Acting in response to an ongoing measurement without interruption of processing

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements

Current Industry

H01L22/26Acting in response to an ongoing measurement without interruption of processing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Chamber component condition estimation using substrate measurements
- Patent number 12,216,455
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Chunlei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process tool for analyzing bonded workpiece interface
- Patent number 12,205,855
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hau-Yi Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle having real time inspection functions
- Patent number 12,191,175
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kai-Lin Chuang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Laser processing apparatus and method of correcting converged spot...
- Patent number 12,191,216
- Issue date Jan 7, 2025
- Disco Corporation
- Kentaro Odanaka
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Variable graduated capacitor structure and methods for forming the...
- Patent number 12,191,247
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Jheng-Hong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for ensuring planarity of a semiconductor wafer d...
- Patent number 12,180,592
- Issue date Dec 31, 2024
- EPILUVAC AB
- Roger Nilsson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implanting system for fabricating semiconductor device structure
- Patent number 12,183,643
- Issue date Dec 31, 2024
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Film-thickness measuring method, method of detecting notch portion,...
- Patent number 12,183,642
- Issue date Dec 31, 2024
- Ebara Corporation
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry and polishing method
- Patent number 12,173,219
- Issue date Dec 24, 2024
- Resonac Corporation
- Satoyuki Nomura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Deposition system and method
- Patent number 12,176,253
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for correction of impact of wafer tilt on misre...
- Patent number 12,170,215
- Issue date Dec 17, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 12,165,937
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor substrate processing apparatus and semiconductor subs...
- Patent number 12,165,933
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Inkeun Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable wafer chuck
- Patent number 12,165,898
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point control in etching processes
- Patent number 12,165,936
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui Fu Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing monitoring
- Patent number 12,165,934
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zuoming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling chemical concentration in electrolyte
- Patent number 12,157,952
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Chang Huang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Shift control method in manufacture of semiconductor device
- Patent number 12,148,733
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing control using a measured size distribution of...
- Patent number 12,148,674
- Issue date Nov 19, 2024
- Semes Co., Ltd.
- Jung Suk Goh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 12,144,167
- Issue date Nov 12, 2024
- Samsung Electronics Co., Ltd.
- Jin A Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Staircase etch control in forming three-dimensional memory device
- Patent number 12,142,575
- Issue date Nov 12, 2024
- Yangtza Memory Technologies Co., Ltd.
- Zhenyu Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop detection structure and etch stop detection method
- Patent number 12,142,519
- Issue date Nov 12, 2024
- United Microelectronics Corp.
- Runshun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for training neural network for use in in-situ monitoring...
- Patent number 12,136,574
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Sonar sensor in processing chamber
- Patent number 12,136,556
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lee-Chuan Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 12,131,923
- Issue date Oct 29, 2024
- Ebara Corporation
- Yuta Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,131,964
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,131,962
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuang-Wei Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DEFORMATION CONTROL OF MANUFACTURING DEVICES USING FRONT-SIDE IRRAD...
- Publication number 20250054757
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Pradeep Kumar Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046658
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki KARASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROWTH CHAMBER SMART SEASONING
- Publication number 20250038053
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20250040127
- Publication date Jan 30, 2025
- Samsung Electronics Co., Ltd.
- JIN A KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ANALYZING UNIFORMITY, AND RELATED APPARATUS AND SYSTEMS,...
- Publication number 20250029850
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Kim Ramkumar VELLORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250029852
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF THINNING WAFER SUBSTRATE
- Publication number 20250018486
- Publication date Jan 16, 2025
- COMPTAKE TECHNOLOGY INC.
- YAO-GUANG YANG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...
- Publication number 20250014932
- Publication date Jan 9, 2025
- HUAYING RESEARCH CO., LTD
- Sophia Ziying WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PACKAGING WARPAGE CONTROL
- Publication number 20250006511
- Publication date Jan 2, 2025
- NXP USA, Inc.
- Zhiwei Gong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUBSTRATE PROCESSING, AN...
- Publication number 20240429075
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Ryo ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICS IN ELECTRONICS TESTER
- Publication number 20240426938
- Publication date Dec 26, 2024
- Aehr Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICES IN AN ELECTRONICS...
- Publication number 20240426939
- Publication date Dec 26, 2024
- Aehr Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY, SCREENING METHOD, AND POLISHING METHOD
- Publication number 20240425737
- Publication date Dec 26, 2024
- Resonac Corporation
- Satoyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
- Publication number 20240429077
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
- Publication number 20240420975
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID V...
- Publication number 20240421009
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY OF A...
- Publication number 20240420974
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING PROCESSING APPARATUS AND METHOD FOR FORMING COATING FILM
- Publication number 20240419077
- Publication date Dec 19, 2024
- KIOXIA Corporation
- Tomoya AKAZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-SITU FILM GROWTH RATE MONITORING APPARATUS, SYSTEMS, AND METHODS...
- Publication number 20240410078
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING...
- Publication number 20240395584
- Publication date Nov 28, 2024
- GlobalWafers Japan Co., Ltd.
- Takuya KAKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODELLING AND PREDICTION OF VIRTUAL QUALITY CONTROL DATA INCORPORAT...
- Publication number 20240387295
- Publication date Nov 21, 2024
- SANDISK TECHNOLOGIES, INC.
- Tsuyoshi Sendoda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND FILM THICKNESS MEASURING METHOD
- Publication number 20240387301
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu KYOKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS TOOL FOR ANALYZING BONDED WORKPIECE INTERFACE
- Publication number 20240379468
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hau-Yi Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20240379469
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240379471
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuang-Wei CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
END POINT CONTROL IN ETCHING PROCESSES
- Publication number 20240379470
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui Fu Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIFT CONTROL METHOD IN MANUFACTURE OF SEMICONDUCTOR DEVICE
- Publication number 20240379617
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR MEASURING SEMICONDUCTOR DEVICES
- Publication number 20240371706
- Publication date Nov 7, 2024
- Lodestar Licensing Group LLC
- Anilkumar Chandolu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-LINE WAFER EDGE SEALING MONITORING SYSTEM AND METHODS OF OPERATION
- Publication number 20240371666
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hau-Yi HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SONAR SENSOR IN PROCESSING CHAMBER
- Publication number 20240371668
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lee-Chuan Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Acting in response to an ongoing measurement without interruption of processing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chamber component condition estimation using substrate measurements

Deposition system and method

Process tool for analyzing bonded workpiece interface

Nozzle having real time inspection functions

Laser processing apparatus and method of correcting converged spot...

Variable graduated capacitor structure and methods for forming the...

Device and method for ensuring planarity of a semiconductor wafer d...

Implanting system for fabricating semiconductor device structure

Film-thickness measuring method, method of detecting notch portion,...

Slurry and polishing method

Deposition system and method

Plasma treatment apparatus, a method of monitoring a process of man...

Systems and methods for correction of impact of wafer tilt on misre...

Optical diagnostics of semiconductor process using hyperspectral im...

Semiconductor substrate processing apparatus and semiconductor subs...

Adjustable wafer chuck

End point control in etching processes

Substrate processing monitoring

Physical vapor deposition process apparatus and method of optimizin...

Method of controlling chemical concentration in electrolyte

Shift control method in manufacture of semiconductor device

Substrate processing control using a measured size distribution of...

Semiconductor device and method of fabricating the same

Staircase etch control in forming three-dimensional memory device

Etch stop detection structure and etch stop detection method

Technique for training neural network for use in in-situ monitoring...

Sonar sensor in processing chamber

Polishing apparatus and polishing method

Plasma processing apparatus and plasma processing method

Semiconductor processing tool and methods of operation

Patents Applicationslast 30 patents

DEFORMATION CONTROL OF MANUFACTURING DEVICES USING FRONT-SIDE IRRAD...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

GROWTH CHAMBER SMART SEASONING

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

METHODS OF ANALYZING UNIFORMITY, AND RELATED APPARATUS AND SYSTEMS,...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SYSTEM AND METHOD OF THINNING WAFER SUBSTRATE

SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...

SEMICONDUCTOR DEVICE PACKAGING WARPAGE CONTROL

SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUBSTRATE PROCESSING, AN...

METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICS IN ELECTRONICS TESTER

METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICES IN AN ELECTRONICS...

SLURRY, SCREENING METHOD, AND POLISHING METHOD

LOW OPEN AREA AND COUPON ENDPOINT DETECTION

LOW OPEN AREA AND COUPON ENDPOINT DETECTION

SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID V...

SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY OF A...

COATING PROCESSING APPARATUS AND METHOD FOR FORMING COATING FILM

IN-SITU FILM GROWTH RATE MONITORING APPARATUS, SYSTEMS, AND METHODS...

HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING...

MODELLING AND PREDICTION OF VIRTUAL QUALITY CONTROL DATA INCORPORAT...

SUBSTRATE PROCESSING SYSTEM AND FILM THICKNESS MEASURING METHOD

PROCESS TOOL FOR ANALYZING BONDED WORKPIECE INTERFACE

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

END POINT CONTROL IN ETCHING PROCESSES

SHIFT CONTROL METHOD IN MANUFACTURE OF SEMICONDUCTOR DEVICE

METHODS AND SYSTEMS FOR MEASURING SEMICONDUCTOR DEVICES

IN-LINE WAFER EDGE SEALING MONITORING SYSTEM AND METHODS OF OPERATION

SONAR SENSOR IN PROCESSING CHAMBER