Zhengmao Ye

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Shaping system including an evaporation cover, shaping process, and...
- Patent number 11,951,660
- Issue date Apr 9, 2024
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Liquid charging apparatus, liquid charging method, and manufacturin...
- Patent number 11,247,459
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Imprint apparatus and method of imprinting a partial field
- Patent number 11,104,057
- Issue date Aug 31, 2021
- Canon Kabushiki Kaisha
- Mario Johannes Meissl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint system and imprinting process with spatially non-uniform il...
- Patent number 10,663,869
- Issue date May 26, 2020
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge field imprint lithography
- Patent number 10,549,313
- Issue date Feb 4, 2020
- Canon Kabushiki Kaisha
- Zhengmao Ye
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Fluid droplet methodology and apparatus for imprint lithography
- Patent number 10,468,247
- Issue date Nov 5, 2019
- Canon Kabushiki Kaisha
- Edward Brian Fletcher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and article manufacturing method
- Patent number 10,335,984
- Issue date Jul 2, 2019
- Canon Kabushiki Kaisha
- Byung-jin Choi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprint apparatus, and method of manufacturing article
- Patent number 10,199,244
- Issue date Feb 5, 2019
- Canon Kabushiki Kaisha
- Nobuto Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography template and method for zero-gap imprinting
- Patent number 10,124,529
- Issue date Nov 13, 2018
- Canon Nanotechnologies, Inc.
- Gaddi S. Haase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removing substrate pretreatment compositions in nanoimprint lithogr...
- Patent number 10,095,106
- Issue date Oct 9, 2018
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for controlling spread of imprint material
- Patent number 10,035,296
- Issue date Jul 31, 2018
- Canon Kabushiki Kaisha
- Zhengmao Ye
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Methods for uniform imprint pattern transfer of sub-20 nm features
- Patent number 9,514,950
- Issue date Dec 6, 2016
- Canon Nanotechnologies, Inc.
- Zhengmao Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facilitating adhesion between substrate and patterned layer
- Patent number 8,361,546
- Issue date Jan 29, 2013
- Molecular Imprints, Inc.
- Edward B. Fletcher
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR INHIBITING FORMABLE MATERIAL EVAPORATION, SYSTEM FOR INH...
- Publication number 20230197462
- Publication date Jun 22, 2023
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPING SYSTEM INCLUDING AN EVAPORATION COVER, SHAPING PROCESS, AND...
- Publication number 20230109973
- Publication date Apr 13, 2023
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
LIQUID CHARGING APPARATUS, LIQUID CHARGING METHOD, AND MANUFACTURIN...
- Publication number 20210023840
- Publication date Jan 28, 2021
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
IMPRINT SYSTEM AND IMPRINTING PROCESS WITH SPATIALLY NON-UNIFORM IL...
- Publication number 20190179228
- Publication date Jun 13, 2019
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY
- Publication number 20180166349
- Publication date Jun 14, 2018
- Canon Kabushiki Kaisha
- Edward Brian FLETCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CONTROLLING SPREAD OF IMPRINT MATERIAL
- Publication number 20180104888
- Publication date Apr 19, 2018
- Canon Kabushiki Kaisha
- Zhengmao Ye
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGR...
- Publication number 20170282440
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- Timothy Brian Stachowiak
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS AND METHOD OF IMPRINTING A PARTIAL FIELD
- Publication number 20170165898
- Publication date Jun 15, 2017
- Canon Kabushiki Kaisha
- Mario Johannes Meissl
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20170047234
- Publication date Feb 16, 2017
- Canon Kabushiki Kaisha
- Nobuto Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20170028598
- Publication date Feb 2, 2017
- Canon Kabushiki Kaisha
- Byung-jin Choi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Methods for Uniform Imprint Pattern Transfer of Sub-20 nm Features
- Publication number 20150187590
- Publication date Jul 2, 2015
- Canon Nanotechnologies, Inc.
- Zhengmao Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING
- Publication number 20150158240
- Publication date Jun 11, 2015
- Canon Nanotechnologies, Inc.
- Gaddi S. Haase
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Vapor Delivery System For Use in Imprint Lithography
- Publication number 20120070572
- Publication date Mar 22, 2012
- Molecular Imprints, Inc.
- Zhengmao Ye
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS OF CLEANING HARD DRIVE DISK SUBSTRATES FOR NANOIMPRINT LITH...
- Publication number 20120058258
- Publication date Mar 8, 2012
- Molecular Imprints, Inc.
- Zhengmao Ye
- B08 - CLEANING
Information Patent Application
ADHESION LAYERS IN NANOIMPRINT LITHOGRAHY
- Publication number 20110165412
- Publication date Jul 7, 2011
- Molecular Imprints, Inc.
- Zhengmao Ye
- B82 - NANO-TECHNOLOGY
Information Patent Application
Facilitating Adhesion Between Substrate and Patterned Layer
- Publication number 20100112236
- Publication date May 6, 2010
- Molecular Imprints, Inc.
- Edward B. Fletcher
- B82 - NANO-TECHNOLOGY
Information Patent Application
Thermoelectric device structure and apparatus incorporating same
- Publication number 20060076046
- Publication date Apr 13, 2006
- NanoCoolers, Inc.
- Uttam Ghoshal
- H01 - BASIC ELECTRIC ELEMENTS

Zhengmao Ye

Person

Patents Grantslast 30 patents

Shaping system including an evaporation cover, shaping process, and...

Liquid charging apparatus, liquid charging method, and manufacturin...

Imprint apparatus and method of imprinting a partial field

Imprint system and imprinting process with spatially non-uniform il...

Edge field imprint lithography

Fluid droplet methodology and apparatus for imprint lithography

Imprint apparatus and article manufacturing method

Imprint apparatus, and method of manufacturing article

Imprint lithography template and method for zero-gap imprinting

Removing substrate pretreatment compositions in nanoimprint lithogr...

Methods for controlling spread of imprint material

Methods for uniform imprint pattern transfer of sub-20 nm features

Facilitating adhesion between substrate and patterned layer

Patents Applicationslast 30 patents

METHOD FOR INHIBITING FORMABLE MATERIAL EVAPORATION, SYSTEM FOR INH...

SHAPING SYSTEM INCLUDING AN EVAPORATION COVER, SHAPING PROCESS, AND...

LIQUID CHARGING APPARATUS, LIQUID CHARGING METHOD, AND MANUFACTURIN...

IMPRINT SYSTEM AND IMPRINTING PROCESS WITH SPATIALLY NON-UNIFORM IL...

FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY

METHODS FOR CONTROLLING SPREAD OF IMPRINT MATERIAL

REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGR...

IMPRINT APPARATUS AND METHOD OF IMPRINTING A PARTIAL FIELD

IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD

Methods for Uniform Imprint Pattern Transfer of Sub-20 nm Features

IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING

Vapor Delivery System For Use in Imprint Lithography

METHODS OF CLEANING HARD DRIVE DISK SUBSTRATES FOR NANOIMPRINT LITH...

ADHESION LAYERS IN NANOIMPRINT LITHOGRAHY

Facilitating Adhesion Between Substrate and Patterned Layer

Thermoelectric device structure and apparatus incorporating same