Yi-Shien Mor

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Gate stacks for semiconductor devices of different conductivity types
- Patent number 12,015,030
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit structure
- Patent number 11,749,679
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Juei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a method for fabricating the same
- Patent number 11,469,227
- Issue date Oct 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single metal that performs N work function and P work function in a...
- Patent number 11,289,481
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor structure
- Patent number 11,075,199
- Issue date Jul 27, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Juei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin critical dimension loading optimization
- Patent number 11,004,747
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device including contact bars...
- Patent number 10,748,896
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin critical dimension loading optimization
- Patent number 10,692,769
- Issue date Jun 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin critical dimension loading optimization
- Patent number 10,651,090
- Issue date May 12, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of forming semiconductor fin thereof
- Patent number 10,529,862
- Issue date Jan 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a contact bar over an S/D structure
- Patent number 10,366,989
- Issue date Jul 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 10,204,905
- Issue date Feb 12, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Juei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a single metal that performs N work function and...
- Patent number 9,960,160
- Issue date May 1, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated high-K/metal gate in CMOS process flow
- Patent number 9,601,388
- Issue date Mar 21, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a structure
- Patent number 9,466,528
- Issue date Oct 11, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFETs and methods for forming the same
- Patent number 9,466,696
- Issue date Oct 11, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control fin heights in FinFET structures
- Patent number 9,460,970
- Issue date Oct 4, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated high-k/metal gate in CMOS process flow
- Patent number 9,257,426
- Issue date Feb 9, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control fin heights in FinFET structures
- Patent number 8,975,698
- Issue date Mar 10, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductors structure with elements having different widths and...
- Patent number 8,872,339
- Issue date Oct 28, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET design with LDD extensions
- Patent number 8,865,560
- Issue date Oct 21, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated high-k/metal gate in CMOS process flow
- Patent number 8,841,731
- Issue date Sep 23, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control fin heights in FinFET structures
- Patent number 8,659,097
- Issue date Feb 25, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a single metal that performs N work function and...
- Patent number 8,524,588
- Issue date Sep 3, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer shape engineering for void-free gap-filling process
- Patent number 8,461,654
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated high-K/metal gate in CMOS process flow
- Patent number 8,383,502
- Issue date Feb 26, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k metal gate CMOS patterning method
- Patent number 8,349,680
- Issue date Jan 8, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kong-Beng Thei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer shape engineering for void-free gap-filling process
- Patent number 8,048,752
- Issue date Nov 1, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrating high-K/metal gate in CMOS process flow
- Patent number 8,003,507
- Issue date Aug 23, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with dual-metal gate structures and fabricati...
- Patent number 7,947,591
- Issue date May 24, 2011
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peng-Fu Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GATE-TOP DIELECTRIC STRUCTURE FOR SELF-ALIGNED CONTACT
- Publication number 20240014292
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ta-Chun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...
- Publication number 20220216205
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE
- Publication number 20210335785
- Publication date Oct 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Juei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME
- Publication number 20200381428
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Critical Dimension Loading Optimization
- Publication number 20200273754
- Publication date Aug 27, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20190189614
- Publication date Jun 20, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Juei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Critical Dimension Loading Optimization
- Publication number 20190067112
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME
- Publication number 20180337177
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20180308842
- Publication date Oct 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Juei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Single Metal that Performs N Work Function and...
- Publication number 20180247937
- Publication date Aug 30, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING SEMICONDUCTOR FIN THEREOF
- Publication number 20180151739
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ming Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME
- Publication number 20170229454
- Publication date Aug 10, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated High-K/Metal Gate in CMOS Process Flow
- Publication number 20160293490
- Publication date Oct 6, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control Fin Heights in FinFET Structures
- Publication number 20150155208
- Publication date Jun 4, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated High-K/Metal Gate In CMOS Process Flow
- Publication number 20150061031
- Publication date Mar 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ray Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING A STRUCTURE
- Publication number 20150037976
- Publication date Feb 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chu LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control Fin Heights in FinFET Structures
- Publication number 20140103453
- Publication date Apr 17, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Forming A Single Metal That Performs N Work Function And...
- Publication number 20140001566
- Publication date Jan 2, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Design with LDD Extensions
- Publication number 20130228876
- Publication date Sep 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD OF MAKING THE SAME
- Publication number 20130207265
- Publication date Aug 15, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chu LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFETs and Methods for Forming the Same
- Publication number 20130187206
- Publication date Jul 25, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control Fin Heights in FinFET Structures
- Publication number 20130181300
- Publication date Jul 18, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shien Mor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED HIGH-K/METAL GATE IN CMOS PROCESS FLOW
- Publication number 20130140643
- Publication date Jun 6, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer Shape Engineering for Void-Free Gap-Filling Process
- Publication number 20120025329
- Publication date Feb 2, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Yuah Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated High-K/Metal Gate in CMOS Process Flow
- Publication number 20110275212
- Publication date Nov 10, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL HIGH-K METAL GATE CMOS PATTERNING METHOD
- Publication number 20100048013
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kong-Beng Thei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...
- Publication number 20100038721
- Publication date Feb 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INTEGRATING HIGH-K/METAL GATE IN CMOS PROCESS FLOW
- Publication number 20100041223
- Publication date Feb 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer Shape Engineering for Void-Free Gap-Filling Process
- Publication number 20100022061
- Publication date Jan 28, 2010
- Ming-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES WITH DUAL-METAL GATE STRUCTURES AND FABRICATI...
- Publication number 20080188044
- Publication date Aug 7, 2008
- Taiwan Semiconductor Manufacturing Co., LTD
- Peng-Fu Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Yi-Shien Mor

Person

Patents Grantslast 30 patents

Gate stacks for semiconductor devices of different conductivity types

Integrated circuit structure

Semiconductor device and a method for fabricating the same

Single metal that performs N work function and P work function in a...

Method of forming semiconductor structure

Fin critical dimension loading optimization

Method for fabricating semiconductor device including contact bars...

Fin critical dimension loading optimization

Fin critical dimension loading optimization

Semiconductor device and method of forming semiconductor fin thereof

Semiconductor device having a contact bar over an S/D structure

Semiconductor structure and manufacturing method thereof

Method of forming a single metal that performs N work function and...

Integrated high-K/metal gate in CMOS process flow

Method of making a structure

FinFETs and methods for forming the same

Control fin heights in FinFET structures

Integrated high-k/metal gate in CMOS process flow

Control fin heights in FinFET structures

Semiconductors structure with elements having different widths and...

FinFET design with LDD extensions

Integrated high-k/metal gate in CMOS process flow

Control fin heights in FinFET structures

Method of forming a single metal that performs N work function and...

Spacer shape engineering for void-free gap-filling process

Integrated high-K/metal gate in CMOS process flow

High-k metal gate CMOS patterning method

Spacer shape engineering for void-free gap-filling process

Method of integrating high-K/metal gate in CMOS process flow

Semiconductor devices with dual-metal gate structures and fabricati...

Patents Applicationslast 30 patents

GATE-TOP DIELECTRIC STRUCTURE FOR SELF-ALIGNED CONTACT

METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...

INTEGRATED CIRCUIT STRUCTURE

SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME

Fin Critical Dimension Loading Optimization

METHOD OF FORMING SEMICONDUCTOR STRUCTURE

Fin Critical Dimension Loading Optimization

SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

Method of Forming a Single Metal that Performs N Work Function and...

SEMICONDUCTOR DEVICE AND METHOD OF FORMING SEMICONDUCTOR FIN THEREOF

SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME

Integrated High-K/Metal Gate in CMOS Process Flow

Control Fin Heights in FinFET Structures

Integrated High-K/Metal Gate In CMOS Process Flow

METHOD OF MAKING A STRUCTURE

Control Fin Heights in FinFET Structures

Method Of Forming A Single Metal That Performs N Work Function And...

FinFET Design with LDD Extensions

STRUCTURE AND METHOD OF MAKING THE SAME

FinFETs and Methods for Forming the Same

Control Fin Heights in FinFET Structures

INTEGRATED HIGH-K/METAL GATE IN CMOS PROCESS FLOW

Spacer Shape Engineering for Void-Free Gap-Filling Process

Integrated High-K/Metal Gate in CMOS Process Flow

NOVEL HIGH-K METAL GATE CMOS PATTERNING METHOD

METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...

METHOD OF INTEGRATING HIGH-K/METAL GATE IN CMOS PROCESS FLOW

Spacer Shape Engineering for Void-Free Gap-Filling Process

SEMICONDUCTOR DEVICES WITH DUAL-METAL GATE STRUCTURES AND FABRICATI...