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Yoshinori Morisada
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Hard mask, substrate processing method, and substrate processing ap...
Patent number
12,060,635
Issue date
Aug 13, 2024
Tokyo Electron Limited
Tsuyoshi Moriya
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Carbon hard mask, film forming apparatus, and film forming method
Patent number
11,993,849
Issue date
May 28, 2024
Tokyo Electron Limited
Masaru Hori
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for improving chemical resistance of polymerized film, polym...
Patent number
9,708,507
Issue date
Jul 18, 2017
Tokyo Electron Limited
Kippei Sugita
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Polymerized film forming method
Patent number
9,422,452
Issue date
Aug 23, 2016
Tokyo Electron Limited
Tatsuya Yamaguchi
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Shower plate having projections and plasma CVD apparatus using same
Patent number
7,799,134
Issue date
Sep 21, 2010
ASM Japan K.K.
Naoto Tsuji
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming a carbon polymer film using plasma CVD
Patent number
7,638,441
Issue date
Dec 29, 2009
ASM Japan K.K.
Yoshinori Morisada
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Method of forming a carbon polymer film using plasma CVD
Patent number
7,504,344
Issue date
Mar 17, 2009
ASM Japan K.K.
Nobuo Matsuki
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Method of forming a carbon polymer film using plasma CVD
Patent number
7,470,633
Issue date
Dec 30, 2008
ASM Japan K.K.
Nobuo Matsuki
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Method of forming carbon polymer film using plasma CVD
Patent number
7,410,915
Issue date
Aug 12, 2008
ASM Japan K.K.
Yoshinori Morisada
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Dual-chamber plasma processing apparatus
Patent number
7,381,291
Issue date
Jun 3, 2008
ASM Japan K.K.
Yasuhiro Tobe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for forming low-k hard film
Patent number
7,064,088
Issue date
Jun 20, 2006
ASM Japan K.K.
Yasuyoshi Hyodo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Insulation film on semiconductor substrate and method for forming same
Patent number
6,881,683
Issue date
Apr 19, 2005
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Insulation film on semiconductor substrate and method for forming same
Patent number
6,852,650
Issue date
Feb 8, 2005
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Insulation film on semiconductor substrate and method for forming same
Patent number
6,784,123
Issue date
Aug 31, 2004
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for forming low dielectric constant interlayer insulation film
Patent number
6,759,344
Issue date
Jul 6, 2004
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma CVD film-forming device
Patent number
6,740,367
Issue date
May 25, 2004
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma CVD film-forming device
Patent number
6,631,692
Issue date
Oct 14, 2003
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Siloxan polymer film on semiconductor substrate
Patent number
6,559,520
Issue date
May 6, 2003
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Siloxan polymer film on semiconductor substrate and method for form...
Patent number
6,514,880
Issue date
Feb 4, 2003
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Silicone polymer insulation film on semiconductor substrate and met...
Patent number
6,383,955
Issue date
May 7, 2002
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Silicone polymer insulation film on semiconductor substrate and met...
Patent number
6,352,945
Issue date
Mar 5, 2002
ASM Japan K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM
Publication number
20240321571
Publication date
Sep 26, 2024
TOKYO ELECTRON LIMITED
Daisuke OBA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
Publication number
20240240324
Publication date
Jul 18, 2024
TOKYO ELECTRON LIMITED
Masaru HORI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR FORMING SILICON-CONTAINING FILM AND FILM FORMING APPARATUS
Publication number
20240087883
Publication date
Mar 14, 2024
TOKYO ELECTRON LIMITED
Nobuo MATSUKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
Publication number
20230295797
Publication date
Sep 21, 2023
Tokyo Electron Limited
Nobuo MATSUKI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
Publication number
20220042173
Publication date
Feb 10, 2022
TOKYO ELECTRON LIMITED
Masaru HORI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
Publication number
20210301402
Publication date
Sep 30, 2021
TOKYO ELECTRON LIMITED
Yusuke SUZUKI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
HARD MASK, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING AP...
Publication number
20200370172
Publication date
Nov 26, 2020
TOKYO ELECTRON LIMITED
Tsuyoshi MORIYA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for Improving Chemical Resistance of Polymerized Film, Polym...
Publication number
20150240121
Publication date
Aug 27, 2015
TOKYO ELECTRON LIMITED
Kippei SUGITA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
POLYMERIZED FILM FORMING METHOD AND POLYMERIZED FILM FORMING APPARATUS
Publication number
20150232702
Publication date
Aug 20, 2015
TOKYO ELECTRON LIMITED
Tatsuya YAMAGUCHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF SELF-CLEANING OF CARBON-BASED FILM
Publication number
20090090382
Publication date
Apr 9, 2009
ASM JAPAN K.K.
Yoshinori Morisada
B08 - CLEANING
Information
Patent Application
METHOD OF FORMING A CARBON POLYMER FILM USING PLASMA CVD
Publication number
20090068852
Publication date
Mar 12, 2009
ASM JAPAN K.K.
Yoshinori MORISADA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming carbon polymer film using plasma CVD
Publication number
20070224833
Publication date
Sep 27, 2007
ASM JAPAN K.K.
Yoshinori Morisada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming a carbon polymer film using plasma CVD
Publication number
20070218705
Publication date
Sep 20, 2007
ASM JAPAN K.K.
Nobuo Matsuki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Plasma CVD film formation apparatus provided with mask
Publication number
20070065597
Publication date
Mar 22, 2007
ASM JAPAN K.K.
Shintaro Kaido
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Formation technology of nano-particle films having low dielectric c...
Publication number
20060105583
Publication date
May 18, 2006
ASM JAPAN K.K.
Shingo Ikeda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of forming a carbon polymer film using plasma CVD
Publication number
20060084280
Publication date
Apr 20, 2006
Nobuo Matsuki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Dual-chamber plasma processing apparatus
Publication number
20060021701
Publication date
Feb 2, 2006
ASM JAPAN K.K.
Yasuhiro Tobe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Shower plate having projections and plasma CVD apparatus using same
Publication number
20050183666
Publication date
Aug 25, 2005
ASM JAPAN K.K.
Naoto Tsuji
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method for forming low-k hard film
Publication number
20040038514
Publication date
Feb 26, 2004
ASM JAPAN K.K.
Yasuyoshi Hyodo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Insulation film on semiconductor substrate and method for forming same
Publication number
20030224622
Publication date
Dec 4, 2003
ASM JAPAN K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Insulation film on semiconductor substrate and method for forming same
Publication number
20030162408
Publication date
Aug 28, 2003
ASM JAPAN K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method for forming low dielectric constant interlayer insulation film
Publication number
20030143867
Publication date
Jul 31, 2003
ASM JAPAN K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Insulation film on semiconductor substrate and method for forming same
Publication number
20030119336
Publication date
Jun 26, 2003
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma CVD film-forming device
Publication number
20030089314
Publication date
May 15, 2003
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Siloxan polymer film on semiconductor substrate
Publication number
20020160626
Publication date
Oct 31, 2002
ASM JAPAN K.K.
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Siloxan polymer film on semiconductor substrate and method for form...
Publication number
20010046567
Publication date
Nov 29, 2001
Nobuo Matsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...