Terence M. Thomas

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low-stain polishing composition
- Patent number 9,633,865
- Issue date Apr 25, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing composition and methods relating thereto
- Patent number 8,563,436
- Issue date Oct 22, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Tirthankar Ghosh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing composition and methods relating thereto
- Patent number 8,540,893
- Issue date Sep 24, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Tirthankar Ghosh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymeric barrier removal polishing slurry
- Patent number 7,785,487
- Issue date Aug 31, 2010
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Terence M. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper polishing cleaning solution
- Patent number 7,387,964
- Issue date Jun 17, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Joseph K. So
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Polishing compositions for noble metals
- Patent number 7,270,762
- Issue date Sep 18, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Hongyu Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier polishing solution
- Patent number 7,253,111
- Issue date Aug 7, 2007
- Rohm and Haas Electronic Materials CMP Holding, Inc.
- Zhendong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten polishing solution
- Patent number 7,132,058
- Issue date Nov 7, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP system for metal deposition
- Patent number 7,084,059
- Issue date Aug 1, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Terence M. Thomas
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition
- Patent number 7,070,485
- Issue date Jul 4, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Craig D. Lack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step polishing solution for chemical mechanical planarization
- Patent number 6,971,945
- Issue date Dec 6, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for planarizing metal interconnects
- Patent number 6,936,541
- Issue date Aug 30, 2005
- Rohn and Haas Electronic Materials CMP Holdings, Inc.
- Jinru Bian
- B24 - GRINDING POLISHING
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,699,299
- Issue date Mar 2, 2004
- Rodel Holdings, Inc.
- Vikas Sachan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer with a resistant film
- Patent number 6,664,188
- Issue date Dec 16, 2003
- Terence M. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing of semiconductor substrates
- Patent number 6,641,631
- Issue date Nov 4, 2003
- Rodel Holdings, Inc.
- Terence M. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,616,717
- Issue date Sep 9, 2003
- Rodel Holdings, Inc.
- Vikas Sachan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions for insulator and metal CMP and methods relating thereto
- Patent number 6,607,424
- Issue date Aug 19, 2003
- Rodel Holdings, Inc.
- Wesley D. Costas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing of metal substrates
- Patent number 6,605,537
- Issue date Aug 12, 2003
- Rodel Holdings, Inc.
- Jinru Bian
- B24 - GRINDING POLISHING
Information Patent Grant
Dissolution of metal particles produced by polishing
- Patent number 6,602,112
- Issue date Aug 5, 2003
- Rodel Holdings, Inc.
- Tony Quan Tran
- B24 - GRINDING POLISHING
Information Patent Grant
Method and composition for polishing by CMP
- Patent number 6,530,824
- Issue date Mar 11, 2003
- Rodel Holdings, Inc.
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of removal rates in CMP
- Patent number 6,475,069
- Issue date Nov 5, 2002
- Rodel Holdings, Inc.
- Terence M. Thomas
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurries for metal
- Patent number 6,447,373
- Issue date Sep 10, 2002
- Rodel Holdings Inc.
- Craig D. Lack
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing compositions for semiconductor substrates
- Patent number 6,379,406
- Issue date Apr 30, 2002
- Rodel Holdings, Inc.
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,331,134
- Issue date Dec 18, 2001
- Rodel Holdings Inc.
- Vikas Sachan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Chemical Mechanical Polishing Composition And Methods Relating Thereto
- Publication number 20130217230
- Publication date Aug 22, 2013
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Tirthankar Ghosh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing composition and methods relating thereto
- Publication number 20100029079
- Publication date Feb 4, 2010
- Tirthankar Ghosh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low-stain polishing composition
- Publication number 20090215265
- Publication date Aug 27, 2009
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing Copper-Containing patterned wafers
- Publication number 20090215266
- Publication date Aug 27, 2009
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Alkaline barrier polishing slurry
- Publication number 20080276543
- Publication date Nov 13, 2008
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions and methods for improved planarization of copper utili...
- Publication number 20080029126
- Publication date Feb 7, 2008
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polymeric barrier removal polishing slurry
- Publication number 20070051917
- Publication date Mar 8, 2007
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Barrier polishing solution
- Publication number 20050236601
- Publication date Oct 27, 2005
- Zhendong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-STEP POLISHING SOLUTION FOR CHEMICAL MECHANICAL PLANARIZATION
- Publication number 20050194357
- Publication date Sep 8, 2005
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compositions and methods for low downforce pressure polishing of co...
- Publication number 20050136671
- Publication date Jun 23, 2005
- Wendy B. Goldberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compositions and methods for controlled polishing of copper
- Publication number 20050136670
- Publication date Jun 23, 2005
- Joseph G. Ameen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions and methods for polishing copper
- Publication number 20050104048
- Publication date May 19, 2005
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for planarizing metal interconnects
- Publication number 20040023492
- Publication date Feb 5, 2004
- Jinru Bian
- B24 - GRINDING POLISHING
Information Patent Application
Copper polishing cleaning solution
- Publication number 20030207778
- Publication date Nov 6, 2003
- Joseph K. So
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition and method for polishing in metal CMP
- Publication number 20030181046
- Publication date Sep 25, 2003
- Vikas Sachan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing compositions for noble metals
- Publication number 20030176072
- Publication date Sep 18, 2003
- Hongyu Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP system for metal deposition
- Publication number 20030166339
- Publication date Sep 4, 2003
- Terence M. Thomas
- B24 - GRINDING POLISHING
Information Patent Application
Tungsten polishing solution
- Publication number 20030139050
- Publication date Jul 24, 2003
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal polishing slurry having a static etch inhibitor and method of...
- Publication number 20030139047
- Publication date Jul 24, 2003
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Copper polishing cleaning solution
- Publication number 20030119692
- Publication date Jun 26, 2003
- Joseph K. So
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adapting a semiconductor wafer for planarization
- Publication number 20030020141
- Publication date Jan 30, 2003
- Terence M. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing composition for CMP having abrasive particles
- Publication number 20030006396
- Publication date Jan 9, 2003
- Hongyu Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and composition for polishing by CMP
- Publication number 20020146965
- Publication date Oct 10, 2002
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polishing compositions for noble metals
- Publication number 20020111027
- Publication date Aug 15, 2002
- Vikas Sachan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polishing of metal substrates
- Publication number 20020106897
- Publication date Aug 8, 2002
- Jinru Bian
- B24 - GRINDING POLISHING
Information Patent Application
Polishing of semiconductor substrates
- Publication number 20020083650
- Publication date Jul 4, 2002
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing composition
- Publication number 20020062600
- Publication date May 30, 2002
- Glenn C. Mandigo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing by CMP for optimized planarization
- Publication number 20020042199
- Publication date Apr 11, 2002
- Jinru Bian
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing compositions for noble metals
- Publication number 20020039839
- Publication date Apr 4, 2002
- Terence M. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Control of removal rates in CMP
- Publication number 20020019202
- Publication date Feb 14, 2002
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Terence M. Thomas

Person

Patents Grantslast 30 patents

Low-stain polishing composition

Chemical mechanical polishing composition and methods relating thereto

Chemical mechanical polishing composition and methods relating thereto

Polymeric barrier removal polishing slurry

Copper polishing cleaning solution

Polishing compositions for noble metals

Barrier polishing solution

Tungsten polishing solution

CMP system for metal deposition

Polishing composition

Multi-step polishing solution for chemical mechanical planarization

Method for planarizing metal interconnects

Composition and method for polishing in metal CMP

Semiconductor wafer with a resistant film

Polishing of semiconductor substrates

Composition and method for polishing in metal CMP

Compositions for insulator and metal CMP and methods relating thereto

Polishing of metal substrates

Dissolution of metal particles produced by polishing

Method and composition for polishing by CMP

Control of removal rates in CMP

Chemical mechanical polishing slurries for metal

Polishing compositions for semiconductor substrates

Composition and method for polishing in metal CMP

Patents Applicationslast 30 patents

Chemical Mechanical Polishing Composition And Methods Relating Thereto

Chemical mechanical polishing composition and methods relating thereto

Low-stain polishing composition

Polishing Copper-Containing patterned wafers

Alkaline barrier polishing slurry

Compositions and methods for improved planarization of copper utili...

Polymeric barrier removal polishing slurry

Barrier polishing solution

MULTI-STEP POLISHING SOLUTION FOR CHEMICAL MECHANICAL PLANARIZATION

Compositions and methods for low downforce pressure polishing of co...

Compositions and methods for controlled polishing of copper

Compositions and methods for polishing copper

Method for planarizing metal interconnects

Copper polishing cleaning solution

Composition and method for polishing in metal CMP

Polishing compositions for noble metals

CMP system for metal deposition

Tungsten polishing solution

Metal polishing slurry having a static etch inhibitor and method of...

Copper polishing cleaning solution

Adapting a semiconductor wafer for planarization

Polishing composition for CMP having abrasive particles

Method and composition for polishing by CMP

Polishing compositions for noble metals

Polishing of metal substrates

Polishing of semiconductor substrates

Polishing composition

Polishing by CMP for optimized planarization

Polishing compositions for noble metals

Control of removal rates in CMP