Yijian Chen

Person

Albany, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication and mask design methods using spatial frequency sextupl...
- Patent number 8,524,605
- Issue date Sep 3, 2013
- Vigma Nanoelectronics
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-lithography misalignment correction with shadow effect for mul...
- Patent number 7,700,444
- Issue date Apr 20, 2010
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double hidden flexure microactuator for phase mirror array
- Patent number 7,075,699
- Issue date Jul 11, 2006
- The Regents of the University of California
- William G. Oldham
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Patterning method for IC fabrication using 2-D layout decomposition...
- Publication number 20160049307
- Publication date Feb 18, 2016
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to increase the pattern density of integrated circuits using...
- Publication number 20130189844
- Publication date Jul 25, 2013
- Vigma Nanoelectronics
- Yijian Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods to increase pattern density and release overlay requirement...
- Publication number 20130065397
- Publication date Mar 14, 2013
- Vigma Nanoelectronics
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned contact frequency doubling technology for memory and l...
- Publication number 20080227295
- Publication date Sep 18, 2008
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nanodot and nanowire based MOSFET structures and fabrication processes
- Publication number 20080121987
- Publication date May 29, 2008
- Yijian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Spatial-frequency tripling and quadrupling processes for lithograph...
- Publication number 20080121616
- Publication date May 29, 2008
- Yijian Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wavefront modulation methods for EUV maskless lithography
- Publication number 20080099438
- Publication date May 1, 2008
- Yijian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Post-lithography misalignment correction with shadow effect for mul...
- Publication number 20080102647
- Publication date May 1, 2008
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch-shrinking technologies for lithographic application
- Publication number 20070249175
- Publication date Oct 25, 2007
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Four-hinge micromirror with 3 degrees of freedom
- Publication number 20070064298
- Publication date Mar 22, 2007
- Yijian Chen
- G02 - OPTICS
Information Patent Application
Image improvement by using reflective mirrors between object and pr...
- Publication number 20070058153
- Publication date Mar 15, 2007
- Yijian Chen
- G02 - OPTICS
Information Patent Application
Vertical integrated-gate CMOS device and its fabrication process
- Publication number 20060261406
- Publication date Nov 23, 2006
- Yijian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double hidden flexure microactuator for phase mirror array
- Publication number 20050111119
- Publication date May 26, 2005
- The Regents of the University of California.
- William G. Oldham
- G02 - OPTICS

Yijian Chen

Person

Patents Grantslast 30 patents

Fabrication and mask design methods using spatial frequency sextupl...

Post-lithography misalignment correction with shadow effect for mul...

Double hidden flexure microactuator for phase mirror array

Patents Applicationslast 30 patents

Patterning method for IC fabrication using 2-D layout decomposition...

Method to increase the pattern density of integrated circuits using...

Methods to increase pattern density and release overlay requirement...

Self-aligned contact frequency doubling technology for memory and l...

Nanodot and nanowire based MOSFET structures and fabrication processes

Spatial-frequency tripling and quadrupling processes for lithograph...

Wavefront modulation methods for EUV maskless lithography

Post-lithography misalignment correction with shadow effect for mul...

Pitch-shrinking technologies for lithographic application

Four-hinge micromirror with 3 degrees of freedom

Image improvement by using reflective mirrors between object and pr...

Vertical integrated-gate CMOS device and its fabrication process

Double hidden flexure microactuator for phase mirror array