Wolfgang Harnisch

Person

Lehesten, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and device for measuring the relative local position error o...
- Patent number 8,731,273
- Issue date May 20, 2014
- Carl Zeiss SMS GmbH
- Michael Arnz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for mask inspection for mask design and mask production
- Patent number 8,705,838
- Issue date Apr 22, 2014
- Carl Zeiss SMS GmbH
- Klaus Boehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microscope imaging system and method for emulating a high aperture...
- Patent number RE44216
- Issue date May 14, 2013
- Carl Zeiss SMS GmbH
- Michael Totzeck
- 359 - Optical: systems and elements
Information Patent Grant
Method and arrangement for repairing photolithography masks
- Patent number 7,916,930
- Issue date Mar 29, 2011
- Carl Zeiss SMS GmbH
- Axel Zibold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective X-ray microscope and inspection system for examining obj...
- Patent number 7,623,620
- Issue date Nov 24, 2009
- Carl Zeiss SMT AG
- Hans-Jürgen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Arrangement for inspecting objects, especially masks in microlithog...
- Patent number 7,525,115
- Issue date Apr 28, 2009
- Carl Zeiss SMS GmbH
- Hans-Juergen Dobschal
- G01 - MEASURING TESTING
Information Patent Grant
Microscope imaging system and method for emulating a high aperture...
- Patent number 7,286,284
- Issue date Oct 23, 2007
- Carl Zeiss SMS GmbH
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Microscope, especially microscope used for inspection in semiconduc...
- Patent number 7,167,310
- Issue date Jan 23, 2007
- Carl Zeiss Jena GmbH
- Thomas Engel
- G02 - OPTICS
Information Patent Grant
Device for flat illumination of an object field
- Patent number 6,925,225
- Issue date Aug 2, 2005
- Carl Zeiss Microelectric Systems GmbH
- Thomas Engel
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR O...
- Publication number 20110229010
- Publication date Sep 22, 2011
- CARL ZEISS SMS GMBH
- Michael Arnz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for Mask Inspection for Mask Design and Mask Production
- Publication number 20080247632
- Publication date Oct 9, 2008
- Klaus Boehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for the repair of photolithography masks
- Publication number 20080069431
- Publication date Mar 20, 2008
- Axel Zibold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Arrangement of aperture diaphragms and/or filters, with changeable...
- Publication number 20060291031
- Publication date Dec 28, 2006
- Klaus Boehm
- G02 - OPTICS
Information Patent Application
Arrangement for inspecting objects, especially masks in microlithog...
- Publication number 20060262306
- Publication date Nov 23, 2006
- Hans-Juergen Dobschal
- G01 - MEASURING TESTING
Information Patent Application
Arrangement for the production of photomasks
- Publication number 20060154150
- Publication date Jul 13, 2006
- Thomas Engel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarizer device for generating a defined spatial distribution of p...
- Publication number 20060028706
- Publication date Feb 9, 2006
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Microscope imaging system and method for emulating a high aperture...
- Publication number 20060012873
- Publication date Jan 19, 2006
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Reflective X-ray microscope and inspection system for examining obj...
- Publication number 20050201514
- Publication date Sep 15, 2005
- Hans-Jurgen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
Microscope, especially microscope used for inspection in semiconduc...
- Publication number 20040246574
- Publication date Dec 9, 2004
- Thomas Engel
- G02 - OPTICS
Information Patent Application
Device for flat illumination of an object field
- Publication number 20040135093
- Publication date Jul 15, 2004
- Thomas Engel
- G02 - OPTICS

Wolfgang Harnisch

Person

Patents Grantslast 30 patents

Method and device for measuring the relative local position error o...

Method for mask inspection for mask design and mask production

Microscope imaging system and method for emulating a high aperture...

Method and arrangement for repairing photolithography masks

Reflective X-ray microscope and inspection system for examining obj...

Arrangement for inspecting objects, especially masks in microlithog...

Microscope imaging system and method for emulating a high aperture...

Microscope, especially microscope used for inspection in semiconduc...

Device for flat illumination of an object field

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR O...

Method for Mask Inspection for Mask Design and Mask Production

Method and apparatus for the repair of photolithography masks

Arrangement of aperture diaphragms and/or filters, with changeable...

Arrangement for inspecting objects, especially masks in microlithog...

Arrangement for the production of photomasks

Polarizer device for generating a defined spatial distribution of p...

Microscope imaging system and method for emulating a high aperture...

Reflective X-ray microscope and inspection system for examining obj...

Microscope, especially microscope used for inspection in semiconduc...

Device for flat illumination of an object field