Takao Arase

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Vacuum processing method
- Patent number 11,961,719
- Issue date Apr 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Nozomu Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,532,484
- Issue date Dec 20, 2022
- HITACHI HIGH-TECH CORPORATION
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,355,322
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,257,678
- Issue date Feb 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ring for a plasma processing apparatus
- Patent number D891636
- Issue date Jul 28, 2020
- HITACHI HIGH-TECH CORPORATION
- Masakazu Isozaki
- D24 - Medical and laboratory equipment
Information Patent Grant
Plasma processing apparatus
- Patent number 10,665,448
- Issue date May 26, 2020
- HITACHI HIGH-TECH CORPORATION
- Ken'etsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode plate peripheral ring for a plasma processing apparatus
- Patent number D871609
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Masakazu Isozaki
- D24 - Medical and laboratory equipment
Information Patent Grant
Electrode cover for a plasma processing apparatus
- Patent number D870314
- Issue date Dec 17, 2019
- Hitachi High-Technologies Corporation
- Masakazu Isozaki
- D24 - Medical and laboratory equipment
Information Patent Grant
Electrode plate for a plasma processing apparatus
- Patent number D868993
- Issue date Dec 3, 2019
- Hitachi High-Technologies Corporation
- Masakazu Isozaki
- D24 - Medical and laboratory equipment
Information Patent Grant
Method for controlling plasma processing apparatus
- Patent number 10,332,760
- Issue date Jun 25, 2019
- Hitachi High-Technologies Corporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,157,750
- Issue date Dec 18, 2018
- Hitachi High-Technologies Corporation
- Satoshi Terakura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing method
- Patent number 10,056,236
- Issue date Aug 21, 2018
- Hitachi High-Technologies Corporation
- Hayato Watanabe
- B08 - CLEANING
Information Patent Grant
Dry etching method
- Patent number 9,905,431
- Issue date Feb 27, 2018
- Hitachi High-Technologies Corporation
- Satoshi Terakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,887,070
- Issue date Feb 6, 2018
- Hitachi High-Technologies Corporation
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,779,919
- Issue date Oct 3, 2017
- Hitachi High-Technologies Corporation
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 9,230,782
- Issue date Jan 5, 2016
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for controlling plasma processing apparatus
- Patent number 9,136,095
- Issue date Sep 15, 2015
- Hitachi High-Technologies Coporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,900,401
- Issue date Dec 2, 2014
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,038,896
- Issue date Oct 18, 2011
- Hitachi High-Technologies Corporation
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manufacturing semiconductor devices
- Patent number 7,364,956
- Issue date Apr 29, 2008
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 7,098,138
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 6,617,255
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VACUUM PROCESSING METHOD
- Publication number 20230122903
- Publication date Apr 20, 2023
- Hitachi High-Tech Corporation
- Nozomu Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210249233
- Publication date Aug 12, 2021
- Hitachi High-Tech Corporation
- Hiroyuki Kajifusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200357650
- Publication date Nov 12, 2020
- Hitachi High-Technologies Corporation
- Tomohiro TAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200227270
- Publication date Jul 16, 2020
- Hitachi High-Technologies Corporation
- Taku IWASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190214235
- Publication date Jul 11, 2019
- Hitachi High-Technologies Corporation
- Kenetsu YOKOGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180082825
- Publication date Mar 22, 2018
- Hitachi High-Technologies Corporation
- Hayato WATANABE
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180068862
- Publication date Mar 8, 2018
- Hitachi High-Technologies Corporation
- Satoshi TERAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180040459
- Publication date Feb 8, 2018
- Hitachi High-Technologies Corporation
- Taku IWASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170338086
- Publication date Nov 23, 2017
- Hitachi High-Technologies Corporation
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160203958
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING PLASMA PROCESSING APPARATUS
- Publication number 20150357210
- Publication date Dec 10, 2015
- Hitachi High-Technologies Corporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20150221518
- Publication date Aug 6, 2015
- Hitachi High-Technologies Corporation
- Satoshi Terakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20150020970
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Eiji IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING PLASMA PROCESSING APPARATUS
- Publication number 20140225503
- Publication date Aug 14, 2014
- Hitachi High-Technologies Corporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140102640
- Publication date Apr 17, 2014
- Hitachi High-Technologies Corporation
- Ken'etsu YOKOGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100288195
- Publication date Nov 18, 2010
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma processing method and apparatus
- Publication number 20070281478
- Publication date Dec 6, 2007
- Eiji Ikegami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method for manufacturing semiconductor devices
- Publication number 20070026611
- Publication date Feb 1, 2007
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20060048892
- Publication date Mar 9, 2006
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20040175940
- Publication date Sep 9, 2004
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20010055885
- Publication date Dec 27, 2001
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Takao Arase

Person

Patents Grantslast 30 patents

Vacuum processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method

Ring for a plasma processing apparatus

Plasma processing apparatus

Electrode plate peripheral ring for a plasma processing apparatus

Electrode cover for a plasma processing apparatus

Electrode plate for a plasma processing apparatus

Method for controlling plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method

Dry etching method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus

Method for controlling plasma processing apparatus

Plasma processing method and apparatus

Plasma processing method and apparatus

Method for manufacturing semiconductor devices

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...

Patents Applicationslast 30 patents

VACUUM PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR CONTROLLING PLASMA PROCESSING APPARATUS

DRY ETCHING METHOD

PLASMA PROCESSING METHOD AND APPARATUS

METHOD FOR CONTROLLING PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND APPARATUS

Plasma processing method and apparatus

Method for manufacturing semiconductor devices

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...