Vinay Prabhakar

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 12,211,728
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced chemical vapor deposition of carbon hard-mask
- Patent number 12,136,549
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Byung Seok Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal for substrate processing chambers
- Patent number 12,000,048
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate pedestal for improved substrate processing
- Patent number 11,984,305
- Issue date May 14, 2024
- Applied Materials, Inc.
- Viren Kalsekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber with reduced plasma arc
- Patent number 11,875,969
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated pedestal design for improved heat transfer and temperature u...
- Patent number 11,830,706
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 11,682,574
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber configurations and processes for particle control
- Patent number 11,670,492
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Targeted heat control systems
- Patent number 11,600,470
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal for substrate processing chambers
- Patent number 11,584,994
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate pedestal for improved substrate processing
- Patent number 11,587,773
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Viren Kalsekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF grounding configuration for pedestals
- Patent number 11,569,072
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of reducing chamber residues
- Patent number 11,560,623
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Liangfa Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber and methods for cleaning the same
- Patent number 11,532,463
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- B08 - CLEANING
Information Patent Grant
Thermally controlled lid stack components
- Patent number 11,515,176
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Siva Chandrasekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation shield modification for improving substrate temperature u...
- Patent number 11,515,129
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Elizabeth Neville
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of hardmask
- Patent number 10,923,334
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bevel etch profile control
- Patent number 10,629,427
- Issue date Apr 21, 2020
- Applied Materials, Inc.
- Zonghui Su
- B08 - CLEANING
Information Patent Grant
Critical methodology in vacuum chambers to determine gap and leveli...
- Patent number 10,599,043
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Hiroyuki Ogiso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterned chuck for substrate processing
- Patent number 10,446,430
- Issue date Oct 15, 2019
- Intevac, Inc.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etch profile control
- Patent number 10,276,364
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Zonghui Su
- B08 - CLEANING
Information Patent Grant
Substrate processing system and method
- Patent number 9,875,922
- Issue date Jan 23, 2018
- Intevac, Inc.
- Terry Pederson
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Grid for plasma ion implant
- Patent number 9,583,661
- Issue date Feb 28, 2017
- Intevac, Inc.
- Vinay Prabhakar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant masking and alignment system with rollers
- Patent number 9,543,114
- Issue date Jan 10, 2017
- Intevac, Inc.
- Babak Adibi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and method
- Patent number 9,324,598
- Issue date Apr 26, 2016
- Intevac, Inc.
- Terry Pederson
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Grid for plasma ion implant
- Patent number 9,318,332
- Issue date Apr 19, 2016
- Intevac, Inc.
- Vinay Prabhakar
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Wafer electroplating apparatus for reducing edge defects
- Patent number 8,172,992
- Issue date May 8, 2012
- Novellus Systems, Inc.
- Vinay Prabhakar
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
CERAMIC RF RETURN KIT DESIGN
- Publication number 20250118577
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Vellaichamy Nagappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH RF RETURN PATH
- Publication number 20250118593
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Vellaichamy NAGAPPAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20250022709
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL CHOKE PLATE
- Publication number 20240186121
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Vellaichamy Nagappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE
- Publication number 20240047185
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Abhijit A. Kangude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK DESIGN WITH IMPROVED CHUCKING AND ARCING PERFOR...
- Publication number 20230298922
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20230298870
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PUMPING LINER AND METHODS OF MANUFACTURE AND USE THEREOF
- Publication number 20230265560
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Badri Narayan Ramamurthi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20230203659
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Sarah Michelle BOBEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20230170190
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20230151487
- Publication date May 18, 2023
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PEDESTAL FOR IMPROVED SUBSTRATE PROCESSING
- Publication number 20230147452
- Publication date May 11, 2023
- Applied Materials, Inc.
- Viren KALSEKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANIFOLD FOR EQUAL SPLITTING AND COMMON DIVERT ARCHITECTURE
- Publication number 20230124246
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Arun Chakravarthy Chakravarthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CHOKE PLATE
- Publication number 20230069317
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Siva Chandrasekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20220122823
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PROCESS SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20220020615
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMALLY CONTROLLED LID STACK COMPONENTS
- Publication number 20210320018
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Siva Chandrasekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM PURGE FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20210320017
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT WITH WAFER BACKSIDE DAMAGE CONTROL
- Publication number 20210287924
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TARGETED HEAT CONTROL SYSTEMS
- Publication number 20210202218
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIATION SHIELD MODIFICATION FOR IMPROVING SUBSTRATE TEMPERATURE U...
- Publication number 20210166921
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Elizabeth Neville
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL RF FOR CONTROLLABLE FILM DEPOSITION
- Publication number 20210159048
- Publication date May 27, 2021
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF FORMATION OF A METAL HARDMASK IN DEVICE FABR...
- Publication number 20210082696
- Publication date Mar 18, 2021
- Applied Materials, Inc.
- Xiaoquan MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS WITH IMPROVED UNIFORMITY
- Publication number 20210066039
- Publication date Mar 4, 2021
- Applied Materials, Inc.
- Jian LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20210043455
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER AND METHODS FOR CLEANING THE SAME
- Publication number 20210035781
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK FOR DAMAGE-FREE SUBSTRATE PROCESSING
- Publication number 20210025056
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESOLVING SPONTANEOUS ARCING DURING THICK FILM DEPOSITION OF HIGH T...
- Publication number 20210017645
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Lu XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-LID STRUCTURE FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20210013069
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Viren Kalsekar
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
SUBSTRATE PEDESTAL FOR IMPROVED SUBSTRATE PROCESSING
- Publication number 20200373132
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Viren KALSEKAR
- H01 - BASIC ELECTRIC ELEMENTS

Vinay Prabhakar

Person

Patents Grantslast 30 patents

Multiple process semiconductor processing system

Electrostatic chuck design with improved chucking and arcing perfor...

Dual RF for controllable film deposition

Plasma-enhanced chemical vapor deposition of carbon hard-mask

Pedestal for substrate processing chambers

Substrate pedestal for improved substrate processing

Process chamber with reduced plasma arc

Heated pedestal design for improved heat transfer and temperature u...

Electrostatic chuck design with improved chucking and arcing perfor...

Chamber configurations and processes for particle control

Targeted heat control systems

Pedestal for substrate processing chambers

Substrate pedestal for improved substrate processing

RF grounding configuration for pedestals

Methods of reducing chamber residues

Semiconductor processing chamber and methods for cleaning the same

Thermally controlled lid stack components

Radiation shield modification for improving substrate temperature u...

Selective deposition of hardmask

Bevel etch profile control

Critical methodology in vacuum chambers to determine gap and leveli...

Patterned chuck for substrate processing

Bevel etch profile control

Substrate processing system and method

Grid for plasma ion implant

Implant masking and alignment system with rollers

Substrate processing system and method

Grid for plasma ion implant

Wafer electroplating apparatus for reducing edge defects

Patents Applicationslast 30 patents

CERAMIC RF RETURN KIT DESIGN

PROCESSING CHAMBER WITH RF RETURN PATH

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

THERMAL CHOKE PLATE

SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE

ELECTROSTATIC CHUCK DESIGN WITH IMPROVED CHUCKING AND ARCING PERFOR...

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

PUMPING LINER AND METHODS OF MANUFACTURE AND USE THEREOF

PEDESTAL FOR SUBSTRATE PROCESSING CHAMBERS

RF GROUNDING CONFIGURATION FOR PEDESTALS

METHODS OF REDUCING CHAMBER RESIDUES

SUBSTRATE PEDESTAL FOR IMPROVED SUBSTRATE PROCESSING

MANIFOLD FOR EQUAL SPLITTING AND COMMON DIVERT ARCHITECTURE

THERMAL CHOKE PLATE

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

MULTIPLE PROCESS SEMICONDUCTOR PROCESSING SYSTEM

THERMALLY CONTROLLED LID STACK COMPONENTS

BOTTOM PURGE FOR SEMICONDUCTOR PROCESSING SYSTEM

SEMICONDUCTOR SUBSTRATE SUPPORT WITH WAFER BACKSIDE DAMAGE CONTROL

TARGETED HEAT CONTROL SYSTEMS

RADIATION SHIELD MODIFICATION FOR IMPROVING SUBSTRATE TEMPERATURE U...

DUAL RF FOR CONTROLLABLE FILM DEPOSITION

SYSTEMS AND METHODS OF FORMATION OF A METAL HARDMASK IN DEVICE FABR...

SEMICONDUCTOR PROCESSING APPARATUS WITH IMPROVED UNIFORMITY

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

SEMICONDUCTOR PROCESSING CHAMBER AND METHODS FOR CLEANING THE SAME

ELECTROSTATIC CHUCK FOR DAMAGE-FREE SUBSTRATE PROCESSING

RESOLVING SPONTANEOUS ARCING DURING THICK FILM DEPOSITION OF HIGH T...

MULTI-LID STRUCTURE FOR SEMICONDUCTOR PROCESSING SYSTEM

SUBSTRATE PEDESTAL FOR IMPROVED SUBSTRATE PROCESSING