Wataru NIHASHI

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 11,640,113
- Issue date May 2, 2023
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative tone photosensitive composition for EUV light, pattern for...
- Patent number 11,573,491
- Issue date Feb 7, 2023
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, method fo...
- Patent number 11,460,769
- Issue date Oct 4, 2022
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 10,962,884
- Issue date Mar 30, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
- Patent number 10,890,847
- Issue date Jan 12, 2021
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method and electronic device manufacturing method
- Patent number 10,788,754
- Issue date Sep 29, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,761,426
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,663,864
- Issue date May 26, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing liquid, pattern forming method, and electronic device manuf...
- Patent number 10,599,038
- Issue date Mar 24, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer, pattern forming method, and electronic device manufactur...
- Patent number 10,562,991
- Issue date Feb 18, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 10,444,627
- Issue date Oct 15, 2019
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method for manufacturing electronic device
- Patent number 10,394,127
- Issue date Aug 27, 2019
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,095,111
- Issue date Oct 9, 2018
- FUJIFILM Corporation
- Wataru Nihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, active light sensitive or radiation sensiti...
- Patent number 9,651,863
- Issue date May 16, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,551,933
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, actinic ray-sensitive or radiation-sensitive resin compos...
- Patent number 9,527,809
- Issue date Dec 27, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,423,690
- Issue date Aug 23, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,291,897
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,898
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,896
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVE...
- Publication number 20210200098
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Wataru NIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE TONE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FOR...
- Publication number 20210011380
- Publication date Jan 14, 2021
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SEN...
- Publication number 20190276575
- Publication date Sep 12, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190219921
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...
- Publication number 20190219922
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190187558
- Publication date Jun 20, 2019
- FUJIFILM CORPORATION
- Wataru NIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20190018317
- Publication date Jan 17, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20180364568
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20180364569
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180321589
- Publication date Nov 8, 2018
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180267404
- Publication date Sep 20, 2018
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217503
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217499
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Shuji HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20180186907
- Publication date Jul 5, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180181003
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180180996
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20180120705
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...
- Publication number 20180120708
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180101100
- Publication date Apr 12, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180017872
- Publication date Jan 18, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20170153545
- Publication date Jun 1, 2017
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170075222
- Publication date Mar 16, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147154
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20160041465
- Publication date Feb 11, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20160024005
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- NATSUMI YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150185610
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20150168834
- Publication date Jun 18, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147688
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150140484
- Publication date May 21, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Wataru NIHASHI

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Negative tone photosensitive composition for EUV light, pattern for...

Actinic ray-sensitive or radiation-sensitive composition, method fo...

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing el...

Pattern forming method and electronic device manufacturing method

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, method for manufacturing electronic device,...

Rinsing liquid, pattern forming method, and electronic device manuf...

Developer, pattern forming method, and electronic device manufactur...

Pattern formation method, active light-sensitive or radiation-sensi...

Pattern forming method and method for manufacturing electronic device

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, active light sensitive or radiation sensiti...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Compound, actinic ray-sensitive or radiation-sensitive resin compos...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVE...

NEGATIVE TONE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FOR...

METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SEN...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

TREATMENT LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD

RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...