Xianfeng Zhou

Person

Meridian, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Isolation trench fill using oxide liner and nitride etch back techn...
- Patent number 9,799,727
- Issue date Oct 24, 2017
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation trench fill using oxide liner and nitride etch back techn...
- Patent number 9,349,632
- Issue date May 24, 2016
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation trench fill using oxide liner and nitride etch back techn...
- Patent number 8,952,485
- Issue date Feb 10, 2015
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating different gate oxides for different transisto...
- Patent number 8,304,307
- Issue date Nov 6, 2012
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Different gate oxides thicknesses for different transistors in an i...
- Patent number 8,102,006
- Issue date Jan 24, 2012
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 8,053,321
- Issue date Nov 8, 2011
- Round Rock Research, LLC
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions
- Patent number 8,035,189
- Issue date Oct 11, 2011
- Micron Technology, Inc.
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-depth STI trenches in integrated circuit fabrication
- Patent number 7,939,394
- Issue date May 10, 2011
- Micron Technology, Inc.
- Shubneesh Batra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating different gate oxides for different transisto...
- Patent number 7,790,544
- Issue date Sep 7, 2010
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions, and electronic systems
- Patent number 7,781,860
- Issue date Aug 24, 2010
- Micron Technology, Inc.
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,755,146
- Issue date Jul 13, 2010
- Round Rock Research, LLC
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,696,579
- Issue date Apr 13, 2010
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation trench fill using oxide liner and nitride etch back techn...
- Patent number 7,691,722
- Issue date Apr 6, 2010
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods
- Patent number 7,473,615
- Issue date Jan 6, 2009
- Micron Technology, Inc.
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,439,140
- Issue date Oct 21, 2008
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,413,946
- Issue date Aug 19, 2008
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-depth STI trenches in integrated circuit fabrication
- Patent number 7,354,812
- Issue date Apr 8, 2008
- Micron Technology, Inc.
- Shubneesh Batra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,304,353
- Issue date Dec 4, 2007
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,265,012
- Issue date Sep 4, 2007
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of standard voltage threshold and low voltage threshold M...
- Patent number 7,189,607
- Issue date Mar 13, 2007
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming standard voltage threshold and low voltage thres...
- Patent number 6,849,492
- Issue date Feb 1, 2005
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Isolation Trench Fill Using Oxide Liner and Nitride Etch Back Techn...
- Publication number 20160247878
- Publication date Aug 25, 2016
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION TRENCH FILL USING OXIDE LINER AND NITRIDE ETCH BACK TECHN...
- Publication number 20150194336
- Publication date Jul 9, 2015
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENT GATE OXIDES THICKNESSES FOR DIFFERENT TRANSISTORS IN AN I...
- Publication number 20120108051
- Publication date May 3, 2012
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...
- Publication number 20110006372
- Publication date Jan 13, 2011
- ROUND ROCK RESEARCH, LLC
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Constructions
- Publication number 20100276781
- Publication date Nov 4, 2010
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION TRENCH FILL USING OXIDE LINER AND NITRIDE ETCH BACK TECHN...
- Publication number 20100148300
- Publication date Jun 17, 2010
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...
- Publication number 20090286366
- Publication date Nov 19, 2009
- Micron Technology, Inc.
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Constructions, and Electronic Systems
- Publication number 20090072347
- Publication date Mar 19, 2009
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-DEPTH STI TRENCHES IN INTEGRATED CIRCUIT FABRICATION
- Publication number 20080176378
- Publication date Jul 24, 2008
- Micron Technology, Inc.
- Shubneesh Batra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...
- Publication number 20080042216
- Publication date Feb 21, 2008
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus providing different gate oxides for different...
- Publication number 20070224746
- Publication date Sep 27, 2007
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation trench fill using oxide liner and nitride etch back techn...
- Publication number 20070218645
- Publication date Sep 20, 2007
- Micron Technology, Inc.
- Xianfeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...
- Publication number 20070093016
- Publication date Apr 26, 2007
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...
- Publication number 20070093017
- Publication date Apr 26, 2007
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods, semiconductor constructions, and...
- Publication number 20070029635
- Publication date Feb 8, 2007
- Micron Technology, Inc.
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple-depth STI trenches in integrated circuit fabrication
- Publication number 20060043455
- Publication date Mar 2, 2006
- Shubneesh Batra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash cell structures and methods of formation
- Publication number 20060046402
- Publication date Mar 2, 2006
- Micron Technology, Inc.
- Di Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash cell structures and methods of formation
- Publication number 20060043368
- Publication date Mar 2, 2006
- Micron Technology, Inc.
- Di Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of standard voltage threshold and low voltage threshold M...
- Publication number 20060003513
- Publication date Jan 5, 2006
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of standard voltage threshold and low voltage threshold M...
- Publication number 20050227427
- Publication date Oct 13, 2005
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of standard voltage threshold and low voltge threshold MO...
- Publication number 20050026352
- Publication date Feb 3, 2005
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of standard voltage threshold and low voltage threshold M...
- Publication number 20040005752
- Publication date Jan 8, 2004
- Mark Helm
- H01 - BASIC ELECTRIC ELEMENTS

Xianfeng Zhou

Person

Patents Grantslast 30 patents

Isolation trench fill using oxide liner and nitride etch back techn...

Isolation trench fill using oxide liner and nitride etch back techn...

Isolation trench fill using oxide liner and nitride etch back techn...

Method of fabricating different gate oxides for different transisto...

Different gate oxides thicknesses for different transistors in an i...

Formation of standard voltage threshold and low voltage threshold M...

Semiconductor constructions

Multiple-depth STI trenches in integrated circuit fabrication

Method of fabricating different gate oxides for different transisto...

Semiconductor constructions, and electronic systems

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltage threshold M...

Isolation trench fill using oxide liner and nitride etch back techn...

Semiconductor processing methods

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltage threshold M...

Multiple-depth STI trenches in integrated circuit fabrication

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltage threshold M...

Method for forming standard voltage threshold and low voltage thres...

Patents Applicationslast 30 patents

Isolation Trench Fill Using Oxide Liner and Nitride Etch Back Techn...

ISOLATION TRENCH FILL USING OXIDE LINER AND NITRIDE ETCH BACK TECHN...

DIFFERENT GATE OXIDES THICKNESSES FOR DIFFERENT TRANSISTORS IN AN I...

FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...

Semiconductor Constructions

ISOLATION TRENCH FILL USING OXIDE LINER AND NITRIDE ETCH BACK TECHN...

FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...

Semiconductor Constructions, and Electronic Systems

MULTIPLE-DEPTH STI TRENCHES IN INTEGRATED CIRCUIT FABRICATION

FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...

Method and apparatus providing different gate oxides for different...

Isolation trench fill using oxide liner and nitride etch back techn...

FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...

FORMATION OF STANDARD VOLTAGE THRESHOLD AND LOW VOLTAGE THRESHOLD M...

Semiconductor processing methods, semiconductor constructions, and...

Multiple-depth STI trenches in integrated circuit fabrication

Flash cell structures and methods of formation

Flash cell structures and methods of formation

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltage threshold M...

Formation of standard voltage threshold and low voltge threshold MO...

Formation of standard voltage threshold and low voltage threshold M...