Aberration measurement

Industry

CPC
G03F7/706

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/706Aberration measurement

Industries

Patents Grantslast 30 patents

Information Patent Grant
Large die wafer, large die and method of forming the same
- Patent number 12,322,707
- Issue date Jun 3, 2025
- Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Sheng Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 12,322,660
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for applying a deposition model in a semiconductor manufactu...
- Patent number 12,321,101
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of generating a set of illumination patterns for...
- Patent number 12,321,103
- Issue date Jun 3, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Determining lithographic matching performance
- Patent number 12,306,545
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Yingchao Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology tool with position control of projection system
- Patent number 12,306,544
- Issue date May 20, 2025
- ASML Holding N.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay control based on a semiconductor device pattern,...
- Patent number 12,306,546
- Issue date May 20, 2025
- PROSEMI CO., LTD.
- Tian-Xing Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring stitching overlay accuracy of image sensor sti...
- Patent number 12,306,547
- Issue date May 20, 2025
- Shanghai Huali Microelectronics Corporation
- Yu Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning system, a lithographic apparatus, an absolute position...
- Patent number 12,306,548
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Illumination correction apparatus
- Patent number 12,298,671
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation apparatus, computer-readable storage medium, evaluation...
- Patent number 12,293,505
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Fuma Kizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment mark and method
- Patent number 12,292,694
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, substrate processing apparatus, manufacturing me...
- Patent number 12,292,368
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Masami Yonekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, and methods thereof
- Patent number 12,287,591
- Issue date Apr 29, 2025
- ASML Netherlands B.V. & ASML Holding N.V.
- Arjan Johannes Anton Beukman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field microscope
- Patent number 12,287,470
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Polarization selection metrology system, lithographic apparatus, an...
- Patent number 12,287,585
- Issue date Apr 29, 2025
- ASML Holding N.V.
- Douglas C. Cappelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a production aerial image of an object to be...
- Patent number 12,288,272
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Martin Dietzel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 12,287,584
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology system and lithographic system
- Patent number 12,282,263
- Issue date Apr 22, 2025
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full-chip cell critical dimension correction method and method of m...
- Patent number 12,282,249
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calculating a spatial map associated with...
- Patent number 12,276,918
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Mauritius Gerardus Elisabeth Schneiders
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process recipe, method and system for generating same, and semicond...
- Patent number 12,276,965
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shaowen Qiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern height metrology using an e-beam system
- Patent number 12,278,086
- Issue date Apr 15, 2025
- Imec VZW
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a semiconductor manufacturing process
- Patent number 12,276,919
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for avoiding damage to overlay metrology mark
- Patent number 12,276,920
- Issue date Apr 15, 2025
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate comprising a target arrangement, and associated at least...
- Patent number 12,276,921
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20250181941
- Publication date Jun 5, 2025
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for evaluating at least one marker on a physical object for...
- Publication number 20250172882
- Publication date May 29, 2025
- ROBERT BOSCH GmbH
- Cedric Donie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20250172881
- Publication date May 29, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE AND METHOD FOR OPERATING THE SAME
- Publication number 20250172520
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...
- Publication number 20250164894
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Sunghoon Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20250155824
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250155817
- Publication date May 15, 2025
- SEMES CO., LTD.
- Ki Sang EUM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INSPECTION DEVICE
- Publication number 20250155380
- Publication date May 15, 2025
- Carl Zeiss SMT GMBH
- Maximilian Henning
- G01 - MEASURING TESTING
Information Patent Application
MACHINE VISION SYSTEM UTILIZING AUTOFOCUS AND INSPECTION PROCESSES
- Publication number 20250146949
- Publication date May 8, 2025
- MITUTOYO CORPORATION
- Paul Gerard GLADNICK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
- Publication number 20250147429
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20250147435
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250147437
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20250147428
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...
- Publication number 20250147433
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Tsung-Pao FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology in the Presence of CMOS Under Array (CUA) Structures Util...
- Publication number 20250147434
- Publication date May 8, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY
- Publication number 20250147436
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT
- Publication number 20250147430
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chih HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250147431
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...
- Publication number 20250147432
- Publication date May 8, 2025
- Resonac Corporation
- Tetsuya KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20250138433
- Publication date May 1, 2025
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20250138436
- Publication date May 1, 2025
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASSIVE MEASUREMENT SAMPLING USING MULTIPLE CHUCKS AND OPTICAL COLUMNS
- Publication number 20250138435
- Publication date May 1, 2025
- KLA Corporation
- Jonathan Madsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
YIELD IMPROVEMENTS IN STACKED PACKAGING
- Publication number 20250140615
- Publication date May 1, 2025
- KLA Corporation
- Xuewen Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
- Publication number 20250139814
- Publication date May 1, 2025
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTENSITY MEASUREMENTS USING OFF-AXIS ILLUMINATION
- Publication number 20250130512
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250131552
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Shahrzad NAGHIBZADEH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...
- Publication number 20250123569
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Yau Loong CHONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING ON OVERLAY MANAGEMENT
- Publication number 20250123572
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Cheng LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME
- Publication number 20250123570
- Publication date Apr 17, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Wei WANG
- G01 - MEASURING TESTING

Aberration measurement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Large die wafer, large die and method of forming the same

Method and apparatus to determine a patterning process parameter

Method for applying a deposition model in a semiconductor manufactu...

System and method of generating a set of illumination patterns for...

Method for generating EUV radiation

Inspection system, lithographic apparatus, and inspection method

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Determining lithographic matching performance

Metrology tool with position control of projection system

Method for overlay control based on a semiconductor device pattern,...

Method for measuring stitching overlay accuracy of image sensor sti...

Positioning system, a lithographic apparatus, an absolute position...

Illumination correction apparatus

Evaluation apparatus, computer-readable storage medium, evaluation...

Alignment mark and method

Evaluation method, substrate processing apparatus, manufacturing me...

Method for controlling a lithographic apparatus and associated appa...

Lithographic apparatus, metrology systems, and methods thereof

Dark field microscope

Polarization selection metrology system, lithographic apparatus, an...

Method for determining a production aerial image of an object to be...

Methods and apparatus for obtaining diagnostic information relating...

Metrology system and lithographic system

Full-chip cell critical dimension correction method and method of m...

Method and apparatus for calculating a spatial map associated with...

Process recipe, method and system for generating same, and semicond...

Pattern height metrology using an e-beam system

Method for controlling a semiconductor manufacturing process

Method for avoiding damage to overlay metrology mark

Substrate comprising a target arrangement, and associated at least...

Patents Applicationslast 30 patents

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

Method for evaluating at least one marker on a physical object for...

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

DETECTION DEVICE AND METHOD FOR OPERATING THE SAME

METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS

SUBSTRATE TREATING APPARATUS

OPTICAL INSPECTION DEVICE

MACHINE VISION SYSTEM UTILIZING AUTOFOCUS AND INSPECTION PROCESSES

DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD

METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...

Metrology in the Presence of CMOS Under Array (CUA) Structures Util...

METHODS OF METROLOGY

FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

METROLOGY METHOD AND DEVICE

MASSIVE MEASUREMENT SAMPLING USING MULTIPLE CHUCKS AND OPTICAL COLUMNS

YIELD IMPROVEMENTS IN STACKED PACKAGING

OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT

INTENSITY MEASUREMENTS USING OFF-AXIS ILLUMINATION

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...

MACHINE LEARNING ON OVERLAY MANAGEMENT

SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME