Yoshinori NAKAYAMA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Calibration sample, electron beam adjustment method and electron be...
- Patent number 11,435,178
- Issue date Sep 6, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement device, calibration method of measurement device, and c...
- Patent number 10,438,771
- Issue date Oct 8, 2019
- Hitachi High-Technologies Corporation
- Michio Hatano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern dimension measurement method and charged particle beam micr...
- Patent number 9,200,896
- Issue date Dec 1, 2015
- Hitachi High-Technologies Corporation
- Keiichiro Hitomi
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope
- Patent number 9,110,384
- Issue date Aug 18, 2015
- Hitachi High-Technologies Corporation
- Seiko Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Standard member for calibration and method of manufacturing the sam...
- Patent number 8,735,816
- Issue date May 27, 2014
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B32 - LAYERED PRODUCTS
Information Patent Grant
Charged beam device
- Patent number 8,478,021
- Issue date Jul 2, 2013
- Hitachi High-Technologies Corporation
- Kaori Shirahata
- G01 - MEASURING TESTING
Information Patent Grant
Calibration standard member, method for manufacturing the member an...
- Patent number 8,373,113
- Issue date Feb 12, 2013
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method and its mold
- Patent number 8,268,209
- Issue date Sep 18, 2012
- Hitachi, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Standard member for correction, scanning electron microscope using...
- Patent number 8,263,929
- Issue date Sep 11, 2012
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for inspecting reticle
- Patent number 8,064,681
- Issue date Nov 22, 2011
- Hitachi High-Technologies Corporation
- Nobuhiro Okai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion beam system and machining method
- Patent number 7,952,083
- Issue date May 31, 2011
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam orbit corrector and charged particle beam app...
- Patent number 7,947,964
- Issue date May 24, 2011
- Hitachi High-Technologies Corporation
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect inspection method and its system
- Patent number 7,943,903
- Issue date May 17, 2011
- Hitachi High-Technologies Corporation
- Shinji Okazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Standard component for calibration and electron-beam system using t...
- Patent number 7,875,850
- Issue date Jan 25, 2011
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Grant
Standard component for calibration and calibration method using it...
- Patent number 7,834,997
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning electron microscope and calibration of image distortion
- Patent number 7,750,296
- Issue date Jul 6, 2010
- Hitachi High-Technologies Corporation
- Keiichiro Hitomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam measurement equipment, size correction and st...
- Patent number 7,683,313
- Issue date Mar 23, 2010
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Standard reference component for calibration, fabrication method fo...
- Patent number 7,612,334
- Issue date Nov 3, 2009
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Standard component for length measurement, method for producing the...
- Patent number 7,595,482
- Issue date Sep 29, 2009
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Grant
Calibration method for electron-beam system and electron-beam system
- Patent number 7,476,882
- Issue date Jan 13, 2009
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Grant
Measurement method of electron beam current, electron beam writing...
- Patent number 7,425,714
- Issue date Sep 16, 2008
- Hitachi High-Technologies Corporation
- Makoto Sakakibara
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam writing system and electron beam writing method
- Patent number 7,423,274
- Issue date Sep 9, 2008
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Standard member for length measurement, method for producing the sa...
- Patent number 7,365,306
- Issue date Apr 29, 2008
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Grant
Standard reference for metrology and calibration method of electron...
- Patent number 7,358,495
- Issue date Apr 15, 2008
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Grant
Ion beam system and machining method
- Patent number 7,326,942
- Issue date Feb 5, 2008
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
Deflector, method of manufacturing deflector, and charged particle...
- Patent number 7,276,707
- Issue date Oct 2, 2007
- Canon Kabushiki Kaisha
- Yuichi Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflector, method of manufacturing deflector, and charged particle...
- Patent number 7,109,494
- Issue date Sep 19, 2006
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of charged particle beam lithography and equipment for charg...
- Patent number 7,105,842
- Issue date Sep 12, 2006
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing equipment and electron beam writing method
- Patent number 7,098,464
- Issue date Aug 29, 2006
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Standard reference for metrology and calibration method of electron...
- Patent number 7,078,691
- Issue date Jul 18, 2006
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...
- Publication number 20210131801
- Publication date May 6, 2021
- Hitachi High-Technologies Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT DEVICE, CALIBRATION METHOD OF MEASUREMENT DEVICE, AND C...
- Publication number 20170092462
- Publication date Mar 30, 2017
- Hitachi High-Technologies Corporation
- Michio HATANO
- G01 - MEASURING TESTING
Information Patent Application
STANDARD MEMBER FOR CALIBRATION AND METHOD OF MANUFACTURING THE SAM...
- Publication number 20130299699
- Publication date Nov 14, 2013
- Yoshinori Nakayama
- B32 - LAYERED PRODUCTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20120298865
- Publication date Nov 29, 2012
- Seiko Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICR...
- Publication number 20120212602
- Publication date Aug 23, 2012
- Keiichiro Hitomi
- G01 - MEASURING TESTING
Information Patent Application
CHARGED BEAM DEVICE
- Publication number 20110274341
- Publication date Nov 10, 2011
- Hitachi High-Technologies Corporation
- Kaori Shirahata
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION STANDARD MEMBER, METHOD FOR MANUFACTURING THE MEMBER AN...
- Publication number 20110210250
- Publication date Sep 1, 2011
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
MEASURING METHOD OF PATTERN DIMENSION AND SCANNING ELECTRON MICROSC...
- Publication number 20110208477
- Publication date Aug 25, 2011
- Keiichiro Hitomi
- G01 - MEASURING TESTING
Information Patent Application
ION Beam System and Machining Method
- Publication number 20110204225
- Publication date Aug 25, 2011
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Standard Member for Correction, Scanning Electron Microscope Using...
- Publication number 20110133065
- Publication date Jun 9, 2011
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
Defect inspection method and its system
- Publication number 20090206252
- Publication date Aug 20, 2009
- Hitachi High-Technologies Corporation
- Shinji Okazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for inspecting reticle
- Publication number 20090136116
- Publication date May 28, 2009
- Hitachi High-Technologies Corporation
- Nobuhiro Okai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Standard component for calibration and electron-beam system using t...
- Publication number 20080251868
- Publication date Oct 16, 2008
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Scanning Electron Microscope and Calibration of Image Distortion
- Publication number 20080210867
- Publication date Sep 4, 2008
- Keiichiro Hitomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam measurement equipment, size correction and st...
- Publication number 20080203285
- Publication date Aug 28, 2008
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Standard Component For Length Measurement, Method For Producing The...
- Publication number 20080198467
- Publication date Aug 21, 2008
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Ion Beam System And Machining method
- Publication number 20080135779
- Publication date Jun 12, 2008
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
STANDARD REFERENCE COMPONENT FOR CALIBRATION, FABRICATION METHOD FO...
- Publication number 20080121791
- Publication date May 29, 2008
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Orbit Corrector and Charged Particle Beam App...
- Publication number 20080116391
- Publication date May 22, 2008
- Hitachi High-Technologies Corporation
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STANDARD COMPONENT FOR CALIBRATION AND CALIBRATION METHOD USING IT...
- Publication number 20080067447
- Publication date Mar 20, 2008
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD AND ITS MOLD
- Publication number 20070164458
- Publication date Jul 19, 2007
- Masahiko Ogino
- G11 - INFORMATION STORAGE
Information Patent Application
STANDARD COMPONENT FOR LENGTH MEASUREMENT CALIBRATION, METHOD FOR M...
- Publication number 20070114449
- Publication date May 24, 2007
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Standard reference for metrology and calibration method of electron...
- Publication number 20060289756
- Publication date Dec 28, 2006
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Calibration method for electron-beam system and electron-beam system
- Publication number 20060255272
- Publication date Nov 16, 2006
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Standard member for length measurement, method for producing the sa...
- Publication number 20060237644
- Publication date Oct 26, 2006
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam writing system and electron beam writing method
- Publication number 20060197453
- Publication date Sep 7, 2006
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion beam system and machining method
- Publication number 20060065854
- Publication date Mar 30, 2006
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Measurement method of electron beam current, electron beam writing...
- Publication number 20060060775
- Publication date Mar 23, 2006
- Hitachi High-Technologies Corporation
- Makoto Sakakibara
- G01 - MEASURING TESTING
Information Patent Application
Measurement method of electron beam current, electron beam lithogra...
- Publication number 20060011869
- Publication date Jan 19, 2006
- Noriyuki Tanaka
- B82 - NANO-TECHNOLOGY
Information Patent Application
Deflector, method of manufacturing deflector, and charged particle...
- Publication number 20050263713
- Publication date Dec 1, 2005
- Canon Kabushiki Kaisha
- Yuichi Iwasaki
- B82 - NANO-TECHNOLOGY

Yoshinori NAKAYAMA

Person

Patents Grantslast 30 patents

Calibration sample, electron beam adjustment method and electron be...

Measurement device, calibration method of measurement device, and c...

Pattern dimension measurement method and charged particle beam micr...

Scanning electron microscope

Standard member for calibration and method of manufacturing the sam...

Charged beam device

Calibration standard member, method for manufacturing the member an...

Pattern forming method and its mold

Standard member for correction, scanning electron microscope using...

Method and apparatus for inspecting reticle

Ion beam system and machining method

Charged particle beam orbit corrector and charged particle beam app...

Defect inspection method and its system

Standard component for calibration and electron-beam system using t...

Standard component for calibration and calibration method using it...

Scanning electron microscope and calibration of image distortion

Charged particle beam measurement equipment, size correction and st...

Standard reference component for calibration, fabrication method fo...

Standard component for length measurement, method for producing the...

Calibration method for electron-beam system and electron-beam system

Measurement method of electron beam current, electron beam writing...

Electron beam writing system and electron beam writing method

Standard member for length measurement, method for producing the sa...

Standard reference for metrology and calibration method of electron...

Ion beam system and machining method

Deflector, method of manufacturing deflector, and charged particle...

Deflector, method of manufacturing deflector, and charged particle...

Method of charged particle beam lithography and equipment for charg...

Electron beam writing equipment and electron beam writing method

Standard reference for metrology and calibration method of electron...

Patents Applicationslast 30 patents

CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...

MEASUREMENT DEVICE, CALIBRATION METHOD OF MEASUREMENT DEVICE, AND C...

STANDARD MEMBER FOR CALIBRATION AND METHOD OF MANUFACTURING THE SAM...

SCANNING ELECTRON MICROSCOPE

PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICR...

CHARGED BEAM DEVICE

CALIBRATION STANDARD MEMBER, METHOD FOR MANUFACTURING THE MEMBER AN...

MEASURING METHOD OF PATTERN DIMENSION AND SCANNING ELECTRON MICROSC...

ION Beam System and Machining Method

Standard Member for Correction, Scanning Electron Microscope Using...

Defect inspection method and its system

Method and apparatus for inspecting reticle

Standard component for calibration and electron-beam system using t...

Scanning Electron Microscope and Calibration of Image Distortion

Charged particle beam measurement equipment, size correction and st...

Standard Component For Length Measurement, Method For Producing The...

Ion Beam System And Machining method

STANDARD REFERENCE COMPONENT FOR CALIBRATION, FABRICATION METHOD FO...

Charged Particle Beam Orbit Corrector and Charged Particle Beam App...

STANDARD COMPONENT FOR CALIBRATION AND CALIBRATION METHOD USING IT...

PATTERN FORMING METHOD AND ITS MOLD

STANDARD COMPONENT FOR LENGTH MEASUREMENT CALIBRATION, METHOD FOR M...

Standard reference for metrology and calibration method of electron...

Calibration method for electron-beam system and electron-beam system

Standard member for length measurement, method for producing the sa...

Electron beam writing system and electron beam writing method

Ion beam system and machining method

Measurement method of electron beam current, electron beam writing...

Measurement method of electron beam current, electron beam lithogra...

Deflector, method of manufacturing deflector, and charged particle...