Taira Takase

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,825,589
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 11,705,356
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Kyouhei Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,032,899
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 10,727,101
- Issue date Jul 28, 2020
- Tokyo Electron Limited
- Kyouhei Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 8,118,936
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for an improved deposition shield in a plasma processing...
- Patent number 8,117,986
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Hidehito Saigusa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,811,428
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved bellows shield in a plasma pro...
- Patent number 7,678,226
- Issue date Mar 16, 2010
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, control method thereof and program for...
- Patent number 7,585,385
- Issue date Sep 8, 2009
- Tokyo Electron Limited
- Satoshi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate in a pla...
- Patent number 7,566,368
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved bellows shield in a plasma pro...
- Patent number 7,204,912
- Issue date Apr 17, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 7,166,166
- Issue date Jan 23, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate in a pla...
- Patent number 7,166,200
- Issue date Jan 23, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,163,585
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved deposition shield in a plasma...
- Patent number 7,137,353
- Issue date Nov 21, 2006
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 6,798,519
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning a plasma processing apparatus
- Patent number 6,790,289
- Issue date Sep 14, 2004
- Tokyo Electric Limited
- Taira Takase
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210267042
- Publication date Aug 26, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20200343122
- Publication date Oct 29, 2020
- TOKYO ELECTRON LIMITED
- Kyouhei YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200107429
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20140209245
- Publication date Jul 31, 2014
- TOKYO ELECTRON LIMITED
- Kyouhei YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PRO...
- Publication number 20070125494
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...
- Publication number 20070107846
- Publication date May 17, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20070102287
- Publication date May 10, 2007
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLA...
- Publication number 20070096658
- Publication date May 3, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved deposition shield in a plasma...
- Publication number 20070028839
- Publication date Feb 8, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, control method thereof and program for...
- Publication number 20060005927
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Satoshi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of cleaning a plasma processing apparatus
- Publication number 20040216769
- Publication date Nov 4, 2004
- TOKYO ELECTRON LIMITED
- Taira Takase
- B08 - CLEANING
Information Patent Application
Method and apparatus for an improved optical window deposition shie...
- Publication number 20040173155
- Publication date Sep 9, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved bellows shield in a plasma pro...
- Publication number 20040060656
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved deposition shield in a plasma...
- Publication number 20040060657
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20040060516
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved baffle plate in a plasma proce...
- Publication number 20040063333
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved upper electrode plate in a pla...
- Publication number 20040061447
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of cleaning a plasma processing apparatus
- Publication number 20030172952
- Publication date Sep 18, 2003
- TOKYO ELECTRON LIMITED
- Taira Takase
- B08 - CLEANING

Taira Takase

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Mounting table and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Mounting table and plasma processing apparatus

Method and apparatus for an improved baffle plate in a plasma proce...

Apparatus for an improved deposition shield in a plasma processing...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved bellows shield in a plasma pro...

Plasma processing apparatus, control method thereof and program for...

Method and apparatus for an improved upper electrode plate in a pla...

Method and apparatus for an improved bellows shield in a plasma pro...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved upper electrode plate in a pla...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved deposition shield in a plasma...

Method and apparatus for an improved optical window deposition shie...

Method of cleaning a plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PRO...

METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLA...

Method and apparatus for an improved deposition shield in a plasma...

Plasma processing apparatus, control method thereof and program for...

Method of cleaning a plasma processing apparatus

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved bellows shield in a plasma pro...

Method and apparatus for an improved deposition shield in a plasma...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved upper electrode plate in a pla...

Method of cleaning a plasma processing apparatus