Ying-Wei Yen

Person

Miaoli County, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,237,398
- Issue date Feb 25, 2025
- United Microelectronics Corp.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,063,135
- Issue date Jul 13, 2021
- United Microelectronics Corp.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and process thereof
- Patent number 9,634,083
- Issue date Apr 25, 2017
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing high-k dielectric layer
- Patent number 8,921,238
- Issue date Dec 30, 2014
- United Microelectronics Corp.
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon layer and method of forming the same
- Patent number 8,895,435
- Issue date Nov 25, 2014
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process
- Patent number 8,889,523
- Issue date Nov 18, 2014
- United Microelectronics Corp.
- Te-Lin Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and fabrication method thereof
- Patent number 8,802,579
- Issue date Aug 12, 2014
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating semiconductor device and method of fabricat...
- Patent number 8,741,784
- Issue date Jun 3, 2014
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure and a method for forming the same
- Patent number 8,614,152
- Issue date Dec 24, 2013
- United Microelectronics Corp.
- Chien-Liang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method for metal gate using ion implantation
- Patent number 8,536,038
- Issue date Sep 17, 2013
- United Microelectronics Corp.
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating silicon dioxide layer
- Patent number 8,501,636
- Issue date Aug 6, 2013
- United Microelectronics Corp.
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process
- Patent number 8,426,277
- Issue date Apr 23, 2013
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming repair layer and MOS transistor having repair l...
- Patent number 8,394,688
- Issue date Mar 12, 2013
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dioxide film fabricating process
- Patent number 8,263,501
- Issue date Sep 11, 2012
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for gate leakage reduction and Vt shift control and compleme...
- Patent number 8,232,605
- Issue date Jul 31, 2012
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step annealing process
- Patent number 7,811,892
- Issue date Oct 12, 2010
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate structure
- Patent number 7,709,316
- Issue date May 4, 2010
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for switching decoupled plasma nitridation processes of diff...
- Patent number 7,601,404
- Issue date Oct 13, 2009
- United Microelectronics Corp.
- Ying-Wei Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate structure
- Patent number 7,435,640
- Issue date Oct 14, 2008
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing metal-oxide-semiconductor transistor
- Patent number 7,335,548
- Issue date Feb 26, 2008
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating nitrogen-containing gate dielectric layer and...
- Patent number 7,312,139
- Issue date Dec 25, 2007
- United Microelectronics Corp.
- Yu-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating dielectric layer doped with nitrogen
- Patent number 7,265,065
- Issue date Sep 4, 2007
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming gate dielectric layer
- Patent number 7,214,631
- Issue date May 8, 2007
- United Microelectronics Corp.
- Yu-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing metal-oxide-semiconductor transistor
- Patent number 7,037,773
- Issue date May 2, 2006
- United Microelectronics Corp.
- Yu-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20210296466
- Publication date Sep 23, 2021
- UNITED MICROELECTRONICS CORP.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20190348520
- Publication date Nov 14, 2019
- UNITED MICROELECTRONICS CORP.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20170186617
- Publication date Jun 29, 2017
- UNITED MICROELECTRONICS CORP.
- Chien-Liang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON LAYER
- Publication number 20150021776
- Publication date Jan 22, 2015
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND PROCESS THEREOF
- Publication number 20140159211
- Publication date Jun 12, 2014
- UNITED MICROELECTRONICS CORP.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130171837
- Publication date Jul 4, 2013
- Te-Lin Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20130093064
- Publication date Apr 18, 2013
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130078818
- Publication date Mar 28, 2013
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD OF FABRICAT...
- Publication number 20130072028
- Publication date Mar 21, 2013
- United Microelectronics Corp.
- CHIEN-LIANG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING HIGH-K DIELECTRIC LAYER
- Publication number 20130072030
- Publication date Mar 21, 2013
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130012012
- Publication date Jan 10, 2013
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATING METHOD OF MOS TRANSISTOR, FIN FIELD-EFFECT TRANSISTOR A...
- Publication number 20130001707
- Publication date Jan 3, 2013
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE DIELECTRIC LAYER FORMING METHOD
- Publication number 20120329285
- Publication date Dec 27, 2012
- United Microelectronics Corp.
- Shao-Wei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FORMING REPAIR LAYER AND MOS TRANSISTOR HAVING REPAIR L...
- Publication number 20120326162
- Publication date Dec 27, 2012
- United Microelectronics Corp.
- Chien-Liang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR METAL GATE
- Publication number 20120329261
- Publication date Dec 27, 2012
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS AND STRUCTURE THEREOF
- Publication number 20120306028
- Publication date Dec 6, 2012
- Yu-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120309171
- Publication date Dec 6, 2012
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE AND A METHOD FOR FORMING THE SAME
- Publication number 20120299124
- Publication date Nov 29, 2012
- United Microelectronics Corp.
- Chien-Liang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
MANUFACTURING METHOD FOR METAL GATE STRUCTURE
- Publication number 20120264284
- Publication date Oct 18, 2012
- Shao-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON LAYER AND METHOD OF FORMING THE SAME
- Publication number 20120193796
- Publication date Aug 2, 2012
- United Microelectronics Corp.
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON DIOXIDE FILM FABRICATING PROCESS
- Publication number 20120156891
- Publication date Jun 21, 2012
- United Microelectronics Corp.
- Chien-Liang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for gate leakage reduction and Vt shift control and compleme...
- Publication number 20100148271
- Publication date Jun 17, 2010
- Chien-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING GATE STRUCTURE
- Publication number 20080318405
- Publication date Dec 25, 2008
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING GATE DIELECTRIC LAYER
- Publication number 20080254642
- Publication date Oct 16, 2008
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE
- Publication number 20080157231
- Publication date Jul 3, 2008
- United Microelectronics Corp.
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE AND METHOD OF FABRICATING THE SAME
- Publication number 20070102774
- Publication date May 10, 2007
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP ANNEALING PROCESS
- Publication number 20070082506
- Publication date Apr 12, 2007
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A DIELECTRIC LAYER
- Publication number 20070082503
- Publication date Apr 12, 2007
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Switching Decoupled Plasma Nitridation Processes of Diff...
- Publication number 20060280876
- Publication date Dec 14, 2006
- Ying-Wei Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Fabricating Dielectric Layer Doped with Nitrogen
- Publication number 20060246739
- Publication date Nov 2, 2006
- Yun-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS

Ying-Wei Yen

Person

Patents Grantslast 30 patents

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor structure and process thereof

Method for processing high-k dielectric layer

Polysilicon layer and method of forming the same

Semiconductor process

Semiconductor structure and fabrication method thereof

Process for fabricating semiconductor device and method of fabricat...

Gate structure and a method for forming the same

Manufacturing method for metal gate using ion implantation

Method for fabricating silicon dioxide layer

Semiconductor process

Process for forming repair layer and MOS transistor having repair l...

Silicon dioxide film fabricating process

Method for gate leakage reduction and Vt shift control and compleme...

Multi-step annealing process

Method of fabricating gate structure

Method for switching decoupled plasma nitridation processes of diff...

Method of fabricating gate structure

Method of manufacturing metal-oxide-semiconductor transistor

Method of fabricating nitrogen-containing gate dielectric layer and...

Method for fabricating dielectric layer doped with nitrogen

Method of forming gate dielectric layer

Method of manufacturing metal-oxide-semiconductor transistor

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR STRUCTURE

POLYSILICON LAYER

SEMICONDUCTOR STRUCTURE AND PROCESS THEREOF

SEMICONDUCTOR PROCESS

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF

SEMICONDUCTOR PROCESS

PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD OF FABRICAT...

METHOD FOR PROCESSING HIGH-K DIELECTRIC LAYER

SEMICONDUCTOR PROCESS

FABRICATING METHOD OF MOS TRANSISTOR, FIN FIELD-EFFECT TRANSISTOR A...

GATE DIELECTRIC LAYER FORMING METHOD

PROCESS FOR FORMING REPAIR LAYER AND MOS TRANSISTOR HAVING REPAIR L...

MANUFACTURING METHOD FOR METAL GATE

SEMICONDUCTOR PROCESS AND STRUCTURE THEREOF

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

GATE STRUCTURE AND A METHOD FOR FORMING THE SAME

MANUFACTURING METHOD FOR METAL GATE STRUCTURE

POLYSILICON LAYER AND METHOD OF FORMING THE SAME

SILICON DIOXIDE FILM FABRICATING PROCESS

Method for gate leakage reduction and Vt shift control and compleme...

METHOD OF FABRICATING GATE STRUCTURE

METHOD OF FABRICATING GATE DIELECTRIC LAYER

GATE STRUCTURE

GATE STRUCTURE AND METHOD OF FABRICATING THE SAME

MULTI-STEP ANNEALING PROCESS

METHOD OF FABRICATING A DIELECTRIC LAYER

Method for Switching Decoupled Plasma Nitridation Processes of Diff...

Method for Fabricating Dielectric Layer Doped with Nitrogen