Xikun Wang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for reducing particle defects in plasma etch c...
- Patent number 11,488,812
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact over active regions
- Patent number 11,462,411
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Gaurav Thareja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF heater pedestals
- Patent number 11,062,887
- Issue date Jul 13, 2021
- Applied Materials, Inc.
- Soonam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for hybrid feature metallization
- Patent number 11,024,537
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact over active processes
- Patent number 11,004,687
- Issue date May 11, 2021
- Applied Materials, Inc.
- Gaurav Thareja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for filling a feature disposed in a substrate
- Patent number 10,950,500
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective cobalt removal for bottom up gapfill
- Patent number 10,770,346
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tantalum-containing material removal
- Patent number 10,727,080
- Issue date Jul 28, 2020
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating a fully self-aligned via
- Patent number 10,699,953
- Issue date Jun 30, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing particle defects in plasma etch c...
- Patent number 10,658,161
- Issue date May 19, 2020
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide and metal removal
- Patent number 10,465,294
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective tungsten removal
- Patent number 10,256,112
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of etching films with reduced surface roughness
- Patent number 10,233,547
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective cobalt removal for bottom up gapfill
- Patent number 10,163,696
- Issue date Dec 25, 2018
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective in situ cobalt residue removal
- Patent number 10,049,891
- Issue date Aug 14, 2018
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt-containing material removal
- Patent number 9,947,549
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of etching films with reduced surface roughness
- Patent number 9,896,770
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch for metal-containing materials
- Patent number 9,711,366
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal removal with reduced surface roughness
- Patent number 9,659,791
- Issue date May 23, 2017
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride removal
- Patent number 9,607,856
- Issue date Mar 28, 2017
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten separation
- Patent number 9,553,102
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of etching films with reduced surface roughness
- Patent number 9,540,736
- Issue date Jan 10, 2017
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aluminum selective etch
- Patent number 9,520,303
- Issue date Dec 13, 2016
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chlorine-based hardmask removal
- Patent number 9,478,434
- Issue date Oct 25, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-free metal etch
- Patent number 9,472,417
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical gate separation
- Patent number 9,449,846
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective tungsten removal
- Patent number 9,412,608
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium nitride removal
- Patent number 9,373,522
- Issue date Jun 21, 2016
- Applied Mateials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
V trench dry etch
- Patent number 9,355,856
- Issue date May 31, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-based hardmask removal
- Patent number 9,355,862
- Issue date May 31, 2016
- Applied Materials, Inc.
- Mandar Pandit
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GATE CONTACT OVER ACTIVE REGIONS
- Publication number 20210249270
- Publication date Aug 12, 2021
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR HYBRID FEATURE METALLIZATION
- Publication number 20210043506
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CONTACT OVER ACTIVE PROCESSES
- Publication number 20200258744
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR FILLING A FEATURE DISPOSED IN A SUBSTRATE
- Publication number 20200251340
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- ROEY SHAVIV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE RF HEATER PEDESTALS
- Publication number 20200090912
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Creating A Fully Self-Aligned Via
- Publication number 20190378756
- Publication date Dec 12, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REDUCING PARTICLE DEFECTS IN PLASMA ETCH C...
- Publication number 20190295826
- Publication date Sep 26, 2019
- Applied Materials, Inc.
- Xikun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE COBALT REMOVAL FOR BOTTOM UP GAPFILL
- Publication number 20190122923
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TANTALUM-CONTAINING MATERIAL REMOVAL
- Publication number 20190013211
- Publication date Jan 10, 2019
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR FILLING A FEATURE DISPOSED IN A SUBSTRATE
- Publication number 20180323103
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Etching Films with Reduced Surface Roughness
- Publication number 20180195179
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE COBALT REMOVAL FOR BOTTOM UP GAPFILL
- Publication number 20180138085
- Publication date May 17, 2018
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT-CONTAINING MATERIAL REMOVAL
- Publication number 20180102259
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH ASPECT RATIO 3-D FLASH MEMORY DEVICE
- Publication number 20170110475
- Publication date Apr 20, 2017
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Etching Films With Reduced Surface Roughness
- Publication number 20170096740
- Publication date Apr 6, 2017
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL REMOVAL WITH REDUCED SURFACE ROUGHNESS
- Publication number 20170018439
- Publication date Jan 19, 2017
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE AND METAL REMOVAL
- Publication number 20160222522
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL GATE SEPARATION
- Publication number 20160218018
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS
- Publication number 20160118268
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHLORINE-BASED HARDMASK REMOVAL
- Publication number 20160086816
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-BASED HARDMASK REMOVAL
- Publication number 20160086815
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Mandar Pandit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
V TRENCH DRY ETCH
- Publication number 20160079072
- Publication date Mar 17, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN SEPARATION
- Publication number 20160056167
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Etching Films With Reduced Surface Roughness
- Publication number 20160032460
- Publication date Feb 4, 2016
- Applied Materials, Inc.
- Benjamin Schmiege
- C30 - CRYSTAL GROWTH
Information Patent Application
SELECTIVE TITANIUM NITRIDE REMOVAL
- Publication number 20150357205
- Publication date Dec 10, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL REMOVAL
- Publication number 20150345029
- Publication date Dec 3, 2015
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE AND METAL REMOVAL
- Publication number 20150345028
- Publication date Dec 3, 2015
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS-PHASE TUNGSTEN ETCH
- Publication number 20150262829
- Publication date Sep 17, 2015
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TITANIUM OXIDE ETCH
- Publication number 20150206764
- Publication date Jul 23, 2015
- Applied Materials, Inc.
- Xikun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL
- Publication number 20150179464
- Publication date Jun 25, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method and apparatus for reducing particle defects in plasma etch c...

Gate contact over active regions

High temperature RF heater pedestals

Methods and apparatus for hybrid feature metallization

Gate contact over active processes

Methods and apparatus for filling a feature disposed in a substrate

Selective cobalt removal for bottom up gapfill

Tantalum-containing material removal

Method for creating a fully self-aligned via

Method and apparatus for reducing particle defects in plasma etch c...

Oxide and metal removal

Selective tungsten removal

Methods of etching films with reduced surface roughness

Selective cobalt removal for bottom up gapfill

Selective in situ cobalt residue removal

Cobalt-containing material removal

Methods of etching films with reduced surface roughness

Selective etch for metal-containing materials

Metal removal with reduced surface roughness

Selective titanium nitride removal

Tungsten separation

Methods of etching films with reduced surface roughness

Aluminum selective etch

Chlorine-based hardmask removal

Plasma-free metal etch

Vertical gate separation

Dry-etch for selective tungsten removal

Titanium nitride removal

V trench dry etch

Fluorine-based hardmask removal

Patents Applicationslast 30 patents

GATE CONTACT OVER ACTIVE REGIONS

METHODS AND APPARATUS FOR HYBRID FEATURE METALLIZATION

GATE CONTACT OVER ACTIVE PROCESSES

METHODS AND APPARATUS FOR FILLING A FEATURE DISPOSED IN A SUBSTRATE

HIGH TEMPERATURE RF HEATER PEDESTALS

Method For Creating A Fully Self-Aligned Via

METHOD AND APPARATUS FOR REDUCING PARTICLE DEFECTS IN PLASMA ETCH C...

SELECTIVE COBALT REMOVAL FOR BOTTOM UP GAPFILL

TANTALUM-CONTAINING MATERIAL REMOVAL

METHODS AND APPARATUS FOR FILLING A FEATURE DISPOSED IN A SUBSTRATE

Methods of Etching Films with Reduced Surface Roughness

SELECTIVE COBALT REMOVAL FOR BOTTOM UP GAPFILL

COBALT-CONTAINING MATERIAL REMOVAL

HIGH ASPECT RATIO 3-D FLASH MEMORY DEVICE

Methods Of Etching Films With Reduced Surface Roughness

METAL REMOVAL WITH REDUCED SURFACE ROUGHNESS

OXIDE AND METAL REMOVAL

VERTICAL GATE SEPARATION

SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS

CHLORINE-BASED HARDMASK REMOVAL

FLUORINE-BASED HARDMASK REMOVAL

V TRENCH DRY ETCH

TUNGSTEN SEPARATION

Methods Of Etching Films With Reduced Surface Roughness

SELECTIVE TITANIUM NITRIDE REMOVAL

METAL REMOVAL

OXIDE AND METAL REMOVAL

GAS-PHASE TUNGSTEN ETCH

TITANIUM OXIDE ETCH

DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL