Yuri Granik

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Source optimization for image fidelity and throughput
- Patent number 10,248,028
- Issue date Apr 2, 2019
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Horizontal development bias in negative tone development of photore...
- Patent number 9,678,435
- Issue date Jun 13, 2017
- Mentor Graphics, A Siemens Business
- Yunfei Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 9,418,195
- Issue date Aug 16, 2016
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Density-based integrated circuit design adjustment
- Patent number 9,355,201
- Issue date May 31, 2016
- Mentor Graphics Corporation
- Yuri Granik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating guiding patterns for directed self-assembly
- Patent number 9,330,228
- Issue date May 3, 2016
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source optimization by assigning pixel intensities for diffractive...
- Patent number 9,323,161
- Issue date Apr 26, 2016
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating guiding patterns for directed self-assembly
- Patent number 9,032,357
- Issue date May 12, 2015
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Density-based integrated circuit design adjustment
- Patent number 9,009,643
- Issue date Apr 14, 2015
- Mentor Graphics Corporation
- Yuri Granik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 8,843,859
- Issue date Sep 23, 2014
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Optical proximity correction for topographically non-uniform substr...
- Patent number 8,799,832
- Issue date Aug 5, 2014
- Mentor Graphics Corporation
- Yuri Granik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Layout design defect repair using inverse lithography
- Patent number 8,788,982
- Issue date Jul 22, 2014
- Mentor Graphics Corporation
- George Lippincott
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contour alignment for model calibration
- Patent number 8,607,168
- Issue date Dec 10, 2013
- Mentor Graphics Corporation
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam simulation corner correction for optical lithography
- Patent number 8,464,185
- Issue date Jun 11, 2013
- Mentor Graphics Corporation
- Yuri Granik
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Inverse mask design and correction for electronic design
- Patent number 8,434,031
- Issue date Apr 30, 2013
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverse mask design and correction for electronic design
- Patent number 8,234,598
- Issue date Jul 31, 2012
- Yuri Granik
Information Patent Grant
Contrast-based resolution enhancement for photolithographic processing
- Patent number 8,108,806
- Issue date Jan 31, 2012
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Model-based SRAF insertion
- Patent number 8,037,429
- Issue date Oct 11, 2011
- Mentor Graphics Corporation
- Shumay Dou Shang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculation system for inverse masks
- Patent number 7,987,434
- Issue date Jul 26, 2011
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shape-based photolithographic model calibration
- Patent number 7,805,699
- Issue date Sep 28, 2010
- Mentor Graphics Corporation
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source optimization for image fidelity and throughput
- Patent number 7,623,220
- Issue date Nov 24, 2009
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contrast based resolution enhancement for photolithographic processing
- Patent number 7,562,336
- Issue date Jul 14, 2009
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calculation system for inverse masks
- Patent number 7,552,416
- Issue date Jun 23, 2009
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculation system for inverse masks
- Patent number 7,487,489
- Issue date Feb 3, 2009
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of compensating for etch effects in photolithographic proces...
- Patent number 7,392,168
- Issue date Jun 24, 2008
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Grid-based resist simulation
- Patent number 7,378,202
- Issue date May 27, 2008
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contrast based resolution enhancement for photolithographic processing
- Patent number 7,293,249
- Issue date Nov 6, 2007
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source optimization for image fidelity and throughput
- Patent number 7,245,354
- Issue date Jul 17, 2007
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matrix optical process correction
- Patent number 7,237,221
- Issue date Jun 26, 2007
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Long range corrections in integrated circuit layout designs
- Patent number 7,234,130
- Issue date Jun 19, 2007
- James Word
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contrast based resolution enhancing technology
- Patent number 7,013,439
- Issue date Mar 14, 2006
- Juan Andres Torres Robles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT
- Publication number 20160238950
- Publication date Aug 18, 2016
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modeling Photoresist Shrinkage Effects In Lithography
- Publication number 20160140278
- Publication date May 19, 2016
- Mentor Graphics Corporation
- Yunfei Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Generating Guiding Patterns For Directed Self-Assembly
- Publication number 20150227676
- Publication date Aug 13, 2015
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Generating Guiding Patterns For Directed Self-Assembly
- Publication number 20150143323
- Publication date May 21, 2015
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis For Source Mask Optimization Acceleration
- Publication number 20150067628
- Publication date Mar 5, 2015
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL PROXIMITY CORRECTION FOR TOPOGRAPHICALLY NON-UNIFORM SUBSTR...
- Publication number 20140229903
- Publication date Aug 14, 2014
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DENSITY-BASED INTEGRATED CIRCUIT DESIGN ADJUSTMENT
- Publication number 20140053123
- Publication date Feb 20, 2014
- Mentor Graphics Corporation
- Yuri Granik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Calculation System For Inverse Masks
- Publication number 20130227500
- Publication date Aug 29, 2013
- Mentor Graphics Corporation
- Kyohei Sakajiri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Design Defect Repair Using Inverse Lithography
- Publication number 20130191795
- Publication date Jul 25, 2013
- Mentor Graphics Corporation
- George Lippincott
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20130036390
- Publication date Feb 7, 2013
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Application
Inverse Mask Design and Correction for Electronic Design
- Publication number 20120042291
- Publication date Feb 16, 2012
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contour Alignment For Model Calibration
- Publication number 20110202898
- Publication date Aug 18, 2011
- Mentor Graphics Corporation
- IR KUSNADI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contour Self-Alignment For Optical Proximity Correction Model Calib...
- Publication number 20110202893
- Publication date Aug 18, 2011
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Transfer Modeling for Optical Lithographic Processes
- Publication number 20110138343
- Publication date Jun 9, 2011
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20110047519
- Publication date Feb 24, 2011
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inverse Mask Design and Correction for Electronic Design
- Publication number 20110004856
- Publication date Jan 6, 2011
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Visibility and Transport Kernels for Variable Etch Bias Modeling of...
- Publication number 20100269084
- Publication date Oct 21, 2010
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron Beam Simulation Corner Correction For Optical Lithpography
- Publication number 20100269086
- Publication date Oct 21, 2010
- Yuri Granik
- B82 - NANO-TECHNOLOGY
Information Patent Application
SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT
- Publication number 20100039633
- Publication date Feb 18, 2010
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculation System For Inverse Masks
- Publication number 20100023915
- Publication date Jan 28, 2010
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTRAST-BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING
- Publication number 20090271759
- Publication date Oct 29, 2009
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALCULATION SYSTEM FOR INVERSE MASKS
- Publication number 20090125869
- Publication date May 14, 2009
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Shape-based photolithographic model calibration
- Publication number 20090100389
- Publication date Apr 16, 2009
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source optimization for image fidelity and throughput
- Publication number 20080174756
- Publication date Jul 24, 2008
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Grid-based resist simulation
- Publication number 20070196747
- Publication date Aug 23, 2007
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALCULATION SYSTEM FOR INVERSE MASKS
- Publication number 20070198963
- Publication date Aug 23, 2007
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTRAST BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING
- Publication number 20070124708
- Publication date May 31, 2007
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Calculation system for inverse masks
- Publication number 20060269875
- Publication date Nov 30, 2006
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Model-based SRAF insertion
- Publication number 20060200790
- Publication date Sep 7, 2006
- Shumay Dou Shang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Matrix optical process correction
- Publication number 20050278685
- Publication date Dec 15, 2005
- Mentor Graphics Corporation
- Yuri Granik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yuri Granik

Person

Patents Grantslast 30 patents

Source optimization for image fidelity and throughput

Horizontal development bias in negative tone development of photore...

Layout content analysis for source mask optimization acceleration

Density-based integrated circuit design adjustment

Generating guiding patterns for directed self-assembly

Source optimization by assigning pixel intensities for diffractive...

Generating guiding patterns for directed self-assembly

Density-based integrated circuit design adjustment

Layout content analysis for source mask optimization acceleration

Optical proximity correction for topographically non-uniform substr...

Layout design defect repair using inverse lithography

Contour alignment for model calibration

Electron beam simulation corner correction for optical lithography

Inverse mask design and correction for electronic design

Inverse mask design and correction for electronic design

Contrast-based resolution enhancement for photolithographic processing

Model-based SRAF insertion

Calculation system for inverse masks

Shape-based photolithographic model calibration

Source optimization for image fidelity and throughput

Contrast based resolution enhancement for photolithographic processing

Calculation system for inverse masks

Calculation system for inverse masks

Method of compensating for etch effects in photolithographic proces...

Grid-based resist simulation

Contrast based resolution enhancement for photolithographic processing

Source optimization for image fidelity and throughput

Matrix optical process correction

Long range corrections in integrated circuit layout designs

Contrast based resolution enhancing technology

Patents Applicationslast 30 patents

SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT

Modeling Photoresist Shrinkage Effects In Lithography

Generating Guiding Patterns For Directed Self-Assembly

Generating Guiding Patterns For Directed Self-Assembly

Layout Content Analysis For Source Mask Optimization Acceleration

OPTICAL PROXIMITY CORRECTION FOR TOPOGRAPHICALLY NON-UNIFORM SUBSTR...

DENSITY-BASED INTEGRATED CIRCUIT DESIGN ADJUSTMENT

Calculation System For Inverse Masks

Layout Design Defect Repair Using Inverse Lithography

Layout Content Analysis for Source Mask Optimization Acceleration

Inverse Mask Design and Correction for Electronic Design

Contour Alignment For Model Calibration

Contour Self-Alignment For Optical Proximity Correction Model Calib...

Pattern Transfer Modeling for Optical Lithographic Processes

Layout Content Analysis for Source Mask Optimization Acceleration

Inverse Mask Design and Correction for Electronic Design

Visibility and Transport Kernels for Variable Etch Bias Modeling of...

Electron Beam Simulation Corner Correction For Optical Lithpography

SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT

Calculation System For Inverse Masks

CONTRAST-BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING

CALCULATION SYSTEM FOR INVERSE MASKS

Shape-based photolithographic model calibration

Source optimization for image fidelity and throughput

Grid-based resist simulation

CALCULATION SYSTEM FOR INVERSE MASKS

CONTRAST BASED RESOLUTION ENHANCEMENT FOR PHOTOLITHOGRAPHIC PROCESSING

Calculation system for inverse masks

Model-based SRAF insertion

Matrix optical process correction