, 2023
- International Business Machines Corporation
- Junli Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING GATE-CUTS AND SINGLE DIFFUSION BREAK ISOLATION POST-RMG...
- Publication number 20230178437
- Publication date Jun 8, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BURIED POWER RAIL AT TIGHT CELL-TO-CELL SPACE
- Publication number 20230178433
- Publication date Jun 8, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT BURIED POWER RAIL
- Publication number 20230154783
- Publication date May 18, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM CONTACT FOR STACKED GAA FET
- Publication number 20230143705
- Publication date May 11, 2023
- International Business Machines Corporation
- Indira Seshadri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE CONTAINING A VIA-TO-BURIED POWER RAIL CONTACT STRUCTURE O...
- Publication number 20230139929
- Publication date May 4, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD TO PATTERN PITCH LINES
- Publication number 20230138978
- Publication date May 4, 2023
- International Business Machines Corporation
- CHANRO PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE POWER RAILS
- Publication number 20230100113
- Publication date Mar 30, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING A SAME MASK FOR DIRECT PRINT AND SELF-ALIGNED DOUBLE PATTERNI...
- Publication number 20220102153
- Publication date Mar 31, 2022
- International Business Machines Corporation
- Stuart Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20210335619
- Publication date Oct 28, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING A SAME MASK FOR DIRECT PRINT AND SELF-ALIGNED DOUBLE PATTERNI...
- Publication number 20210020446
- Publication date Jan 21, 2021
- International Business Machines Corporation
- Stuart Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SOURCE/DRAIN RECESS FOR IMPROVED PERFORMANCE, ISOLATION,...
- Publication number 20200411682
- Publication date Dec 31, 2020
- International Business Machines Corporation
- Ardasheir Rahman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD EFFECT TRANSISTOR DEVICES WITH SELF-ALIGNED GATES
- Publication number 20200294803
- Publication date Sep 17, 2020
- International Business Machines Corporation
- Wenyu Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20200266066
- Publication date Aug 20, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fin Length Variability Control
- Publication number 20200144069
- Publication date May 7, 2020
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN CUT PROFILE USING FIN BASE LINER
- Publication number 20200135484
- Publication date Apr 30, 2020
- International Business Machines Corporation
- Eric R. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING FIN HARDMASK CUT PROFILE USING A SACRIFICIAL EPITAXIAL...
- Publication number 20200135570
- Publication date Apr 30, 2020
- International Business Machines Corporation
- Eric R. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPROACH TO PREVENT COLLAPSE OF HIGH ASPECT RATIO FIN STRUCTURES FO...
- Publication number 20200098639
- Publication date Mar 26, 2020
- International Business Machines Corporation
- Indira Seshadri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING GATE LENGTH OF VERTICAL TRANSISTORS
- Publication number 20200075761
- Publication date Mar 5, 2020
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARD MASK FOR TIGHT-PITCH FIN FORMATION
- Publication number 20200066520
- Publication date Feb 27, 2020
- International Business Machines Corporation
- JOHN C. ARNOLD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TUNABLE HARDMASK FOR OVERLAYER METROLOGY CONTRAST
- Publication number 20190371651
- Publication date Dec 5, 2019
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor Fin Length Variability Control
- Publication number 20190371613
- Publication date Dec 5, 2019
- International Business Machines Corporation
- Praveen Joseph
- H01 - BASIC ELECTRIC ELEMENTS

Stuart A. Sieg

Person

Patents Grantslast 30 patents

Structure and method to pattern pitch lines

Using a same mask for direct print and self-aligned double patterni...

Buried power rails located in a base layer including first, second,...

Alternating hardmasks for tight-pitch line formation

Using a same mask for direct print and self-aligned double patterni...

Selective source/drain recess for improved performance, isolation,...

Fin field effect transistor devices with self-aligned gates

Alternating hardmasks for tight-pitch line formation

Tunable hardmask for overlayer metrology contrast

Alternating hardmasks for tight-pitch line formation

Fin cut profile using fin base liner

Vertical transport devices with greater density through modified we...

Measuring and modeling material planarization performance

Vertical transistors having multiple gate thicknesses for optimizin...

Vertical transistors having multiple gate thicknesses for optimizin...

Controlling fin hardmask cut profile using a sacrificial epitaxial...

Vertical transport static random-access memory cells with transisto...

Controlling gate length of vertical transistors

Verifying planarization performance using electrical measures

Approach to prevent collapse of high aspect ratio Fin structures fo...

Tunable hardmask for overlayer metrology contrast

Alternating hardmasks for tight-pitch line formation

Semiconductor fin length variability control

Vertical transistors having improved gate length control using unif...

Alternating hardmasks for tight-pitch line formation

Self-aligned double patterning formed fincut

Alternating hardmasks for tight-pitch line formation

Vertical transistor with variable gate length

Inverse tone direct print EUV lithography enabled by selective mate...

Margin for fin cut using self-aligned triple patterning

Patents Applicationslast 30 patents

STACKED TRANSISTORS WITH STEPPED CONTACTS

DIELECTRIC FILLED ALIGNMENT MARK STRUCTURES

SEPARATE EPITAXY IN MONOLITHIC STACKED AND STEPPED NANOSHEETS

STACKED FET SUBSTRATE CONTACT

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

COMMON SELF ALIGNED GATE CONTACT FOR STACKED TRANSISTOR STRUCTURES

SHALLOW AND DEEP CONTACTS WITH STITCHING

VIA CONNECTION TO BACKSIDE POWER DELIVERY NETWORK

HIGH ASPECT RATIO CONTACT STRUCTURE WITH MULTIPLE METAL STACKS

INTEGRATING GATE-CUTS AND SINGLE DIFFUSION BREAK ISOLATION POST-RMG...

BURIED POWER RAIL AT TIGHT CELL-TO-CELL SPACE

REPLACEMENT BURIED POWER RAIL

BOTTOM CONTACT FOR STACKED GAA FET

STRUCTURE CONTAINING A VIA-TO-BURIED POWER RAIL CONTACT STRUCTURE O...

STRUCTURE AND METHOD TO PATTERN PITCH LINES

BACKSIDE POWER RAILS

USING A SAME MASK FOR DIRECT PRINT AND SELF-ALIGNED DOUBLE PATTERNI...

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

USING A SAME MASK FOR DIRECT PRINT AND SELF-ALIGNED DOUBLE PATTERNI...

SELECTIVE SOURCE/DRAIN RECESS FOR IMPROVED PERFORMANCE, ISOLATION,...

FIN FIELD EFFECT TRANSISTOR DEVICES WITH SELF-ALIGNED GATES

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

Semiconductor Fin Length Variability Control

FIN CUT PROFILE USING FIN BASE LINER

CONTROLLING FIN HARDMASK CUT PROFILE USING A SACRIFICIAL EPITAXIAL...

APPROACH TO PREVENT COLLAPSE OF HIGH ASPECT RATIO FIN STRUCTURES FO...

CONTROLLING GATE LENGTH OF VERTICAL TRANSISTORS

ALTERNATING HARD MASK FOR TIGHT-PITCH FIN FORMATION

TUNABLE HARDMASK FOR OVERLAYER METROLOGY CONTRAST

Semiconductor Fin Length Variability Control