Tatsuya Sato

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for metal oxide post-treatment
- Patent number 12,110,589
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap-fill with aluminum-containing films
- Patent number 12,018,363
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus to reduce pressure fluctuations in an ampoule...
- Patent number 11,566,327
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Ilker Durukan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous silicon doped yttrium oxide films and methods of formation
- Patent number 11,370,669
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Tatsuya E. Sato
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Apparatus and methods for depositing ALD films with enhanced chemic...
- Patent number 11,015,246
- Issue date May 25, 2021
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating air-gap spacer for N7/N5 finFET and beyond
- Patent number 9,960,275
- Issue date May 1, 2018
- Applied Materials, Inc.
- Chih-Yang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of films using spatially separated injector...
- Patent number 9,698,009
- Issue date Jul 4, 2017
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of adjusting a transistor gate flat band voltage with additi...
- Patent number 9,275,853
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ vapor phase surface activation of SiO2
- Patent number 8,778,816
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,658,522
- Issue date Feb 25, 2014
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for manufacturing high dielectric constant films
- Patent number 8,633,119
- Issue date Jan 21, 2014
- Applied Materials, Inc.
- Tatsuya E. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing high dielectric constant films
- Patent number 8,633,114
- Issue date Jan 21, 2014
- Applied Materials, Inc.
- Tatsuya E. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,375,892
- Issue date Feb 19, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 7,913,645
- Issue date Mar 29, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 7,902,050
- Issue date Mar 8, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of fabricating a high dielectric constant transistor gate us...
- Patent number 7,837,838
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for fabricating a high dielectric constant tra...
- Patent number 7,678,710
- Issue date Mar 16, 2010
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for fabricating a high dielectric constant tra...
- Patent number 7,645,710
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Christopher Sean Olsen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEAM FREE TITANIUM NITRIDE GAPFILL
- Publication number 20240404830
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Radhika P. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS TO REDUCE PRESSURE FLUCTUATIONS IN AN AMPOULE...
- Publication number 20220162752
- Publication date May 26, 2022
- Ilker DURUKAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF ATOMIC LAYER DEPOSITION
- Publication number 20220081769
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Kendrick H. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ALD OF METAL OXIDE USING ISSG
- Publication number 20210002765
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Tatsuya E. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Metal Oxide Post-Treatment
- Publication number 20200165725
- Publication date May 28, 2020
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gap-Fill With Aluminum-Containing Films
- Publication number 20200095674
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Amorphous Silicon Doped Yttrium Oxide Films And Methods of Formation
- Publication number 20190221426
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Tatsuya E. Sato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF FABRICATING AIR-GAP SPACER FOR N7/N5 FINFET AND BEYOND
- Publication number 20180122945
- Publication date May 3, 2018
- Applied Materials, Inc.
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Methods For Depositing ALD Films With Enhanced Chemic...
- Publication number 20170321325
- Publication date Nov 9, 2017
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Injector For Spatially Separated Atomic Layer Deposition Chamber
- Publication number 20160215392
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition Of Films Using Spatially Separated Injector...
- Publication number 20160217999
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Tatsuya E. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ADJUSTING A TRANSISTOR GATE FLAT BAND VOLTAGE WITH ADDITI...
- Publication number 20150031196
- Publication date Jan 29, 2015
- Applied Materials, Inc.
- Tatsuya SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20130149468
- Publication date Jun 13, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Manufacturing High Dielectric Constant Films
- Publication number 20120289052
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- TATSUYA E. SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Manufacturing High Dielectric Constant Films
- Publication number 20120289063
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- TATSUYA E. SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry Chemical Cleaning For Semiconductor Processing
- Publication number 20120220116
- Publication date Aug 30, 2012
- Applied Materials, Inc.
- Atif Noori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In Situ Vapor Phase Surface Activation Of SiO2
- Publication number 20120202357
- Publication date Aug 9, 2012
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-Situ Hydroxylation System
- Publication number 20120201959
- Publication date Aug 9, 2012
- Applied Materials, Inc.
- Kenric Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Process for Atomic Layer Deposition
- Publication number 20120135609
- Publication date May 31, 2012
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20110168093
- Publication date Jul 14, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GATE US...
- Publication number 20070218623
- Publication date Sep 20, 2007
- APPLIED MATERIALS, INC.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRA...
- Publication number 20070212896
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Christopher Sean Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRA...
- Publication number 20070212895
- Publication date Sep 13, 2007
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GAT...
- Publication number 20070209930
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for incorporating nitrogen in oxide films
- Publication number 20070141856
- Publication date Jun 21, 2007
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for incorporating nitrogen in oxide films
- Publication number 20070111458
- Publication date May 17, 2007
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS

Tatsuya Sato

Person

Patents Grantslast 30 patents

Methods for metal oxide post-treatment

Gap-fill with aluminum-containing films

Methods and apparatus to reduce pressure fluctuations in an ampoule...

Amorphous silicon doped yttrium oxide films and methods of formation

Apparatus and methods for depositing ALD films with enhanced chemic...

Treatments to enhance material structures

Method of fabricating air-gap spacer for N7/N5 finFET and beyond

Atomic layer deposition of films using spatially separated injector...

Method of adjusting a transistor gate flat band voltage with additi...

In situ vapor phase surface activation of SiO2

Methods and apparatus for incorporating nitrogen in oxide films

Methods for manufacturing high dielectric constant films

Methods for manufacturing high dielectric constant films

Methods and apparatus for incorporating nitrogen in oxide films

Methods and apparatus for incorporating nitrogen in oxide films

Methods and apparatus for incorporating nitrogen in oxide films

Method of fabricating a high dielectric constant transistor gate us...

Method and apparatus for fabricating a high dielectric constant tra...

Method and apparatus for fabricating a high dielectric constant tra...

Patents Applicationslast 30 patents

SEAM FREE TITANIUM NITRIDE GAPFILL

METHODS AND APPARATUS TO REDUCE PRESSURE FLUCTUATIONS IN AN AMPOULE...

METHODS OF ATOMIC LAYER DEPOSITION

THERMAL ALD OF METAL OXIDE USING ISSG

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

Methods For Metal Oxide Post-Treatment

Gap-Fill With Aluminum-Containing Films

Amorphous Silicon Doped Yttrium Oxide Films And Methods of Formation

METHOD OF FABRICATING AIR-GAP SPACER FOR N7/N5 FINFET AND BEYOND

Apparatus And Methods For Depositing ALD Films With Enhanced Chemic...

Injector For Spatially Separated Atomic Layer Deposition Chamber

Atomic Layer Deposition Of Films Using Spatially Separated Injector...

METHOD OF ADJUSTING A TRANSISTOR GATE FLAT BAND VOLTAGE WITH ADDITI...

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

Methods for Manufacturing High Dielectric Constant Films

Methods For Manufacturing High Dielectric Constant Films

Dry Chemical Cleaning For Semiconductor Processing

In Situ Vapor Phase Surface Activation Of SiO2

In-Situ Hydroxylation System

Apparatus and Process for Atomic Layer Deposition

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

METHOD OF FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GATE US...

METHOD AND APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRA...

METHOD AND APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRA...

APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GAT...

Methods and apparatus for incorporating nitrogen in oxide films

Methods and apparatus for incorporating nitrogen in oxide films