Aberration measurement

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CPC
G03F7/706

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/706Aberration measurement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 12,265,337
- Issue date Apr 1, 2025
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with grating structure
- Patent number 12,259,658
- Issue date Mar 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark, overlay marking method and overlay measuring method
- Patent number 12,259,661
- Issue date Mar 25, 2025
- NEXCHIP SEMICONDUCTOR CORPORATION
- Kuotung Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for property joint interpolation and prediction
- Patent number 12,254,392
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Faegheh Hasibi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
- Patent number 12,253,805
- Issue date Mar 18, 2025
- KLA Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Universal metrology file, protocol, and process for maskless lithog...
- Patent number 12,248,254
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay error correction
- Patent number 12,242,202
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Shih-Yuan Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Scanning overlay metrology with high signal to noise ratio
- Patent number 12,235,588
- Issue date Feb 25, 2025
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,235,590
- Issue date Feb 25, 2025
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning on overlay management
- Patent number 12,237,188
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow-core photonic crystal fiber based broadband radiation generator
- Patent number 12,237,639
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- John Colin Travers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 12,236,364
- Issue date Feb 25, 2025
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer registration and overlay measurement systems and related methods
- Patent number 12,230,546
- Issue date Feb 18, 2025
- Micron Technology, Inc.
- Nikolay A. Mirin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining aberration sensitivity of patterns
- Patent number 12,222,656
- Issue date Feb 11, 2025
- ASML Netherlands B.V.
- Jingjing Liu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Systems and methods for measurement of misregistration and ameliora...
- Patent number 12,222,199
- Issue date Feb 11, 2025
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency-picked methodology for diffraction-based overlay measurement
- Patent number 12,216,412
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining a measurement recipe and associated apparatuses
- Patent number 12,210,293
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES
- Publication number 20250110381
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
- Publication number 20250102923
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Lingling PU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR
- Publication number 20250102924
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
- Publication number 20250093785
- Publication date Mar 20, 2025
- Nikon Corporation
- Yuho KANAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY
- Publication number 20250093787
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- G01 - MEASURING TESTING
Information Patent Application
MASK QUALITY MANAGEMENT SYSTEM
- Publication number 20250093769
- Publication date Mar 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- SUNGMIN HUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF
- Publication number 20250096146
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao Chu Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM
- Publication number 20250093786
- Publication date Mar 20, 2025
- KLA Corporation
- Yonatan Vaknin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT OPTICAL SYSTEM FOR METROLOGY INSPECTION AND METHOD OF M...
- Publication number 20250085642
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Kyuhwan CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...
- Publication number 20250085640
- Publication date Mar 13, 2025
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...
- Publication number 20250078244
- Publication date Mar 6, 2025
- ASML NETHERLANDS B.V.
- Chen ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Monitoring Ghost Image of Illumination Unit of Lithograp...
- Publication number 20250076195
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Kaifeng Xu
- G01 - MEASURING TESTING
Information Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
- Publication number 20250068087
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELEMENT OF AN AFM TOOL
- Publication number 20250067768
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Mustafa Ümit ARABUL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...
- Publication number 20250060679
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Davide BARBIERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...
- Publication number 20250060661
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...
- Publication number 20250060672
- Publication date Feb 20, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Shinichi HISADOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRIC METROLOGY TOOL FOR REFLECTIVE WAVEGUIDE
- Publication number 20250053099
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE
- Publication number 20250053105
- Publication date Feb 13, 2025
- Nikon Corporation
- Donis G. FLAGELLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION
- Publication number 20250053098
- Publication date Feb 13, 2025
- KLA Corporation
- Zhengquan Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION
- Publication number 20250053097
- Publication date Feb 13, 2025
- Kui-Jun HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED ST...
- Publication number 20250054128
- Publication date Feb 13, 2025
- NOVA LTD
- Boaz BRILL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
- Publication number 20250044709
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Willem Louis VAN MIERLO
- G06 - COMPUTING CALCULATING COUNTING

Aberration measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor manufacturing apparatus and method thereof

Matching process controllers for improved matching of process

Alignment-overlay mark and method using the same

Exposure apparatus

Semiconductor device with grating structure

Overlay mark, overlay marking method and overlay measuring method

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Apparatus and method for property joint interpolation and prediction

Scatterometry overlay metrology with orthogonal fine-pitch segmenta...

Universal metrology file, protocol, and process for maskless lithog...

Determining hot spot ranking based on wafer measurement

Method for overlay error correction

Target for measuring a parameter of a lithographic process

Information processing apparatus and information processing method

Process window qualification modulation layouts

Scanning overlay metrology with high signal to noise ratio

Method of manufacturing a semiconductor device and apparatus for ma...

Computer-readable storage medium recording data structure for stori...

Machine learning on overlay management

Hollow-core photonic crystal fiber based broadband radiation generator

Inspection method and apparatus, lithographic apparatus, lithograph...

Metrology and process control for semiconductor manufacturing

Selection of measurement locations for patterning processes

Wafer registration and overlay measurement systems and related methods

Method for determining aberration sensitivity of patterns

Systems and methods for measurement of misregistration and ameliora...

Interferometer systems and methods for real time etch process compe...

Frequency-picked methodology for diffraction-based overlay measurement

Semiconductor marks and forming methods thereof

Method for determining a measurement recipe and associated apparatuses

Patents Applicationslast 30 patents

A SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...

FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR

METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...

METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY

MASK QUALITY MANAGEMENT SYSTEM

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM

MEASUREMENT OPTICAL SYSTEM FOR METROLOGY INSPECTION AND METHOD OF M...

COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...

Method for Monitoring Ghost Image of Illumination Unit of Lithograp...

MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM

ELEMENT OF AN AFM TOOL

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...

SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...

Pattern Measurement Device and Pattern Measurement Method

PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...

Flexible Measurement Models For Model Based Measurements Of Semicon...

ASYMMETRIC METROLOGY TOOL FOR REFLECTIVE WAVEGUIDE

SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION

MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION

METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED ST...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD AND APPARATUS TO DETERMINE OVERLAY