Takako Yamaguchi

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Surface emitting laser manufacturing method, surface emitting laser...
- Patent number 8,068,529
- Issue date Nov 29, 2011
- Canon Kabushiki Kaisha
- Mitsuhiro Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface emitting laser manufacturing method, surface emitting laser...
- Patent number 7,863,061
- Issue date Jan 4, 2011
- Canon Kabushiki Kaisha
- Mitsuhiro Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive compound, photosensitive composition, resist pattern...
- Patent number 7,776,509
- Issue date Aug 17, 2010
- Canon Kabushiki Kaisha
- Toshiki Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sensor device and testing method utilizing localized plasmon resonance
- Patent number 7,733,491
- Issue date Jun 8, 2010
- Canon Kabushiki Kaisha
- Ryo Kuroda
- G01 - MEASURING TESTING
Information Patent Grant
Photosensitive silane coupling agent, method of modifying surface,...
- Patent number 7,704,672
- Issue date Apr 27, 2010
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Exposure mask, method of designing and manufacturing the same, expo...
- Patent number 7,691,540
- Issue date Apr 6, 2010
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Near-field exposure mask, method of producing that mask, near-field...
- Patent number 7,659,039
- Issue date Feb 9, 2010
- Canon Kabushiki Kaisha
- Toshiki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive compound, photosensitive composition, method for res...
- Patent number 7,651,834
- Issue date Jan 26, 2010
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive compound, photosensitive composition, resist pattern...
- Patent number 7,615,332
- Issue date Nov 10, 2009
- Canon Kabushiki Kaisha
- Toshiki Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of detecting relative position of exposure mask and object t...
- Patent number 7,592,108
- Issue date Sep 22, 2009
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive silane coupling agent, method of forming pattern, an...
- Patent number 7,547,503
- Issue date Jun 16, 2009
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Near-field exposure photoresist and fine pattern forming method usi...
- Patent number 7,419,763
- Issue date Sep 2, 2008
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical sensor
- Patent number 7,399,445
- Issue date Jul 15, 2008
- Canon Kabushiki Kaisha
- Ryo Kuroda
- G01 - MEASURING TESTING
Information Patent Grant
Photoresist, photolithography method using the same, and method for...
- Patent number 7,303,859
- Issue date Dec 4, 2007
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Near-field exposure apparatus and near-field exposure photomask
- Patent number 7,190,438
- Issue date Mar 13, 2007
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern-forming apparatus using a photomask
- Patent number 7,136,145
- Issue date Nov 14, 2006
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Near-field exposure photoresist and fine pattern forming method usi...
- Patent number 7,022,463
- Issue date Apr 4, 2006
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist, photolithography method using the same, and method for...
- Patent number 6,849,391
- Issue date Feb 1, 2005
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Near field light probe, near field optical microscope, near field l...
- Patent number 6,785,445
- Issue date Aug 31, 2004
- Canon Kabushiki Kaisha
- Ryo Kuroda
- G01 - MEASURING TESTING
Information Patent Grant
Exposure method and exposure apparatus using near-field light and e...
- Patent number 6,720,115
- Issue date Apr 13, 2004
- Canon Kabushiki Kaisha
- Yasuhisa Inao
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern-forming method using photomask, and pattern-forming apparatus
- Patent number 6,632,593
- Issue date Oct 14, 2003
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Light modulation apparatus and optical switch, movement detecting d...
- Patent number 6,628,392
- Issue date Sep 30, 2003
- Canon Kabushiki Kaisha
- Ryo Kuroda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus and pattern forming method
- Patent number 6,559,926
- Issue date May 6, 2003
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
NEAR-FIELD OPTICAL PROBE HAVING SURFACE PLASMON POLARITON WAVEGUIDE...
- Patent number 6,408,123
- Issue date Jun 18, 2002
- Canon Kabushiki Kaisha
- Ryo Kuroda
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER...
- Publication number 20110076058
- Publication date Mar 31, 2011
- Canon Kabushiki Kaisha
- Mitsuhiro Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER...
- Publication number 20100029027
- Publication date Feb 4, 2010
- Canon Kabushiki Kaisha
- Mitsuhiro Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...
- Publication number 20090233232
- Publication date Sep 17, 2009
- Canon Kabushiki Kaisha
- Toshiki Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Near-Field Exposure Mask, Method of Producing that Mask, Near-Field...
- Publication number 20090208850
- Publication date Aug 20, 2009
- Canon Kabushiki Kaisha
- Toshiki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
SENSOR DEVICE AND TESTING METHOD UTILIZING LOCALIZED PLASMON RESONANCE
- Publication number 20080246970
- Publication date Oct 9, 2008
- Canon Kabushiki Kaisha
- Ryo Kuroda
- G01 - MEASURING TESTING
Information Patent Application
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...
- Publication number 20080187864
- Publication date Aug 7, 2008
- Canon Kabushiki Kaisha
- Toshiki Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...
- Publication number 20080187865
- Publication date Aug 7, 2008
- Canon Kabushiki Kaisha
- Toshiki Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEAR-FIELD EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING TH...
- Publication number 20080107998
- Publication date May 8, 2008
- Canon Kabushiki Kaisha
- Yasuhisa Inao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD
- Publication number 20080085479
- Publication date Apr 10, 2008
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RES...
- Publication number 20070287105
- Publication date Dec 13, 2007
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, SU...
- Publication number 20070275327
- Publication date Nov 29, 2007
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive silane coupling agent, method of forming pattern, an...
- Publication number 20070218373
- Publication date Sep 20, 2007
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive silane coupling agent, method of modifying surface,...
- Publication number 20070218398
- Publication date Sep 20, 2007
- Canon Kabushiki Kaisha
- Toshiki Ito
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Near-field exposure photoresist and fine pattern forming method usi...
- Publication number 20070141483
- Publication date Jun 21, 2007
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist, photolithography method using the same, and method for...
- Publication number 20060263722
- Publication date Nov 23, 2006
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of detecting relative position of exposure mask and object t...
- Publication number 20060152703
- Publication date Jul 13, 2006
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Near-field exposure photoresist and fine pattern forming method usi...
- Publication number 20060078818
- Publication date Apr 13, 2006
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method based on near-field exposure, and sub...
- Publication number 20060014108
- Publication date Jan 19, 2006
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method, substrate processing method, and dev...
- Publication number 20060003269
- Publication date Jan 5, 2006
- Canon Kabushiki Kaisha
- Toshiki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure mask, method of designing and manufacturing the same, expo...
- Publication number 20060003233
- Publication date Jan 5, 2006
- Cannon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photosensitive resin composition, resist pattern forming method, su...
- Publication number 20050221222
- Publication date Oct 6, 2005
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Near-field exposure photoresist and fine pattern forming method usi...
- Publication number 20050079437
- Publication date Apr 14, 2005
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask manufacturing method
- Publication number 20050064301
- Publication date Mar 24, 2005
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photoresist, photolithography method using the same, and method for...
- Publication number 20050053859
- Publication date Mar 10, 2005
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask for near-field exposure, near-field exposure method, and...
- Publication number 20040166421
- Publication date Aug 26, 2004
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Pattern-forming apparatus using a photomask
- Publication number 20040023161
- Publication date Feb 5, 2004
- Canon Kabushiki Kaisha
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Chemical sensor
- Publication number 20030132392
- Publication date Jul 17, 2003
- CANON KABUSHIKI KAISHA
- Ryo Kuroda
- G01 - MEASURING TESTING
Information Patent Application
LIGHT MODULATION APPARATUS AND OPTICAL SWITCH, MOVEMENT DETECTING D...
- Publication number 20030128361
- Publication date Jul 10, 2003
- Ryo Kuroda`
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist, photolithography method using the same, and method for...
- Publication number 20030003393
- Publication date Jan 2, 2003
- Takako Yamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Near field light probe, near field optical microscope, near field l...
- Publication number 20020154859
- Publication date Oct 24, 2002
- Canon Kabushiki Kaisha
- Ryo Kuroda
- B82 - NANO-TECHNOLOGY

Takako Yamaguchi

Person

Patents Grantslast 30 patents

Surface emitting laser manufacturing method, surface emitting laser...

Surface emitting laser manufacturing method, surface emitting laser...

Photosensitive compound, photosensitive composition, resist pattern...

Sensor device and testing method utilizing localized plasmon resonance

Photosensitive silane coupling agent, method of modifying surface,...

Exposure mask, method of designing and manufacturing the same, expo...

Near-field exposure mask, method of producing that mask, near-field...

Photosensitive compound, photosensitive composition, method for res...

Photosensitive compound, photosensitive composition, resist pattern...

Method of detecting relative position of exposure mask and object t...

Photosensitive silane coupling agent, method of forming pattern, an...

Near-field exposure photoresist and fine pattern forming method usi...

Chemical sensor

Photoresist, photolithography method using the same, and method for...

Near-field exposure apparatus and near-field exposure photomask

Pattern-forming apparatus using a photomask

Near-field exposure photoresist and fine pattern forming method usi...

Photoresist, photolithography method using the same, and method for...

Near field light probe, near field optical microscope, near field l...

Exposure method and exposure apparatus using near-field light and e...

Pattern-forming method using photomask, and pattern-forming apparatus

Light modulation apparatus and optical switch, movement detecting d...

Pattern forming apparatus and pattern forming method

NEAR-FIELD OPTICAL PROBE HAVING SURFACE PLASMON POLARITON WAVEGUIDE...

Patents Applicationslast 30 patents

SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER...

SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER...

PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...

Near-Field Exposure Mask, Method of Producing that Mask, Near-Field...

SENSOR DEVICE AND TESTING METHOD UTILIZING LOCALIZED PLASMON RESONANCE

PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...

PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN...

NEAR-FIELD EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING TH...

PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD

PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RES...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, SU...

Photosensitive silane coupling agent, method of forming pattern, an...

Photosensitive silane coupling agent, method of modifying surface,...

Near-field exposure photoresist and fine pattern forming method usi...

Photoresist, photolithography method using the same, and method for...

Method of detecting relative position of exposure mask and object t...

Near-field exposure photoresist and fine pattern forming method usi...

Resist pattern forming method based on near-field exposure, and sub...

Resist pattern forming method, substrate processing method, and dev...

Exposure mask, method of designing and manufacturing the same, expo...

Photosensitive resin composition, resist pattern forming method, su...

Near-field exposure photoresist and fine pattern forming method usi...

Mask manufacturing method

Photoresist, photolithography method using the same, and method for...

Photomask for near-field exposure, near-field exposure method, and...

Pattern-forming apparatus using a photomask

Chemical sensor

LIGHT MODULATION APPARATUS AND OPTICAL SWITCH, MOVEMENT DETECTING D...

Photoresist, photolithography method using the same, and method for...

Near field light probe, near field optical microscope, near field l...