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G03F1/54
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Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Current Industry
G03F1/54
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Patents Grants
last 30 patents
Information
Patent Grant
Photomask and method of fabricating a photomask
Patent number
11,982,936
Issue date
May 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for making photolithography mask plate
Patent number
11,947,255
Issue date
Apr 2, 2024
Tsinghua University
Mo Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank and reflective mask
Patent number
11,914,283
Issue date
Feb 27, 2024
AGC Inc.
Hiroyoshi Tanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
Patent number
11,892,768
Issue date
Feb 6, 2024
Hoya Corporation
Mizuki Kataoka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask defect prevention
Patent number
11,860,530
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Ta Lu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
Patent number
11,860,532
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hsin-Chang Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Lithography mask with a black border regions and method of fabricat...
Patent number
11,852,966
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chin-Hsiang Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV photomask
Patent number
11,846,881
Issue date
Dec 19, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Ching-Huang Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reflective mask blank for EUV exposure, and reflective mask
Patent number
11,835,852
Issue date
Dec 5, 2023
AGC Inc.
Hiroyoshi Tanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV photo masks and manufacturing method thereof
Patent number
11,829,062
Issue date
Nov 28, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Pei-Cheng Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
EUV lithography mask with a porous reflective multilayer structure
Patent number
11,809,075
Issue date
Nov 7, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chih-Tsung Shih
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
Patent number
11,789,355
Issue date
Oct 17, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank and reflective mask
Patent number
11,703,751
Issue date
Jul 18, 2023
AGC Inc.
Hiroshi Hanekawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of accelerated hazing of mask assembly
Patent number
11,703,752
Issue date
Jul 18, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Wu-Hung Ko
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Interconnection structure fabrication using grayscale lithography
Patent number
11,664,303
Issue date
May 30, 2023
Intel Corporation
Johanna Swan
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask and method of forming the same
Patent number
11,662,656
Issue date
May 30, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Chih-Chiang Tu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet mask absorber materials
Patent number
11,630,385
Issue date
Apr 18, 2023
Applied Materials, Inc.
Shuwei Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
Patent number
11,630,388
Issue date
Apr 18, 2023
Hoya Corporation
Osamu Nozawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
Patent number
11,624,979
Issue date
Apr 11, 2023
Hoya Corporation
Kazutake Taniguchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV photo masks and manufacturing method thereof
Patent number
11,619,875
Issue date
Apr 4, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
Patent number
11,543,744
Issue date
Jan 3, 2023
Hoya Corporation
Hiroaki Shishido
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blanks and methods for depositing layers on mask blank
Patent number
11,531,262
Issue date
Dec 20, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask having a plurality of shielding layers
Patent number
11,531,263
Issue date
Dec 20, 2022
Taiwan Semiconductor Manufacturing Company, Ltd
Chih-Chiang Tu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Patterning material film stack with hard mask layer configured to s...
Patent number
11,500,293
Issue date
Nov 15, 2022
International Business Machines Corporation
Ekmini Anuja De Silva
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System and method of measuring refractive index of EUV mask absorber
Patent number
11,467,499
Issue date
Oct 11, 2022
Applied Materials, Inc.
Wen Xiao
G01 - MEASURING TESTING
Information
Patent Grant
EUV mask blank absorber defect reduction
Patent number
11,454,876
Issue date
Sep 27, 2022
Applied Materials, Inc.
Binni Varghese
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask and method of fabricating a photomask
Patent number
11,435,660
Issue date
Sep 6, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask including fiducial mark and method of making semiconducto...
Patent number
11,422,466
Issue date
Aug 23, 2022
Taiwan Semiconductor Manufacturing Company, Ltd
Hsin-Chang Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask defect prevention
Patent number
11,402,743
Issue date
Aug 2, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Ta Lu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask for EUV lithography and method of manufacturing the same
Patent number
11,402,745
Issue date
Aug 2, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
Publication number
20240142866
Publication date
May 2, 2024
HOYA CORPORATION
Masanori NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
Publication number
20240094625
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
Publication number
20240085779
Publication date
Mar 14, 2024
Carl Zeiss SMT GMBH
Renzo Capelli
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
Publication number
20240077797
Publication date
Mar 7, 2024
Shin-Etsu Chemical Co., Ltd.
Takuro KOSAKA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING...
Publication number
20240069430
Publication date
Feb 29, 2024
KIOXIA Corporation
Naoki SATO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER
Publication number
20240045318
Publication date
Feb 8, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240045320
Publication date
Feb 8, 2024
AGC Inc.
Takuma KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...
Publication number
20240027890
Publication date
Jan 25, 2024
Samsung Electronics Co., Ltd.
Hyungjong Bae
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
Publication number
20230384663
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chih-Tsung Shih
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV PHOTOMASK AND RELATED METHODS
Publication number
20230386838
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chi-Hung LIAO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Publication number
20230375910
Publication date
Nov 23, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Pei-Cheng Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20230375908
Publication date
Nov 23, 2023
TOPPAN PHOTOMASK CO., LTD.
Kazuaki MATSUI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
Publication number
20230367200
Publication date
Nov 16, 2023
SK enpulse Co., Ltd.
Seong Yoon KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask Defect Prevention
Publication number
20230367197
Publication date
Nov 16, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chi-Ta Lu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
Publication number
20230359115
Publication date
Nov 9, 2023
Taiwan Semiconductor Manufacturing company Ltd.
Yun-Yue LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
Publication number
20230333459
Publication date
Oct 19, 2023
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
Publication number
20230314929
Publication date
Oct 5, 2023
HOYA CORPORATION
Hitoshi MAEDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTION-TYPE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTION-TYPE MAS...
Publication number
20230288794
Publication date
Sep 14, 2023
AGC Inc.
Daijiro AKAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND M...
Publication number
20230280648
Publication date
Sep 7, 2023
Shin-Etsu Chemical Co., Ltd.
Naoki Kobayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEM, METHOD AND PROGRAM PRODUCT FOR IMPROVING ACCURACY OF PHOTOM...
Publication number
20230259016
Publication date
Aug 17, 2023
PHOTRONICS, INC.
Christopher Progler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK AND METHOD OF FORMING THE SAME
Publication number
20230259014
Publication date
Aug 17, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Chih-Chiang Tu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Publication number
20230251563
Publication date
Aug 10, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK, AND METHOD FOR MA...
Publication number
20230185181
Publication date
Jun 15, 2023
AGC Inc.
Hiroyoshi TANABE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
Publication number
20230176467
Publication date
Jun 8, 2023
TOPPAN PHOTOMASK CO., LTD.
Kenjiro ICHIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR FABRICATING AN OPTICAL WAVEGUIDE AND A DISPLAY DEVICE A...
Publication number
20230152690
Publication date
May 18, 2023
INTERFACE TECHNOLOGY (CHENGDU) CO., LTD.
HUNG-HSIN SHIH
G02 - OPTICS
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20230147988
Publication date
May 11, 2023
TOPPAN INC.
Hideaki NAKANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
Publication number
20230133304
Publication date
May 4, 2023
HOYA CORPORATION
Kota SUZUKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
Publication number
20230132780
Publication date
May 4, 2023
HOYA CORPORATION
Tatsuya SASAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANKS AND METHODS FOR DEPOSITING LAYERS ON MASK BLANK
Publication number
20230121303
Publication date
Apr 20, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
Publication number
20230104571
Publication date
Apr 6, 2023
Shin-Etsu Chemical Co., Ltd.
Takuro KOSAKA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY