Yoshitaka Tsunashima

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number RE46122
- Issue date Aug 23, 2016
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- 001 -
Information Patent Grant
Semiconductor memory device and method of manufacturing the same
- Patent number 9,293,563
- Issue date Mar 22, 2016
- Kabushiki Kaisha Toshiba
- Tetsuya Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of manufacturing the same
- Patent number 8,796,757
- Issue date Aug 5, 2014
- Kabushiki Kaisha Toshiba
- Tetsuya Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing thin film
- Patent number 7,972,960
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate insulating film structure includ...
- Patent number 7,947,610
- Issue date May 24, 2011
- Kabushiki Kaisha Toshiba
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,879,658
- Issue date Feb 1, 2011
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 7,858,536
- Issue date Dec 28, 2010
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device using dummy gate wirin...
- Patent number 7,772,076
- Issue date Aug 10, 2010
- Kabushiki Kaisha Toshiba
- Atsushi Yagishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an element isolating insulating film
- Patent number 7,772,671
- Issue date Aug 10, 2010
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same by fillin...
- Patent number 7,618,876
- Issue date Nov 17, 2009
- Kabushiki Kaisha Toshiba
- Osamu Arisumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate insulating film structure includ...
- Patent number 7,544,593
- Issue date Jun 9, 2009
- Kabushiki Kaisha Toshiba
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a localize SOI in bulk silicon substrate inc...
- Patent number 7,507,634
- Issue date Mar 24, 2009
- Kabushiki Kaisha Toshiba
- Tsutomu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,501,335
- Issue date Mar 10, 2009
- Kabushiki Kaisha Toshiba
- Katsuyuki Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture thereof
- Patent number 7,425,480
- Issue date Sep 16, 2008
- Kabushiki Kaisha Tohisba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,372,113
- Issue date May 13, 2008
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,361,960
- Issue date Apr 22, 2008
- Kabushiki Kaisha Toshiba
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture thereof
- Patent number 7,312,138
- Issue date Dec 25, 2007
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate insulating film structure includ...
- Patent number 7,306,994
- Issue date Dec 11, 2007
- Kabushiki Kaisha Toshiba
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device using an oxidation p...
- Patent number 7,303,946
- Issue date Dec 4, 2007
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 7,282,774
- Issue date Oct 16, 2007
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making empty space in silicon
- Patent number 7,235,456
- Issue date Jun 26, 2007
- Kabushiki Kaisha Toshiba
- Tsutomu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 7,208,797
- Issue date Apr 24, 2007
- Kabushiki Kaisha Toshiba
- Atsushi Yagishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method, semiconductor device man...
- Patent number 7,145,667
- Issue date Dec 5, 2006
- Kabushiki Kaisha Toshiba
- Akihito Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,129,132
- Issue date Oct 31, 2006
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 7,101,775
- Issue date Sep 5, 2006
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,098,115
- Issue date Aug 29, 2006
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,060,555
- Issue date Jun 13, 2006
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and the semiconductor...
- Patent number 7,041,584
- Issue date May 9, 2006
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate having pillars within a closed empty space
- Patent number 7,019,364
- Issue date Mar 28, 2006
- Kabushiki Kaisha Toshiba
- Tsutomu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method for a semiconductor device manufacturing apparatus
- Patent number 6,989,281
- Issue date Jan 24, 2006
- Kabushiki Kaisha Toshiba
- Akihito Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20140308789
- Publication date Oct 16, 2014
- KABUSHIKI KAISHA TOSHIBA
- Tetsuya Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20110303969
- Publication date Dec 15, 2011
- Tetsuya KAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20100055869
- Publication date Mar 4, 2010
- Kabushiki Kaisha Toshiba
- Osamu Arisumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A GATE INSULATING FILM STRUCTURE INCLUD...
- Publication number 20090233451
- Publication date Sep 17, 2009
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20090121279
- Publication date May 14, 2009
- Hirokazu Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING A SEMICONDUCTO...
- Publication number 20090108412
- Publication date Apr 30, 2009
- Hiroshi ITOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing semiconductor device
- Publication number 20080242115
- Publication date Oct 2, 2008
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device having an element isolating insulating film
- Publication number 20080224252
- Publication date Sep 18, 2008
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20080211004
- Publication date Sep 4, 2008
- Yoshio OZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a gate insulating film structure includ...
- Publication number 20080102616
- Publication date May 1, 2008
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate and its fabrication method
- Publication number 20080003771
- Publication date Jan 3, 2008
- Kabushiki Kaisha Toshiba
- Tsutomu Sato
- G02 - OPTICS
Information Patent Application
Semiconductor device and method of manufacture thereof
- Publication number 20070218605
- Publication date Sep 20, 2007
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20070215958
- Publication date Sep 20, 2007
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacture thereof
- Publication number 20070218606
- Publication date Sep 20, 2007
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOS type nonvolatile memory cell, nonvolatile memory, and manufac...
- Publication number 20070200168
- Publication date Aug 30, 2007
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20070172997
- Publication date Jul 26, 2007
- Kabushiki Kaisha Toshiba
- Atsushi Yagishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20060270170
- Publication date Nov 30, 2006
- Osamu Arisumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing semiconductor device
- Publication number 20060244083
- Publication date Nov 2, 2006
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor substrate and its fabrication method
- Publication number 20060131651
- Publication date Jun 22, 2006
- Kabushiki Kaisha Toshiba
- Tsutomu Sato
- G02 - OPTICS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20050170666
- Publication date Aug 4, 2005
- Katsuyuki Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20050158932
- Publication date Jul 21, 2005
- Seiji Inumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning method for a semiconductor device manufacturing apparatus
- Publication number 20050059203
- Publication date Mar 17, 2005
- Kabushiki Kaisha Toshiba
- Akihito Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a gate insulating film structure includ...
- Publication number 20050006675
- Publication date Jan 13, 2005
- Kabushiki Kaisha Toshiba
- Yoshitaka Tsunashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing semiconductor device
- Publication number 20050006674
- Publication date Jan 13, 2005
- Kabushiki Kaisha Toshiba
- Kazuhiro Eguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040266176
- Publication date Dec 30, 2004
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040266177
- Publication date Dec 30, 2004
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040259386
- Publication date Dec 23, 2004
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040251521
- Publication date Dec 16, 2004
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and the semiconductor...
- Publication number 20040248393
- Publication date Dec 9, 2004
- Kabushiki Kaisha Toshiba
- Masayuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING
- Publication number 20040171252
- Publication date Sep 2, 2004
- Haoren Zhuang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yoshitaka Tsunashima

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Semiconductor memory device and method of manufacturing the same

Semiconductor memory device and method of manufacturing the same

Method for manufacturing thin film

Semiconductor device having a gate insulating film structure includ...

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing semiconductor device

Method of manufacturing semiconductor device using dummy gate wirin...

Semiconductor device having an element isolating insulating film

Semiconductor device and method of manufacturing the same by fillin...

Semiconductor device having a gate insulating film structure includ...

Method for fabricating a localize SOI in bulk silicon substrate inc...

Semiconductor device and manufacturing method of the same

Semiconductor device and method of manufacture thereof

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacture thereof

Semiconductor device having a gate insulating film structure includ...

Method of manufacturing a semiconductor device using an oxidation p...

Semiconductor device and method for manufacturing semiconductor device

Method of making empty space in silicon

Semiconductor device

Semiconductor device manufacturing method, semiconductor device man...

Semiconductor device and method of manufacturing the same

Semiconductor device and method for manufacturing semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Method of manufacturing semiconductor device and the semiconductor...

Semiconductor substrate having pillars within a closed empty space

Cleaning method for a semiconductor device manufacturing apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

Semiconductor device and method of manufacturing same

SEMICONDUCTOR DEVICE HAVING A GATE INSULATING FILM STRUCTURE INCLUD...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING A SEMICONDUCTO...

Semiconductor device and method for manufacturing semiconductor device

Semiconductor device having an element isolating insulating film

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Semiconductor device having a gate insulating film structure includ...

Semiconductor substrate and its fabrication method

Semiconductor device and method of manufacture thereof

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacture thereof

MONOS type nonvolatile memory cell, nonvolatile memory, and manufac...

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing same

Semiconductor device and method for manufacturing semiconductor device

Semiconductor substrate and its fabrication method

Semiconductor device and manufacturing method of the same

Method of manufacturing semiconductor device

Cleaning method for a semiconductor device manufacturing apparatus

Semiconductor device having a gate insulating film structure includ...

Semiconductor device and method for manufacturing semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Method of manufacturing semiconductor device and the semiconductor...

REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING