Tsunehiko Tsubone

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,282,848
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method of a temperature of a sample
- Patent number 8,093,529
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- G01 - MEASURING TESTING
Information Patent Grant
Manufacturing method in plasma processing apparatus
- Patent number 8,092,637
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and vacuum processing method of sample
- Patent number 7,947,189
- Issue date May 24, 2011
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,567,422
- Issue date Jul 28, 2009
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 7,367,135
- Issue date May 6, 2008
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrode cover for a plasma processing apparatus
- Patent number D557226
- Issue date Dec 11, 2007
- Hitachi High-Technologies Corporation
- Takeo Uchino
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma processing method
- Patent number 7,303,998
- Issue date Dec 4, 2007
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,296,783
- Issue date Nov 20, 2007
- Hitachi High-Technologies Corporation
- Hideki Kihara
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Vacuum processing operating method with wafers, substrates and/or s...
- Patent number RE39823
- Issue date Sep 11, 2007
- Hitachi, Ltd.
- Shigekazu Kato
- 034 - Drying and gas or vapor contact with solids
Information Patent Grant
Vacuum processing apparatus and operating method with wafers, subst...
- Patent number RE39776
- Issue date Aug 21, 2007
- Hitachi, Ltd.
- Shigekazu Kato
- 034 - Drying and gas or vapor contact with solids
Information Patent Grant
Vacuum processing operating method with wafers, substrates and/or s...
- Patent number RE39756
- Issue date Aug 7, 2007
- Hitachi, Ltd.
- Shigekazu Kato
- 034 - Drying and gas or vapor contact with solids
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 7,089,680
- Issue date Aug 15, 2006
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 6,968,630
- Issue date Nov 29, 2005
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 6,904,699
- Issue date Jun 14, 2005
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,899,789
- Issue date May 31, 2005
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 6,886,272
- Issue date May 3, 2005
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 6,880,264
- Issue date Apr 19, 2005
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,846,363
- Issue date Jan 25, 2005
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,833,051
- Issue date Dec 21, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,756,737
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Akira Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,676,805
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 6,662,465
- Issue date Dec 16, 2003
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method therefor
- Patent number 6,655,044
- Issue date Dec 2, 2003
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,645,871
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 6,634,116
- Issue date Oct 21, 2003
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 6,625,899
- Issue date Sep 30, 2003
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,170
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,171
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 6,588,121
- Issue date Jul 8, 2003
- Hitachi, Ltd.
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200066492
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Shintarou NAKATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160217980
- Publication date Jul 28, 2016
- Hitachi High-Technologies Corporation
- Shintarou NAKATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20120000774
- Publication date Jan 5, 2012
- Ken Yoshioka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20090321017
- Publication date Dec 31, 2009
- Tsunehiko Tsubone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE TEMPERATURE CONTROL METHOD
- Publication number 20090310645
- Publication date Dec 17, 2009
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- G01 - MEASURING TESTING
Information Patent Application
MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS
- Publication number 20090218316
- Publication date Sep 3, 2009
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus including electrostatic chuck with buil...
- Publication number 20090178764
- Publication date Jul 16, 2009
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method Capable of Adjusting Tempera...
- Publication number 20090078563
- Publication date Mar 26, 2009
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method Capable Of Adjusting Tempera...
- Publication number 20090065145
- Publication date Mar 12, 2009
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum prcessing apparatus and vacuum processing method of sample
- Publication number 20090000741
- Publication date Jan 1, 2009
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20080280451
- Publication date Nov 13, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080170969
- Publication date Jul 17, 2008
- Ken Yoshioka
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080121344
- Publication date May 29, 2008
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20070240825
- Publication date Oct 18, 2007
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample holding electrode and a plasma processing apparatus using th...
- Publication number 20070209933
- Publication date Sep 13, 2007
- Ken Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Apparatus And Vacuum Processing Method Of Sample
- Publication number 20070170149
- Publication date Jul 26, 2007
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20070035908
- Publication date Feb 15, 2007
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck, wafer processing apparatus and plasma processi...
- Publication number 20060291132
- Publication date Dec 28, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method capable of adjusting tempera...
- Publication number 20060283549
- Publication date Dec 21, 2006
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and vacuum processing method of sample
- Publication number 20060237391
- Publication date Oct 26, 2006
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for processing wafer
- Publication number 20060191482
- Publication date Aug 31, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus
- Publication number 20060169939
- Publication date Aug 3, 2006
- Hideki Kihara
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20060042757
- Publication date Mar 2, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and operating method therefor
- Publication number 20060032073
- Publication date Feb 16, 2006
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20050242060
- Publication date Nov 3, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050051098
- Publication date Mar 10, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and operating method therefor
- Publication number 20040187338
- Publication date Sep 30, 2004
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and operating method therefor
- Publication number 20040187337
- Publication date Sep 30, 2004
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and operating method therefor
- Publication number 20040074104
- Publication date Apr 22, 2004
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and operating method therefor
- Publication number 20040074103
- Publication date Apr 22, 2004
- Shigekazu Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tsunehiko Tsubone

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Control method of a temperature of a sample

Manufacturing method in plasma processing apparatus

Vacuum processing apparatus and vacuum processing method of sample

Plasma processing apparatus and plasma processing method

Vacuum processing apparatus and operating method therefor

Electrode cover for a plasma processing apparatus

Plasma processing method

Vacuum processing apparatus

Vacuum processing operating method with wafers, substrates and/or s...

Vacuum processing apparatus and operating method with wafers, subst...

Vacuum processing operating method with wafers, substrates and/or s...

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor

Method of holding substrate and substrate holding system

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Method of holding substrate and substrate holding system

Vacuum processing apparatus

Vacuum processing apparatus and operating method therefor

Method of holding substrate and substrate holding system

Vacuum processing apparatus

Vacuum processing apparatus

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Vacuum processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus

Plasma Processing Apparatus and Plasma Processing Method

SAMPLE TEMPERATURE CONTROL METHOD

MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS

Plasma processing apparatus including electrostatic chuck with buil...

Plasma Processing Apparatus And Method Capable of Adjusting Tempera...

Plasma Processing Apparatus And Method Capable Of Adjusting Tempera...

Vacuum prcessing apparatus and vacuum processing method of sample

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Wafer processing apparatus capable of controlling wafer temperature

Sample holding electrode and a plasma processing apparatus using th...

Vacuum Processing Apparatus And Vacuum Processing Method Of Sample

Plasma processing apparatus and plasma processing method

Electrostatic chuck, wafer processing apparatus and plasma processi...

Plasma processing apparatus and method capable of adjusting tempera...

Vacuum processing apparatus and vacuum processing method of sample

Apparatus and method for processing wafer

Vacuum processing apparatus

Wafer processing apparatus capable of controlling wafer temperature

Vacuum processing apparatus and operating method therefor

Plasma processing method

Plasma processing apparatus

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor

Vacuum processing apparatus and operating method therefor