Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device

Abstract

Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl. group.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A, 1B, 1C and 1D are a process chart illustrating one embodiment of a method for forming a microparticle pattern using the photosensitive silane coupling agent according to the present invention.

FIGS. 2A, 2B, 2C and 2D are a schematic diagram illustrating a microparticle pattern formed by selectively arranging microparticles (A) only on an exposed portion or an unexposed portion.

FIG. 3 is an explanatory diagram illustrating the bond between a carboxyl group on the exposed substrate portion and an amino group on the surface end of a microparticle.

FIGS. 4A and 4B are an explanatory, diagram illustrating a dry etching process with microparticles as a mask.

FIGS. 5A, 5B and 5C are an explanatory diagram illustrating a lifting-off process with microparticles as a mask.

Claims

1. A photosensitive silane coupling agent comprising 1,2-naphthoquinone-2-diazido-5-sulfonyl group or, 2-naphthoquinone-2-diazido-4-sulfonyl group.

2. The photosensitive silane coupling agent according to claim 1, which has a structure represented by the general formula (1),

3. The photosensitive silane coupling agent according to claim 1, which has a structure represented by the general formula (2),

4. The photosensitive silane coupling agent according to claim 1, which has a structure represented by the general formula (3),

5. The photosensitive silane coupling agent according to claim 1, which has a structure represented by the general formula (4),

6. The photosensitive silane coupling agent according to claim 1, which has a structure represented by the general formula (5),

7. A method of modifying a surface comprising the steps of layering the photosensitive silane coupling agent according to claim 1 onto a surface of a support, and generating a carboxyl group on the photosensitive silane coupling agent by exposure.

8. A method of forming a microparticle pattern having a structure wherein a plurality of microparticles with an average particle diameter of at least 0.5 nm and at most 500 nm are arranged on a substrate, the method comprising the steps of: layering the photosensitive silane coupling agent according to claim 1 onto a surface of the substrate, exposing the photosensitive silane coupling agent layer patternwise, generating a carboxyl group on the photosensitive silane coupling agent in an exposed portion, and selectively arranging the microparticles on the exposed portion or unexposed portion.

9. The method of forming a microparticle pattern according to claim 8, further comprising the step of processing the substrate by etching with the microparticle pattern as a mask.

10. The method of forming a microparticle pattern according to claim 8, further comprising the steps of forming a film over the entire surface of the substrate on which the microparticle pattern is formed, and forming a film pattern by removing the microparticle pattern and the film formed thereon.

11. The method of forming a microparticle pattern according to claim 8, wherein the microparticles are arranged by using a colloidal solution comprising the microparticles.

12. The method of forming a microparticle pattern according to claim 8, wherein the exposure is performed using near-field light generated from an exposure mask which is provided with a light-shielding layer comprising an opening narrower than the wavelength of the exposure light source.

13. The method of forming a microparticle pattern according to claim 12, wherein the microparticles are formed of a material selected from the group consisting of metals, metal oxides, semiconductors and resins.

14. The method of forming a microparticle pattern according to claim 8, wherein the microparticles have an amino group on an end of the surface of the microparticles.

15. A method of fabricating a device using the method of forming a microparticle pattern according to claim 8.

16. A method of fabricating a single-electron device by forming minute tunnel junction sites using said method of forming a microparticle pattern according to claim 8.

17. A method of fabricating a patterned medium by forming a magnetic bit array using said method of forming a microparticle pattern according to claim 8.

18. A method of fabricating a chemical sensor by forming a metallic microparticle pattern using said method of forming a microparticle pattern according to claim 8.

19. A method of fabricating a quantum dot laser element by forming a quantum dot array structure using said method of forming a microparticle pattern according to claim 8.

20. A method of fabricating a photonic crystal optical device by forming a two-dimensional photonic crystal structure using said method of forming a microparticle pattern according to claim 8.