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Negative type resist composition
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Issue date Nov 10, 2009
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Sumitomo Chemical Company, Limited
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Masumi Suetsugu
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Negative type resist composition
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Issue date Dec 11, 2001
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Sumitomo Chemical Company, Limited
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Masumi Suetsugu
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C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Positive photoresist composition
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Patent number 6,156,476
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Issue date Dec 5, 2000
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Sumitomo Chemical Company, Limited
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Naoki Takeyama
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Photoresist composition
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Patent number 5,846,688
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Issue date Dec 8, 1998
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Sumitomo Chemical Company, Limited
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Nobuhito Fukui
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Positive photoresist composition
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Patent number 5,800,966
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Issue date Sep 1, 1998
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Sumitomo Chemical Company, Limited
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Yuji Ueda
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Negative photoresist composition
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Patent number 5,304,456
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Issue date Apr 19, 1994
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Sumitomo Chemical Company, Limited
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Yuji Ueda
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Anthraquinone compound
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Sumitomo Chemical Company, Ltd.
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Yutaka Kayane
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C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...