Walter Spiess

Person

Sulzbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Nanoimprint resist
- Patent number 7,431,858
- Issue date Oct 7, 2008
- AZ Electronic Materials (Germany) GmbH
- Walter Spiess
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Negative-working radiation-sensitive mixture, and radiation-sensiti...
- Patent number 6,063,545
- Issue date May 16, 2000
- Clariant GmbH
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...
- Patent number 5,716,756
- Issue date Feb 10, 1998
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition comprising a mixed ester of trishy...
- Patent number 5,612,164
- Issue date Mar 18, 1997
- Hoechst Celanese Corporation
- Anthony Canize
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-acting radiation-sensitive mixture and recording material...
- Patent number 5,498,506
- Issue date Mar 12, 1996
- Hoechst Aktiengesellschaft
- Horst Wengenroth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,442,061
- Issue date Aug 15, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixture containing diazomethan...
- Patent number 5,424,166
- Issue date Jun 13, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixture and radiation-sensitiv...
- Patent number 5,401,608
- Issue date Mar 28, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Postive-working radiation-sensitive mixture and radiation-sensitive...
- Patent number 5,364,734
- Issue date Nov 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compounds with acid-labile protective groups useful in positive-wor...
- Patent number 5,356,752
- Issue date Oct 18, 1994
- Hoechst Aktiengesellschaft
- Ivan Cabrera
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...
- Patent number 5,346,806
- Issue date Sep 13, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable radiation-sensitive compounds, positive working radi...
- Patent number 5,346,804
- Issue date Sep 13, 1994
- Hoechst Aktiengesellschaft
- Geog Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,298,364
- Issue date Mar 29, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substituted 1-sulfonyloxy-2-pyridones and process for preparing them
- Patent number 5,286,867
- Issue date Feb 15, 1994
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable compounds, positive-working radiation-sensitive mixt...
- Patent number 5,286,602
- Issue date Feb 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,256,517
- Issue date Oct 26, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixtures, and radiation-sensit...
- Patent number 5,230,985
- Issue date Jul 27, 1993
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixtures, and radiation-sensit...
- Patent number 5,229,254
- Issue date Jul 20, 1993
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Nanoimprint resist
- Publication number 20050224452
- Publication date Oct 13, 2005
- Walter Spiess
- B82 - NANO-TECHNOLOGY

Walter Spiess

Person

Patents Grantslast 30 patents

Nanoimprint resist

Negative-working radiation-sensitive mixture, and radiation-sensiti...

Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...

Positive photoresist composition comprising a mixed ester of trishy...

Positive-acting radiation-sensitive mixture and recording material...

Radiation-sensitive sulfonic acid esters and their use

Negative-working radiation-sensitive mixture containing diazomethan...

Negative-working radiation-sensitive mixture and radiation-sensitiv...

Postive-working radiation-sensitive mixture and radiation-sensitive...

Compounds with acid-labile protective groups useful in positive-wor...

Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...

Acid-cleavable radiation-sensitive compounds, positive working radi...

Radiation-sensitive sulfonic acid esters and their use

Substituted 1-sulfonyloxy-2-pyridones and process for preparing them

Acid-cleavable compounds, positive-working radiation-sensitive mixt...

Positive-working radiation-sensitive mixture and recording material...

Negative-working radiation-sensitive mixtures, and radiation-sensit...

Positive-working radiation-sensitive mixtures, and radiation-sensit...

Patents Applicationslast 30 patents

Nanoimprint resist