WILLIAM FRUCHTERMAN

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for physical vapor deposition (PVD) dielectri...
- Patent number 11,842,890
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,810,770
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter target for a physical vapor deposition chamber
- Patent number D970566
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Martin Riker
- D15 - Machines not elsewhere specified
Information Patent Grant
Methods and apparatus to prevent interference between processing ch...
- Patent number 11,335,577
- Issue date May 17, 2022
- Applied Materials, Inc.
- Fuhong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter target for a physical vapor deposition chamber
- Patent number D937329
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Martin Riker
- D15 - Machines not elsewhere specified
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,037,768
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus to prevent interference between processing ch...
- Patent number 10,438,828
- Issue date Oct 8, 2019
- Applied Materials, Inc.
- Fuhong Zhang
- G05 - CONTROLLING REGULATING
Information Patent Grant
Physical vapor deposition (PVD) target having low friction pads
- Patent number 9,960,021
- Issue date May 1, 2018
- Applied Materials, Inc.
- Martin Lee Riker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRI...
- Publication number 20240105433
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Jothilingam RAMALINGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20220020577
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20210071294
- Publication date Mar 11, 2021
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRI...
- Publication number 20210050195
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jothilingam RAMALINGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus To Prevent Interference Between Processing Ch...
- Publication number 20200035527
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Fuhong Zhang
- G05 - CONTROLLING REGULATING
Information Patent Application
Methods and Apparatus to Prevent Interference Between Processing Ch...
- Publication number 20180096871
- Publication date Apr 5, 2018
- Applied Materials, Inc.
- Fuhong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20170253959
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS
- Publication number 20150354054
- Publication date Dec 10, 2015
- Applied Materials, Inc.
- WILLIAM R. FRUCHTERMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) TARGET HAVING LOW FRICTION PADS
- Publication number 20150170888
- Publication date Jun 18, 2015
- Applied Materials, Inc.
- MARTIN LEE RIKER
- H01 - BASIC ELECTRIC ELEMENTS

WILLIAM FRUCHTERMAN

Person

Patents Grantslast 30 patents

Methods and apparatus for controlling ion fraction in physical vapo...

Methods and apparatus for physical vapor deposition (PVD) dielectri...

Methods and apparatus for controlling ion fraction in physical vapo...

Sputter target for a physical vapor deposition chamber

Methods and apparatus to prevent interference between processing ch...

Sputter target for a physical vapor deposition chamber

Methods and apparatus for controlling ion fraction in physical vapo...

Methods and apparatus to prevent interference between processing ch...

Physical vapor deposition (PVD) target having low friction pads

Patents Applicationslast 30 patents

METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRI...

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRI...

Methods And Apparatus To Prevent Interference Between Processing Ch...

Methods and Apparatus to Prevent Interference Between Processing Ch...

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS

PHYSICAL VAPOR DEPOSITION (PVD) TARGET HAVING LOW FRICTION PADS