Yuri Maishev

Person

Moscow, RU

People

Patents Grantslast 30 patents

Information Patent Grant
Multiple-cell source of uniform plasma
- Patent number 6,250,250
- Issue date Jun 26, 2001
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-beam source with virtual anode
- Patent number 6,246,059
- Issue date Jun 12, 2001
- Advanced Ion Technology, Inc.
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-beam source with uniform distribution of ion-current density on...
- Patent number 6,242,749
- Issue date Jun 5, 2001
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-beam source with channeling sputterable targets and a method fo...
- Patent number 6,238,526
- Issue date May 29, 2001
- Advanced Ion Technology, Inc.
- Yuri Maishev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple-beam ion-beam assembly
- Patent number 6,236,163
- Issue date May 22, 2001
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined ion-source and target-sputtering magnetron and a method fo...
- Patent number 6,214,183
- Issue date Apr 10, 2001
- Advanced Ion Technology, Inc.
- Yuri Maishev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for combined treatment of an object with an ion beam and a m...
- Patent number 6,153,067
- Issue date Nov 28, 2000
- Advanced Ion Technology, Inc.
- Yuri Maishev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Universal cold-cathode type ion source with closed-loop electron dr...
- Patent number 6,147,354
- Issue date Nov 14, 2000
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold-cathode ion source with propagation of ions in the electron dr...
- Patent number 6,130,507
- Issue date Oct 10, 2000
- Advanced Ion Technology, Inc
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold-cathode ion source with a controlled position of ion beam
- Patent number 6,037,717
- Issue date Mar 14, 2000
- Advanced Ion Technology, Inc.
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal cold-cathode type ion source with closed-loop electron dr...
- Patent number 6,002,208
- Issue date Dec 14, 1999
- Advanced Ion Technology, Inc.
- Yuri Maishev
- H01 - BASIC ELECTRIC ELEMENTS

Yuri Maishev

Person

Patents Grantslast 30 patents

Multiple-cell source of uniform plasma

Ion-beam source with virtual anode

Ion-beam source with uniform distribution of ion-current density on...

Ion-beam source with channeling sputterable targets and a method fo...

Multiple-beam ion-beam assembly

Combined ion-source and target-sputtering magnetron and a method fo...

Method for combined treatment of an object with an ion beam and a m...

Universal cold-cathode type ion source with closed-loop electron dr...

Cold-cathode ion source with propagation of ions in the electron dr...

Cold-cathode ion source with a controlled position of ion beam

Universal cold-cathode type ion source with closed-loop electron dr...