Aberration measurement

Industry

CPC
G03F7/706

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/706Aberration measurement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,365
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,364
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
IC fabrication flow with dynamic sampling for measurement
- Patent number 12,169,178
- Issue date Dec 17, 2024
- Texas Instruments Incorporated
- Jonas Hoehenberger
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination and detection apparatus for a metrology apparatus
- Patent number 12,158,435
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing lithography operation for manufacturing semiconductor dev...
- Patent number 12,153,351
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring system and method for verifying measurements in patterne...
- Patent number 12,152,869
- Issue date Nov 26, 2024
- Nova Ltd.
- Boaz Brill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 12,153,352
- Issue date Nov 26, 2024
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting critical dimension measurements of lithograph...
- Patent number 12,147,163
- Issue date Nov 19, 2024
- United Microelectronics Corp.
- Hsin-Yu Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of tuning a model for a lithographic process and associated...
- Patent number 12,147,161
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Mhamed Akhssay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining best focus and best dose in exposure process
- Patent number 12,135,504
- Issue date Nov 5, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectrometric metrology systems based on multimode interference and...
- Patent number 12,135,505
- Issue date Nov 5, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay metrology and apparatus thereof
- Patent number 12,130,246
- Issue date Oct 29, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced cross sectional features measurement methodology
- Patent number 12,123,708
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Manoj Kumar Dayyala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus
- Patent number 12,124,176
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Pawel Safinowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 12,124,174
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Paul Jonathan Turner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensation method for overlay deviation
- Patent number 12,124,175
- Issue date Oct 22, 2024
- Semiconductor Manufacturing South China Corporation
- Hai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining overlay error during semiconductor fabrication
- Patent number 12,117,735
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Kai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20240419086
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AUGMENTED DATA TO TRAIN MACHINE LEARNING MODELS TO PRESE...
- Publication number 20240420025
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Jiaxing REN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...
- Publication number 20240405100
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Sheng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
- Publication number 20240402616
- Publication date Dec 5, 2024
- City University of Hong Kong
- Yubin Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING LEARNING MODEL FOR PREDICTING SEMICONDUCTOR D...
- Publication number 20240402619
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Minkyu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
- Publication number 20240402618
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...
- Publication number 20240402617
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Spencer ALEXANDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...
- Publication number 20240402614
- Publication date Dec 5, 2024
- HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Hao Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...
- Publication number 20240402620
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Paul Corné Henri DE WIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...
- Publication number 20240402093
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Xiaodong MENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20240404036
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATIONAL WAFER INSPECTION
- Publication number 20240403537
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Christophe David FOUQUET
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...
- Publication number 20240393701
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Chen SU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL
- Publication number 20240395637
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFRACTION GRATING FOR MEASUREMENTS IN EUV-EXPOSURE APPARATUSES
- Publication number 20240385356
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Derick Yun Chek CHONG
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385537
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20240385530
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Structures for Acoustic Wave Overlay Error Determination
- Publication number 20240385533
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20240385531
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION-BASED IMAGE PROCESSING FOR METROLOGY
- Publication number 20240385532
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Waheb Bishara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY
- Publication number 20240377759
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE
- Publication number 20240377758
- Publication date Nov 14, 2024
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT
- Publication number 20240377757
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jun Yeob KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY APPARATUS AND OPERATION METHOD OF THE SAME
- Publication number 20240377760
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Hyunwoong HWANG
- H01 - BASIC ELECTRIC ELEMENTS

Aberration measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Computer-readable storage medium recording data structure for stori...

Computer-readable storage medium recording data structure for stori...

Voltage contrast metrology mark

IC fabrication flow with dynamic sampling for measurement

Metrology method and apparatus for of determining a complex-valued...

Method for reproducing a target wavefront of an imaging optical pro...

Illumination and detection apparatus for a metrology apparatus

Enhancing lithography operation for manufacturing semiconductor dev...

Monitoring system and method for verifying measurements in patterne...

System and method for focus control in extreme ultraviolet lithogra...

Method of manufacturing semiconductor devices

System and method for aligned stitching

Method for correcting critical dimension measurements of lithograph...

Methods of tuning a model for a lithographic process and associated...

Overlay target design for improved target placement accuracy

Optical designs of miniaturized overlay measurement system

Metrology measurement method and apparatus

Method and apparatus to determine a patterning process parameter us...

Method for determining best focus and best dose in exposure process

Spectrometric metrology systems based on multimode interference and...

Method for overlay metrology and apparatus thereof

Method for measuring critical dimension

Enhanced cross sectional features measurement methodology

Lithographic apparatus, metrology systems, illumination sources and...

Overlay measurement system using lock-in amplifier technique

Inspection apparatus

Metrology method and apparatus, computer program and lithographic s...

Compensation method for overlay deviation

Method of determining overlay error during semiconductor fabrication

Method for measuring critical dimension

Patents Applicationslast 30 patents

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

GENERATING AUGMENTED DATA TO TRAIN MACHINE LEARNING MODELS TO PRESE...

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

PHOTODETECTOR

INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY

METHOD FOR GENERATING LEARNING MODEL FOR PREDICTING SEMICONDUCTOR D...

METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION

SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...

QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...

SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...

METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

COMPUTATIONAL WAFER INSPECTION

ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...

METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL

DIFFRACTION GRATING FOR MEASUREMENTS IN EUV-EXPOSURE APPARATUSES

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

Method and Structures for Acoustic Wave Overlay Error Determination

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

OPTIMIZATION-BASED IMAGE PROCESSING FOR METROLOGY

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY

METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE

DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT

PHOTOLITHOGRAPHY APPARATUS AND OPERATION METHOD OF THE SAME