Yihong Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,887,856
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming nucleation layers with halogenated silanes
- Patent number 11,702,742
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nucleation-free gap fill ALD process
- Patent number 11,289,374
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal doped amorphous silicon as nucleation layer for metal dep...
- Patent number 11,244,824
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing tungsten on halosilane based metal silicide...
- Patent number 11,174,551
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 11,094,544
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-thin diffusion barriers
- Patent number 11,069,568
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective atomic layer deposition of ruthenium
- Patent number 11,066,743
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,043,386
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,886,172
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten deposition without barrier layer
- Patent number 10,854,461
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of lowering wordline resistance
- Patent number 10,854,511
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Yihong Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Surface-selective atomic layer deposition using hydrosilylation pas...
- Patent number 10,790,141
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Kelvin Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming tungsten pillars
- Patent number 10,784,107
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative volumetric expansion of metals and metal containing compo...
- Patent number 10,741,435
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition for simplified process flow of pillar formation
- Patent number 10,636,659
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seam healing using high pressure anneal
- Patent number 10,636,669
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,622,251
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 10,615,050
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-thin diffusion barriers
- Patent number 10,600,684
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-treatment approach to improve continuity of ultra-thin amorphou...
- Patent number 10,559,465
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seamless tungsten fill by tungsten oxidation-reduction
- Patent number 10,559,497
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for radical-based deposition of dielectric films
- Patent number 10,480,074
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Jianhua Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten deposition without barrier layer
- Patent number 10,468,263
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 10,410,865
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,354,916
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative volumetric expansion of metals and metal containing compo...
- Patent number 10,319,624
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for self-aligned patterning
- Patent number 10,319,604
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment approach to improve film roughness by improving nucleatio...
- Patent number 10,276,379
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selectively lateral growth of silicon oxide thin film
- Patent number 10,002,757
- Issue date Jun 19, 2018
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Nucleation-Free Gap Fill ALD Process
- Publication number 20220172989
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halogen-Containing Silane-Based Metal Silicide As Nucleation Layer...
- Publication number 20220074050
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING
- Publication number 20210305052
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20210013038
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal Doped Amorphous Silicon As Nucleation Layer For Metal Dep...
- Publication number 20200335334
- Publication date Oct 22, 2020
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Wordline Separation in 3D-NAND Devices
- Publication number 20200243382
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN DIFFUSION BARRIERS
- Publication number 20200194307
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tungsten Deposition Without Barrier Layer
- Publication number 20200027738
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20190385849
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nucleation-Free Gap Fill ALD Process
- Publication number 20190371662
- Publication date Dec 5, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR WORDLINE SEPARATION IN 3D-NAND DEVICES
- Publication number 20190333810
- Publication date Oct 31, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidative Volumetric Expansion Of Metals And Metal Containing Compo...
- Publication number 20190259652
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Self-Aligned Patterning
- Publication number 20190252206
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM HEALING USING HIGH PRESSURE ANNEAL
- Publication number 20190228982
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADICAL ASSISTED CURE OF DIELECTRIC FILMS
- Publication number 20190214228
- Publication date Jul 11, 2019
- Applied Materials, Inc.
- Yihong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Atomic Layer Deposition Of Ruthenium
- Publication number 20190185993
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Yihong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRA-THIN DIFFUSION BARRIERS
- Publication number 20190189506
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Gapfill In High Aspect Ratio Structures
- Publication number 20190172723
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-TREATMENT APPROACH TO IMPROVE CONTINUITY OF ULTRA-THIN AMORPHOU...
- Publication number 20190027362
- Publication date Jan 24, 2019
- Applied Materials, Inc.
- Rui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Seamless Tungsten Fill By Tungsten Oxidation-Reduction
- Publication number 20180358264
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Wordline Separation in 3D-NAND Devices
- Publication number 20180350671
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Lowering Wordline Resistance
- Publication number 20180350606
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20180323068
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Spatial Metal Atomic Layer Deposition
- Publication number 20180312966
- Publication date Nov 1, 2018
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Deposition Of Tungsten For Simplified Process Flow Of Tun...
- Publication number 20180308694
- Publication date Oct 25, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT APPROACH TO IMPROVE FILM ROUGHNESS BY IMPROVING NUCLEATIO...
- Publication number 20180294157
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Rui CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface-Selective Atomic Layer Deposition Using Hydrosilylation Pas...
- Publication number 20180254179
- Publication date Sep 6, 2018
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Deposition Without Barrier Layer
- Publication number 20180247821
- Publication date Aug 30, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing
- Publication number 20180240676
- Publication date Aug 23, 2018
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Self-Aligned Patterning
- Publication number 20180130671
- Publication date May 10, 2018
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS

Yihong Chen

Person

Patents Grantslast 30 patents

Enhanced spatial ALD of metals through controlled precursor mixing

Methods of forming nucleation layers with halogenated silanes

Nucleation-free gap fill ALD process

Conformal doped amorphous silicon as nucleation layer for metal dep...

Methods for depositing tungsten on halosilane based metal silicide...

Methods of forming self-aligned vias

Ultra-thin diffusion barriers

Selective atomic layer deposition of ruthenium

Enhanced spatial ALD of metals through controlled precursor mixing

Methods for wordline separation in 3D-NAND devices

Tungsten deposition without barrier layer

Methods of lowering wordline resistance

Surface-selective atomic layer deposition using hydrosilylation pas...

Methods of forming tungsten pillars

Oxidative volumetric expansion of metals and metal containing compo...

Selective deposition for simplified process flow of pillar formation

Seam healing using high pressure anneal

Methods for wordline separation in 3D-NAND devices

Methods for gapfill in high aspect ratio structures

Ultra-thin diffusion barriers

Pre-treatment approach to improve continuity of ultra-thin amorphou...

Seamless tungsten fill by tungsten oxidation-reduction

Apparatus for radical-based deposition of dielectric films

Tungsten deposition without barrier layer

Methods of forming self-aligned vias

Methods for wordline separation in 3D-NAND devices

Oxidative volumetric expansion of metals and metal containing compo...

Methods for self-aligned patterning

Treatment approach to improve film roughness by improving nucleatio...

Selectively lateral growth of silicon oxide thin film

Patents Applicationslast 30 patents

Nucleation-Free Gap Fill ALD Process

Halogen-Containing Silane-Based Metal Silicide As Nucleation Layer...

ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING

Methods of Forming Tungsten Pillars

Conformal Doped Amorphous Silicon As Nucleation Layer For Metal Dep...

Methods for Wordline Separation in 3D-NAND Devices

ULTRA-THIN DIFFUSION BARRIERS

Tungsten Deposition Without Barrier Layer

Methods Of Forming Self-Aligned Vias

Nucleation-Free Gap Fill ALD Process

METHODS FOR WORDLINE SEPARATION IN 3D-NAND DEVICES

Oxidative Volumetric Expansion Of Metals And Metal Containing Compo...

Methods For Self-Aligned Patterning

SEAM HEALING USING HIGH PRESSURE ANNEAL

RADICAL ASSISTED CURE OF DIELECTRIC FILMS

Selective Atomic Layer Deposition Of Ruthenium

ULTRA-THIN DIFFUSION BARRIERS

Methods For Gapfill In High Aspect Ratio Structures

PRE-TREATMENT APPROACH TO IMPROVE CONTINUITY OF ULTRA-THIN AMORPHOU...

Seamless Tungsten Fill By Tungsten Oxidation-Reduction

Methods For Wordline Separation in 3D-NAND Devices

Methods Of Lowering Wordline Resistance

Methods of Forming Tungsten Pillars

Methods For Spatial Metal Atomic Layer Deposition

Selective Deposition Of Tungsten For Simplified Process Flow Of Tun...

TREATMENT APPROACH TO IMPROVE FILM ROUGHNESS BY IMPROVING NUCLEATIO...

Surface-Selective Atomic Layer Deposition Using Hydrosilylation Pas...

Tungsten Deposition Without Barrier Layer

Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing

Methods For Self-Aligned Patterning