Xiang Zhou

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reducing roughness of extreme ultraviolet lithography resists
- Patent number 12,125,711
- Issue date Oct 22, 2024
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization of RF generators
- Patent number 12,046,450
- Issue date Jul 23, 2024
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch in a single plasma chamber for cri...
- Patent number 11,211,253
- Issue date Dec 28, 2021
- Lam Research Corportation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch for reducing roughness
- Patent number 11,170,997
- Issue date Nov 9, 2021
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated atomic layer passivation in TCP etch chamber and in-situ...
- Patent number 10,950,454
- Issue date Mar 16, 2021
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch in a single plasma chamber for cri...
- Patent number 10,734,238
- Issue date Aug 4, 2020
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch for reducing roughness
- Patent number 10,658,174
- Issue date May 19, 2020
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch in a single plasma chamber for fin...
- Patent number 10,515,815
- Issue date Dec 24, 2019
- Lam Research Corporation
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20240331976
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20230274913
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING ROUGHNESS OF EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS
- Publication number 20220157617
- Publication date May 19, 2022
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...
- Publication number 20210287909
- Publication date Sep 16, 2021
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRI...
- Publication number 20200328087
- Publication date Oct 15, 2020
- LAM RESEARCH CORPORATION
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
- Publication number 20200243326
- Publication date Jul 30, 2020
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRI...
- Publication number 20190157095
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
- Publication number 20190157066
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR FIN...
- Publication number 20190157096
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...
- Publication number 20190043728
- Publication date Feb 7, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Reducing roughness of extreme ultraviolet lithography resists

Synchronization of RF generators

Atomic layer deposition and etch in a single plasma chamber for cri...

Atomic layer deposition and etch for reducing roughness

Integrated atomic layer passivation in TCP etch chamber and in-situ...

Atomic layer deposition and etch in a single plasma chamber for cri...

Atomic layer deposition and etch for reducing roughness

Atomic layer deposition and etch in a single plasma chamber for fin...

Patents Applicationslast 30 patents

SYNCHRONIZATION OF RF GENERATORS

SYNCHRONIZATION OF RF GENERATORS

REDUCING ROUGHNESS OF EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS

INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...

ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRI...

ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS

ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRI...

ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS

ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR FIN...

INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...