Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device

Abstract

Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A, 1B, 1C and 1D are a process chart illustrating one embodiment of a method for forming a pattern using the photosensitive silane coupling agent according to the present invention.

FIGS. 2A, 2B, 2C and 2D are a schematic diagram illustrating a pattern formed by selectively arranging microparticles only on an exposed portion or an unexposed portion.

FIG. 3 is an explanatory diagram illustrating the bonding between a secondary amine group of the exposed portion of the substrate and a carboxyl group on the surface end of the microparticle.

FIG. 4 is an explanatory diagram illustrating the bonding between a secondary amine group in the exposed portion of the substrate and an anhydrous carboxylic acid on the surface end of the microparticle.

FIGS. 5A and 5B are an explanatory diagram illustrating a dry etching process with microparticles as a mask.

FIGS. 6A, 6B and 6C are an explanatory diagram illustrating a lift-off process with microparticles as a mask.

Claims

1. A photosensitive silane coupling agent having a structure represented by the following general formula (1),

2. A method of forming a microparticle pattern having a structure wherein a plurality of microparticles which have an average particle diameter of at least 0.5 nm and at most 500 nm are arranged on a substrate, the method comprising the steps of: layering the photosensitive silane coupling agent according to claim 1 onto a surface of the substrate, exposing the photosensitive silane coupling agent patternwise, generating a carboxyl group on the photosensitive silane coupling agent layer in an exposed portion, and selectively arranging microparticles on the exposed portion or unexposed portion.

3. The method of forming a microparticle pattern according to claim 2, further comprising the step of processing the substrate by etching with the microparticle pattern as a mask.

4. The method of forming a microparticle pattern according to claim 2, further comprising the steps of forming a film over the entire substrate on which the microparticle pattern is formed, and forming a film pattern by removing the microparticle pattern and the film formed thereon.

5. The method of forming a microparticle pattern according to claim 2, wherein the microparticles are arranged by using a colloidal solution containing the microparticles.

6. The method of forming a microparticle pattern according to claim 2, wherein the exposure is carried out using near-field light generated from a photomask which is provided with a light-shielding layer comprising an opening narrower than the wavelength of the exposure light source.

7. The method of forming a microparticle pattern according to claim 2, wherein the microparticles are formed of a material selected from the group consisting of metals, metal oxides, semiconductors and resins.

8. The method of forming a microparticle pattern according to claim 2, wherein the microparticles have an amino group on an end of the surface of the microparticles.

9. A method of fabricating a device using the method of forming a microparticle pattern according to claim 2.

10. A method of fabricating a single-electron device by forming minute tunnel junction sites using said method of forming a microparticle pattern according to claim 2.

11. A method of fabricating a patterned medium by forming a magnetic bit array using said method of forming a microparticle pattern according to claim 2.

12. A method of fabricating a chemical sensor by forming a metallic microparticle pattern using said method of forming a microparticle pattern according to claim 2.

13. A method of fabricating a quantum dot laser element by forming a quantum dot array structure using said method of forming a microparticle pattern according to claim 2.

14. A method of fabricating a photonic crystal optical device by forming a two-dimensional photonic crystal structure using said method of forming a microparticle pattern according to claim 2.