Aberration measurement

Industry

CPC
G03F7/706

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/706Aberration measurement

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for decision making in a semiconductor manufacturing process
- Patent number 12,204,252
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Arnaud Hubaux
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
- Patent number 12,204,254
- Issue date Jan 21, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning on overlay management
- Patent number 12,197,138
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for efficient high harmonic generation
- Patent number 12,196,688
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining post bonding overlay
- Patent number 12,197,137
- Issue date Jan 14, 2025
- KLA Corporation
- Franz Zach
- G01 - MEASURING TESTING
Information Patent Grant
Method and structures for acoustic wave overlay error determination
- Patent number 12,189,304
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 12,189,308
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source generation apparatus, light source generating method,...
- Patent number 12,191,621
- Issue date Jan 7, 2025
- National Tsing Hua University
- Andrew Hing Cheong Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of surface topography measurement for lithography
- Patent number 12,189,306
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G01 - MEASURING TESTING
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device
- Patent number 12,191,182
- Issue date Jan 7, 2025
- United Microelectronics Corp.
- Nuo Wei Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus and computer program
- Patent number 12,189,305
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV light generation apparatus, electronic device manufacturing met...
- Patent number 12,185,449
- Issue date Dec 31, 2024
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Estimating in-die overlay with tool induced shift correction
- Patent number 12,181,271
- Issue date Dec 31, 2024
- KLA Corporation
- Min-Yeong Moon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam system and overlay misalignment measurement m...
- Patent number 12,183,541
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilize machine learning in selecting high quality averaged SEM ima...
- Patent number 12,182,983
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Chen Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor devices
- Patent number 12,181,802
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Minchul Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,174,529
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wei-Chung Hu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,365
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,364
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY CALIBRATION METHOD
- Publication number 20250021021
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS
- Publication number 20250021020
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Patrick Philipp HELFENSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...
- Publication number 20250014164
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANUFACTURING METHOD OF OVERLAY MARK AND OVERLAY MEASUREMENT METHOD
- Publication number 20250013157
- Publication date Jan 9, 2025
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
- Publication number 20250013158
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE SEPARATION FROM METROLOGY DATA
- Publication number 20250004385
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Marc Johannes NOOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYBRID METROLOGY METHOD AND SYSTEM
- Publication number 20250003882
- Publication date Jan 2, 2025
- NOVA LTD
- GILAD BARAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED CROSS SECTIONAL FEATURES MEASUREMENT METHODOLOGY
- Publication number 20250003742
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Manoj Kumar Dayyala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED METROLOGY FOR SEMICONDUCTOR SPECIMENS
- Publication number 20250004386
- Publication date Jan 2, 2025
- APPLIED MATERIALS ISRAEL LTD.
- Ilan BEN-HARUSH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET L...
- Publication number 20250004387
- Publication date Jan 2, 2025
- Intel Corporation
- Yongbae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
- Publication number 20240427216
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Sebastian Thomas BAUERSCHMIDT
- G01 - MEASURING TESTING
Information Patent Application
GRATING-OVER-GRATING OVERLAY MEASUREMENT WITH PARALLEL COLOR PER LAYER
- Publication number 20240427252
- Publication date Dec 26, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
- Publication number 20240427253
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20240419086
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AUGMENTED DATA TO TRAIN MACHINE LEARNING MODELS TO PRESE...
- Publication number 20240420025
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Jiaxing REN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...
- Publication number 20240405100
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Sheng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
- Publication number 20240402616
- Publication date Dec 5, 2024
- City University of Hong Kong
- Yubin Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING LEARNING MODEL FOR PREDICTING SEMICONDUCTOR D...
- Publication number 20240402619
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Minkyu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Aberration measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV microscope

In-situ lithography pattern enhancement with localized stress treat...

Method and apparatus for inspection and metrology

Optical mode optimization for wafer inspection

Method for decision making in a semiconductor manufacturing process

Multi-layered moiré targets and methods for using the same in measu...

Machine learning on overlay management

Lithography measurement machine and operating method thereof

Apparatus and method for process-window characterization

Method of determining control parameters of a device manufacturing...

Method and apparatus for efficient high harmonic generation

System and method for determining post bonding overlay

Method and structures for acoustic wave overlay error determination

Method for adjusting a target feature in a model of a patterning pr...

Metrology method and associated metrology and lithographic apparatuses

Light source generation apparatus, light source generating method,...

Method and system of surface topography measurement for lithography

Metrology data correction using image quality metric

Semiconductor device

Metrology method and apparatus and computer program

Computational metrology

EUV light generation apparatus, electronic device manufacturing met...

Estimating in-die overlay with tool induced shift correction

Charged particle beam system and overlay misalignment measurement m...

Utilize machine learning in selecting high quality averaged SEM ima...

Semiconductor devices

Method for manufacturing semiconductor device

Pattern measurement device and pattern measurement method

Computer-readable storage medium recording data structure for stori...

Computer-readable storage medium recording data structure for stori...

Patents Applicationslast 30 patents

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

METROLOGY CALIBRATION METHOD

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...

MANUFACTURING METHOD OF OVERLAY MARK AND OVERLAY MEASUREMENT METHOD

SURROUNDING PATTERN AND PROCESS AWARE METROLOGY

SOURCE SEPARATION FROM METROLOGY DATA

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

HYBRID METROLOGY METHOD AND SYSTEM

ENHANCED CROSS SECTIONAL FEATURES MEASUREMENT METHODOLOGY

MACHINE LEARNING BASED METROLOGY FOR SEMICONDUCTOR SPECIMENS

CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET L...

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR

GRATING-OVER-GRATING OVERLAY MEASUREMENT WITH PARALLEL COLOR PER LAYER

OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS

Determination of Imaging Transfer Function of a Charged-Particle Ex...

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

GENERATING AUGMENTED DATA TO TRAIN MACHINE LEARNING MODELS TO PRESE...

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

PHOTODETECTOR

INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY

METHOD FOR GENERATING LEARNING MODEL FOR PREDICTING SEMICONDUCTOR D...