Aberration measurement

Industry

CPC
G03F7/706

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/706Aberration measurement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Wafer processing apparatus
- Patent number 12,368,065
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Seungbeom Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hybrid metrology method and system
- Patent number 12,366,533
- Issue date Jul 22, 2025
- Gilad Barak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation source
- Patent number 12,366,810
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fiber bundle based optical spot size selector
- Patent number 12,360,463
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ivan Maleev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology system and method
- Patent number 12,360,462
- Issue date Jul 15, 2025
- Nova Ltd.
- Gilad Barak
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for qualifying a mask of a lithography system
- Patent number 12,353,126
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,353,140
- Issue date Jul 8, 2025
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for determining feature contribution to perfor...
- Patent number 12,353,967
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Vahid Bastani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stress and overlay management for semiconductor processing
- Patent number 12,354,973
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Pradeep K. Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 12,346,031
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Fei Liu
- G01 - MEASURING TESTING
Information Patent Grant
Ellipsometer and apparatus for inspecting semiconductor device incl...
- Patent number 12,345,626
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Yasuhiro Hidaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, lithographic apparatus and method
- Patent number 12,346,032
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Rob Johan Theodoor Rutten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for thermo-mechanical control of a heat sensitive element an...
- Patent number 12,339,592
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Victor Sebastiaan Dolk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining metrics for a portion of a pattern on a substrate
- Patent number 12,339,591
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Jiao Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High force low voltage piezoelectric micromirror actuator
- Patent number 12,339,588
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G02 - OPTICS
Information Patent Grant
Lithographic patterning method and system therefore
- Patent number 12,332,574
- Issue date Jun 17, 2025
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Diederik Jan Maas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating broadband radiation and associated broadband...
- Patent number 12,332,541
- Issue date Jun 17, 2025
- ASML Netherlands B.V.
- Yongfeng Ni
- G02 - OPTICS
Information Patent Grant
System for automatic diagnostics and monitoring of semiconductor de...
- Patent number 12,332,182
- Issue date Jun 17, 2025
- KLA Corporation
- David W. Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining defectiveness of pattern based on after deve...
- Patent number 12,332,573
- Issue date Jun 17, 2025
- ASML Netherlands B.V.
- Marleen Kooiman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dose mapper method
- Patent number 12,326,664
- Issue date Jun 10, 2025
- Shanghai Huali Integrated Circuit Corporation
- Shuo Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum meta-device for ultrasensitive displacement metrology
- Patent number 12,326,665
- Issue date Jun 10, 2025
- City University of Hong Kong
- Yubin Fan
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology system, and intensity imbalance m...
- Patent number 12,326,670
- Issue date Jun 10, 2025
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination apparatus and associated metrology and lithographic ap...
- Patent number 12,326,669
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 12,322,660
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large die wafer, large die and method of forming the same
- Patent number 12,322,707
- Issue date Jun 3, 2025
- Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Sheng Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of generating a set of illumination patterns for...
- Patent number 12,321,103
- Issue date Jun 3, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for applying a deposition model in a semiconductor manufactu...
- Patent number 12,321,101
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20250237943
- Publication date Jul 24, 2025
- Canon Kabushiki Kaisha
- MASAKI ISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20250237965
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...
- Publication number 20250239494
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- Christian Lutzweiler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK AND METHOD
- Publication number 20250237966
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chung CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...
- Publication number 20250237967
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marleen KOOIMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS
- Publication number 20250231494
- Publication date Jul 17, 2025
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20250231499
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Changsik YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR OBTAINING OPTICAL CRITICAL DIMENSION
- Publication number 20250231495
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YUN-CHUNG TENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MEASURING AT LEAST ONE TARGET ON A SUBSTRATE AND ASSOCI...
- Publication number 20250231496
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SMART EQUIPMENT FRONT END MODULE METROLOGY
- Publication number 20250231500
- Publication date Jul 17, 2025
- Nanoverse Technologies Ltd
- Jeff Albelo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN MEASUREMENT METHOD AND PATTERN MEASUREMENT APPARATUS
- Publication number 20250231497
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Ji Yong KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING MARK STRUCTU...
- Publication number 20250233079
- Publication date Jul 17, 2025
- NANYA TECHNOLOGY CORPORATION
- CHIH-HSUAN YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING METHOD AND METROLOGY DEVICE
- Publication number 20250231498
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES
- Publication number 20250224685
- Publication date Jul 10, 2025
- ASMLNETHERLANDS B.V.
- Jeroen VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE AND OPERATION METHOD THEREOF
- Publication number 20250224715
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Minseok KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...
- Publication number 20250224684
- Publication date Jul 10, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MEASUREMENT METHOD
- Publication number 20250225674
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Inho SHIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATION METHOD, SUBSTRATE PROCESSING APPARATUS, MANUFACTURING ME...
- Publication number 20250216310
- Publication date Jul 3, 2025
- Canon Kabushiki Kaisha
- Masami Yonekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250208521
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Stefan LIPPOLDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...
- Publication number 20250208520
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS
- Publication number 20250208522
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...
- Publication number 20250208499
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY AND ASSOCIATED DEVICES
- Publication number 20250199419
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
- Publication number 20250199521
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR
- Publication number 20250199418
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Edouard André Marie Louis DURIAU
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH
- Publication number 20250189902
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Byeongseon PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...
- Publication number 20250189903
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Komei HIRAHARA
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...
- Publication number 20250189901
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...
- Publication number 20250189904
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
- Publication number 20250189899
- Publication date Jun 12, 2025
- Canon Kabushiki Kaisha
- Qi Ni
- B82 - NANO-TECHNOLOGY

Aberration measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Wafer processing apparatus

Hybrid metrology method and system

Radiation source

Fiber bundle based optical spot size selector

Optical metrology system and method

Method and device for qualifying a mask of a lithography system

Information processing apparatus and information processing method

Method and apparatus for determining feature contribution to perfor...

Stress and overlay management for semiconductor processing

Methods and patterning devices and apparatuses for measuring focus...

Ellipsometer and apparatus for inspecting semiconductor device incl...

System, lithographic apparatus and method

Method for thermo-mechanical control of a heat sensitive element an...

Determining metrics for a portion of a pattern on a substrate

High force low voltage piezoelectric micromirror actuator

Lithographic patterning method and system therefore

Method for generating broadband radiation and associated broadband...

System for automatic diagnostics and monitoring of semiconductor de...

Method for determining defectiveness of pattern based on after deve...

Dose mapper method

Quantum meta-device for ultrasensitive displacement metrology

Lithographic apparatus, metrology system, and intensity imbalance m...

Illumination apparatus and associated metrology and lithographic ap...

Method and apparatus to determine a patterning process parameter

Large die wafer, large die and method of forming the same

System and method of generating a set of illumination patterns for...

Method for applying a deposition model in a semiconductor manufactu...

Method for generating EUV radiation

Inspection system, lithographic apparatus, and inspection method

Patents Applicationslast 30 patents

IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...

SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...

ALIGNMENT MARK AND METHOD

METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...

COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

METHOD AND SYSTEM FOR OBTAINING OPTICAL CRITICAL DIMENSION

METHODS FOR MEASURING AT LEAST ONE TARGET ON A SUBSTRATE AND ASSOCI...

SMART EQUIPMENT FRONT END MODULE METROLOGY

PATTERN MEASUREMENT METHOD AND PATTERN MEASUREMENT APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING MARK STRUCTU...

IMAGING METHOD AND METROLOGY DEVICE

METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES

ELECTRONIC DEVICE AND OPERATION METHOD THEREOF

ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...

SEMICONDUCTOR MEASUREMENT METHOD

EVALUATION METHOD, SUBSTRATE PROCESSING APPARATUS, MANUFACTURING ME...

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...

ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS

METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...

METHODS OF METROLOGY AND ASSOCIATED DEVICES

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS

MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR

METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH

INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...

CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...

METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...

APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER