Yaojian Leng

Person

Plano, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing pad having improved groove pattern
- Patent number 8,002,611
- Issue date Aug 23, 2011
- Texas Instruments Incorporated
- Yanghua He
- B24 - GRINDING POLISHING
Information Patent Grant
Method for CMP with variable down-force adjustment
- Patent number 7,344,987
- Issue date Mar 18, 2008
- Texas Instruments Incorporated
- Yaojian Leng
- B24 - GRINDING POLISHING
Information Patent Grant
In-situ randomization and recording of wafer processing order at pr...
- Patent number 6,975,920
- Issue date Dec 13, 2005
- Texas Instruments Incorporated
- Randolph W. Kahn
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Photon-blocking layer
- Patent number 6,965,136
- Issue date Nov 15, 2005
- Texas Instruments Incorporated
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photon-blocking layer
- Patent number 6,919,219
- Issue date Jul 19, 2005
- Texas Instruments Incorporated
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion resistance for copper interconnects
- Patent number 6,908,851
- Issue date Jun 21, 2005
- Texas Instruments Incorporated
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ randomization and recording of wafer processing order at pr...
- Patent number 6,862,495
- Issue date Mar 1, 2005
- Texas Instruments Incorporated
- Randolph W. Kahn
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
CMP in-situ conditioning with pad and retaining ring clean
- Patent number 6,806,193
- Issue date Oct 19, 2004
- Texas Instruments Incorporated
- Vincent C. Korthuis
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
In-situ randomization and recording of wafer processing order at pr...
- Patent number 6,684,125
- Issue date Jan 27, 2004
- Texas Instruments Incorporated
- Randolph W. Kahn
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Shallow trench isolation step height detection method
- Patent number 6,677,766
- Issue date Jan 13, 2004
- Texas Instruments Incorporated
- Freidoon Mehrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for evaluating process chambers used for semiconductor manuf...
- Patent number 6,553,332
- Issue date Apr 22, 2003
- Texas Instruments Incorporated
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A TRENCH ISOLATION STRUCTURE USING A SION LAYER
- Publication number 20150087135
- Publication date Mar 26, 2015
- TEXAS INSTRUMENTS INCORPORATED
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufactured Using a Method to Reduce CMP Dama...
- Publication number 20080303098
- Publication date Dec 11, 2008
- Texas Instruments, Incorporated
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD HAVING IMPROVED GROOVE PATTERN
- Publication number 20080160890
- Publication date Jul 3, 2008
- Yanghua He
- B24 - GRINDING POLISHING
Information Patent Application
Method for CMP with variable down-force adjustment
- Publication number 20070281482
- Publication date Dec 6, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Yaojian Leng
- B24 - GRINDING POLISHING
Information Patent Application
System for dynamic slurry delivery in a CMP process
- Publication number 20060027533
- Publication date Feb 9, 2006
- Yaojian Leng
- B24 - GRINDING POLISHING
Information Patent Application
Corrosion resistance for copper interconnects
- Publication number 20040259352
- Publication date Dec 23, 2004
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP in-situ conditioning with pad and retaining ring clean
- Publication number 20040137739
- Publication date Jul 15, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Vincent C. Korthuis
- B24 - GRINDING POLISHING
Information Patent Application
In-situ randomization and recording of wafer processing order at pr...
- Publication number 20040111176
- Publication date Jun 10, 2004
- Randolph W. Kahn
- G05 - CONTROLLING REGULATING
Information Patent Application
In-situ randomization and recording of wafer processing order at pr...
- Publication number 20040111180
- Publication date Jun 10, 2004
- Randolph W. Kahn
- G05 - CONTROLLING REGULATING
Information Patent Application
Photon-blocking layer
- Publication number 20040102000
- Publication date May 27, 2004
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photon-blocking layer
- Publication number 20040099867
- Publication date May 27, 2004
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing slurry used for copper chemical mechanical polishing (CMP...
- Publication number 20040082274
- Publication date Apr 29, 2004
- Yaojian Leng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing slurry with improved defectivity
- Publication number 20030203705
- Publication date Oct 30, 2003
- Yaojian Leng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
In-situ randomization and recording of wafer processing order at pr...
- Publication number 20020087230
- Publication date Jul 4, 2002
- Randolph W. Kahn
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for evaluating process chambers used for semiconductor manuf...
- Publication number 20020065616
- Publication date May 30, 2002
- Yaojian Leng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shallow trench isolation step height detection method
- Publication number 20020060575
- Publication date May 23, 2002
- Freidoon Mehrad
- H01 - BASIC ELECTRIC ELEMENTS

Yaojian Leng

Person

Patents Grantslast 30 patents

Chemical mechanical polishing pad having improved groove pattern

Method for CMP with variable down-force adjustment

In-situ randomization and recording of wafer processing order at pr...

Photon-blocking layer

Photon-blocking layer

Corrosion resistance for copper interconnects

In-situ randomization and recording of wafer processing order at pr...

CMP in-situ conditioning with pad and retaining ring clean

In-situ randomization and recording of wafer processing order at pr...

Shallow trench isolation step height detection method

Method for evaluating process chambers used for semiconductor manuf...

Patents Applicationslast 30 patents

METHOD OF FORMING A TRENCH ISOLATION STRUCTURE USING A SION LAYER

Semiconductor Device Manufactured Using a Method to Reduce CMP Dama...

CHEMICAL MECHANICAL POLISHING PAD HAVING IMPROVED GROOVE PATTERN

Method for CMP with variable down-force adjustment

System for dynamic slurry delivery in a CMP process

Corrosion resistance for copper interconnects

CMP in-situ conditioning with pad and retaining ring clean

In-situ randomization and recording of wafer processing order at pr...

In-situ randomization and recording of wafer processing order at pr...

Photon-blocking layer

Photon-blocking layer

Polishing slurry used for copper chemical mechanical polishing (CMP...

Chemical-mechanical polishing slurry with improved defectivity

In-situ randomization and recording of wafer processing order at pr...

Method for evaluating process chambers used for semiconductor manuf...

Shallow trench isolation step height detection method