Yan Rozenzon

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas hub for plasma reactor
- Patent number 11,728,141
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 11,244,811
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle for multi-zone gas injection assembly
- Patent number 11,139,150
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for collection and subsequent reaction of liquid and soli...
- Patent number 10,861,681
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- James L'Heureux
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Side gas injection kit for multi-zone gas injection assembly
- Patent number 10,410,841
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 10,163,606
- Issue date Dec 25, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone gas injection assembly with azimuthal and radial distrib...
- Patent number 10,008,368
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-channel gas-delivery system
- Patent number 9,441,295
- Issue date Sep 13, 2016
- SolarCity Corporation
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic support system for quartz process chamber
- Patent number 9,240,513
- Issue date Jan 19, 2016
- SolarCity Corporation
- Robert T. Trujillo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stackable multi-port gas nozzles
- Patent number 8,968,473
- Issue date Mar 3, 2015
- Silevo, Inc.
- Steve Poppe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scalable, high-throughput, multi-chamber epitaxial reactor for sili...
- Patent number 8,845,809
- Issue date Sep 30, 2014
- Silevo, Inc.
- Steve Poppe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scalable, high-throughput, multi-chamber epitaxial reactor for sili...
- Patent number 8,652,259
- Issue date Feb 18, 2014
- Silevo, Inc.
- Steve Poppe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stable wafer-carrier system
- Patent number 8,562,745
- Issue date Oct 22, 2013
- Silevo, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature controlled window with a fluid supply system
- Patent number 6,916,399
- Issue date Jul 12, 2005
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contaminant reduction improvements for plasma etch chambers
- Patent number 5,716,484
- Issue date Feb 10, 1998
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chlorine reduction module
- Patent number 5,714,036
- Issue date Feb 3, 1998
- Applied Materials, Inc.
- George Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contaminant reduction improvements for plasma etch chambers
- Patent number 5,693,179
- Issue date Dec 2, 1997
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quick release process kit
- Patent number 5,484,486
- Issue date Jan 16, 1996
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS HUB FOR PLASMA REACTOR
- Publication number 20220157562
- Publication date May 19, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY
- Publication number 20190385824
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection
- Publication number 20190122861
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...
- Publication number 20180337027
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- James L'HEUREUX
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...
- Publication number 20180269038
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR EXHAUST COOLING
- Publication number 20170301524
- Publication date Oct 19, 2017
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC SUPPORT SYSTEM FOR QUARTZ PROCESS CHAMBER
- Publication number 20160133778
- Publication date May 12, 2016
- SOLARCITY CORPORATION
- Robert T. Trujillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION
- Publication number 20150371826
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...
- Publication number 20150371831
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACKABLE MULTI-PORT GAS NOZZLES
- Publication number 20150176127
- Publication date Jun 25, 2015
- SILEVO, INC.
- Steve Poppe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STABLE WAFER-CARRIER SYSTEM
- Publication number 20110283941
- Publication date Nov 24, 2011
- SIERRA SOLAR POWER, INC.
- Yan Rozenzon
- C30 - CRYSTAL GROWTH
Information Patent Application
MULTI-CHANNEL GAS-DELIVERY SYSTEM
- Publication number 20110277690
- Publication date Nov 17, 2011
- SIERRA SOLAR POWER, INC.
- Yan Rozenzon
- C30 - CRYSTAL GROWTH
Information Patent Application
DYNAMIC SUPPORT SYSTEM FOR QUARTZ PROCESS CHAMBER
- Publication number 20110277688
- Publication date Nov 17, 2011
- SIERRA SOLAR POWER, INC.
- Robert T. Trujillo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STACKABLE MULTI-PORT GAS NOZZLES
- Publication number 20110067632
- Publication date Mar 24, 2011
- SIERRA SOLAR POWER, INC.
- Steve Poppe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCALABLE, HIGH-THROUGHPUT, MULTI-CHAMBER EPITAXIAL REACTOR FOR SILI...
- Publication number 20100092697
- Publication date Apr 15, 2010
- SIERRA SOLAR POWER, INC.
- Steve Poppe
- C30 - CRYSTAL GROWTH
Information Patent Application
SCALABLE, HIGH-THROUGHPUT, MULTI-CHAMBER EPITAXIAL REACTOR FOR SILI...
- Publication number 20100092698
- Publication date Apr 15, 2010
- SIERRA SOLAR POWER, INC.
- Steve Poppe
- C30 - CRYSTAL GROWTH
Information Patent Application
Method and apparatus for sealing a substrate surface during an elec...
- Publication number 20030019741
- Publication date Jan 30, 2003
- APPLIED MATERIALS, INC.
- Arnold V. Kholodenko
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Yan Rozenzon

Person

Patents Grantslast 30 patents

Gas hub for plasma reactor

Plasma reactor with highly symmetrical four-fold gas injection

Nozzle for multi-zone gas injection assembly

Apparatus for collection and subsequent reaction of liquid and soli...

Side gas injection kit for multi-zone gas injection assembly

Plasma reactor with highly symmetrical four-fold gas injection

Multi-zone gas injection assembly with azimuthal and radial distrib...

Multi-channel gas-delivery system

Dynamic support system for quartz process chamber

Stackable multi-port gas nozzles

Scalable, high-throughput, multi-chamber epitaxial reactor for sili...

Scalable, high-throughput, multi-chamber epitaxial reactor for sili...

Stable wafer-carrier system

Temperature controlled window with a fluid supply system

Contaminant reduction improvements for plasma etch chambers

Chlorine reduction module

Contaminant reduction improvements for plasma etch chambers

Quick release process kit

Patents Applicationslast 30 patents

GAS HUB FOR PLASMA REACTOR

NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY

Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection

APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...

Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...

APPARATUS FOR EXHAUST COOLING

DYNAMIC SUPPORT SYSTEM FOR QUARTZ PROCESS CHAMBER

PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION

MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...

STACKABLE MULTI-PORT GAS NOZZLES

STABLE WAFER-CARRIER SYSTEM

MULTI-CHANNEL GAS-DELIVERY SYSTEM

DYNAMIC SUPPORT SYSTEM FOR QUARTZ PROCESS CHAMBER

STACKABLE MULTI-PORT GAS NOZZLES

SCALABLE, HIGH-THROUGHPUT, MULTI-CHAMBER EPITAXIAL REACTOR FOR SILI...

SCALABLE, HIGH-THROUGHPUT, MULTI-CHAMBER EPITAXIAL REACTOR FOR SILI...

Method and apparatus for sealing a substrate surface during an elec...