Thomas I. Wallow

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bonding thermoplastic polymers
- Patent number 7,390,377
- Issue date Jun 24, 2008
- Sandia Corporation
- Thomas I. Wallow
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Modified polycyclic polymers
- Patent number 6,794,459
- Issue date Sep 21, 2004
- Sumitomo Bakelite Co., Ltd.
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions comprising polycyclic polymers with acid l...
- Patent number 6,723,486
- Issue date Apr 20, 2004
- Sumitomo Bakelite Co., Ltd.
- Brian L. Goodall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of copolymers
- Patent number 6,677,419
- Issue date Jan 13, 2004
- International Business Machines Corporation
- Phillip J. Brock
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polycyclic polymers containing pendant cyclic anhydride groups
- Patent number 6,525,153
- Issue date Feb 25, 2003
- Sumitomo Bakelite Co., Ltd.
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polycyclic resist compositions with increased etch resistance
- Patent number 6,451,499
- Issue date Sep 17, 2002
- The B. F. Goodrich Company
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Modified polycyclic polymers
- Patent number 6,451,945
- Issue date Sep 17, 2002
- The B. F. Goodrich Company
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Norbornene sulfonamide polymers
- Patent number 6,420,503
- Issue date Jul 16, 2002
- Sumitomo Bakelite Co. Ltd.
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions with cyclic olefin polymers having lactone...
- Patent number 6,251,560
- Issue date Jun 26, 2001
- International Business Machines Corporation
- Thomas I. Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and process for its use
- Patent number 6,177,228
- Issue date Jan 23, 2001
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic photoresist composition and process for its use in the...
- Patent number 6,165,678
- Issue date Dec 26, 2000
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition with radiation sensitive acid generator
- Patent number 6,165,673
- Issue date Dec 26, 2000
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polycyclic resist compositions with increased etch resistance
- Patent number 6,147,177
- Issue date Nov 14, 2000
- The B. F. Goodrich Company
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Energy-sensitive resist material and a process for device fabricati...
- Patent number 5,998,099
- Issue date Dec 7, 1999
- Lucent Technologies Inc.
- Francis Michael Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy-sensitive resist material and a process for device fabricati...
- Patent number 5,879,857
- Issue date Mar 9, 1999
- Lucent Technologies Inc.
- Edwin Arthur Chandross
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy-sensitive resist material and a process for device fabricati...
- Patent number 5,843,624
- Issue date Dec 1, 1998
- Lucent Technologies Inc.
- Francis Michael Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Modified polycyclic polymers
- Publication number 20030018153
- Publication date Jan 23, 2003
- The B.F.Goodrich Company
- Saikumar Jayaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist compositions comprising polycyclic polymers with acid l...
- Publication number 20020128408
- Publication date Sep 12, 2002
- Brian L. Goodall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Thomas I. Wallow

Person

Patents Grantslast 30 patents

Bonding thermoplastic polymers

Modified polycyclic polymers

Photoresist compositions comprising polycyclic polymers with acid l...

Preparation of copolymers

Polycyclic polymers containing pendant cyclic anhydride groups

Polycyclic resist compositions with increased etch resistance

Modified polycyclic polymers

Norbornene sulfonamide polymers

Photoresist compositions with cyclic olefin polymers having lactone...

Photoresist composition and process for its use

Lithographic photoresist composition and process for its use in the...

Resist composition with radiation sensitive acid generator

Polycyclic resist compositions with increased etch resistance

Energy-sensitive resist material and a process for device fabricati...

Energy-sensitive resist material and a process for device fabricati...

Energy-sensitive resist material and a process for device fabricati...

Patents Applicationslast 30 patents

Modified polycyclic polymers

Photoresist compositions comprising polycyclic polymers with acid l...