Adaptive optics

Industry

CPC
G03F7/70266

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70266Adaptive optics

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermo-mechanical actuator
- Patent number 12,117,739
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Bas Jansen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,085,862
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Matthew Ryan Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnification adjustable projection system using deformable lens pl...
- Patent number 12,078,936
- Issue date Sep 3, 2024
- Corning Incorporated
- Robert Dennis Grejda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,906,904
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 11,656,453
- Issue date May 23, 2023
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflective optical element, reflective optic...
- Patent number 11,372,334
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Markus Bauer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,360,393
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Ben Wylie-Van Eerd
- G02 - OPTICS
Information Patent Grant
System and method for overlay error reduction
- Patent number 11,287,746
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element for a radiation beam
- Patent number 11,237,491
- Issue date Feb 1, 2022
- ASML Netherlands B.V.
- Ramon Mark Hofstra
- G02 - OPTICS
Information Patent Grant
Mirror for a microlithographic projection exposure apparatus, and m...
- Patent number 11,187,990
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 11,181,826
- Issue date Nov 23, 2021
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and mirror and radiation source for a lithographi...
- Patent number 11,150,560
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,143,967
- Issue date Oct 12, 2021
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 11,112,543
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithographic method and apparatus
- Patent number 11,036,144
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Przemyslaw Aleksander Klosiewicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control equipment and control method of stepper
- Patent number 10,983,446
- Issue date Apr 20, 2021
- United Microelectronics Corp.
- Chih-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical manipulator, projection lens and projection exposure apparatus
- Patent number 10,976,667
- Issue date Apr 13, 2021
- Carl Zeiss SMT GmbH
- Eric Eva
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,908,509
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with actively adjustable metrology supp...
- Patent number 10,890,850
- Issue date Jan 12, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, projection optical system, exposure apparatus using...
- Patent number 10,884,236
- Issue date Jan 5, 2021
- Canon Kabushiki Kaisha
- Choshoku Sai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, and method
- Patent number 10,852,643
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Dirk Juergens
- G02 - OPTICS
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,761,429
- Issue date Sep 1, 2020
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 10,732,402
- Issue date Aug 4, 2020
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
THERMO-MECHANICAL ACTUATOR
- Publication number 20240402621
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Bas JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
- Publication number 20240288784
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Martin Martin von Hodenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFORMABLE MIRROR SYSTEM
- Publication number 20240280909
- Publication date Aug 22, 2024
- ASML NETHERLANDS B.V.
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
- G02 - OPTICS
Information Patent Application
CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LI...
- Publication number 20240201486
- Publication date Jun 20, 2024
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...
- Publication number 20240176249
- Publication date May 30, 2024
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...
- Publication number 20240142879
- Publication date May 2, 2024
- Canon Kabushiki Kaisha
- JUN MOIZUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...
- Publication number 20240142880
- Publication date May 2, 2024
- Canon Kabushiki Kaisha
- JINNAI WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS, METHOD FOR SETTING A TARGET DEFORMATION, AND LIT...
- Publication number 20240103381
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT...
- Publication number 20240085800
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
ILLUMINATION CORRECTION APPARATUS
- Publication number 20240069443
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR DEFORMING AN OPTICAL ELEMENT, AND PROJ...
- Publication number 20230393485
- Publication date Dec 7, 2023
- Carl Zeiss SMT GMBH
- Tim Hoffmann
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20230367227
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...
- Publication number 20230350312
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230305290
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
A METHOD AND APPARATUS FOR CALCULATING A SPATIAL MAP ASSOCIATED WIT...
- Publication number 20230273527
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Mauritius Gerardus Elisabeth SCHNEIDERS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...
- Publication number 20230228798
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229091
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229092
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...
- Publication number 20230229090
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Victor Sebastiaan Dolk
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...
- Publication number 20230176486
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...
- Publication number 20230130187
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY
- Publication number 20230088791
- Publication date Mar 23, 2023
- Carl Zeiss SMT GMBH
- Jan HORN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING DEFORMABLE LENS PL...
- Publication number 20230077090
- Publication date Mar 9, 2023
- Corning Incorporated
- Robert Dennis Grejda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230047921
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Michel Aliman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20220382166
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD
- Publication number 20220382165
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
- Publication number 20220317576
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Matthew Ryan Graham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMO-MECHANICAL ACTUATOR
- Publication number 20220236651
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Bas JANSEN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Adaptive optics

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for reproducing a target wavefront of an imaging optical pro...

Optical system and lithography apparatus

Thermo-mechanical actuator

Laser system for source material conditioning in an EUV light source

Magnification adjustable projection system using deformable lens pl...

Optical element having a coating for influencing heating radiation...

Wavefront optimization for tuning scanner based on performance matc...

Projection exposure method and projection lens with setting of the...

Mirror, in particular for a microlithographic projection exposure a...

Optical imaging arrangement with a piezoelectric device

Wavefront optimization for tuning scanner based on performance matc...

Method for producing a reflective optical element, reflective optic...

Mirror, in particular for a microlithographic projection exposure s...

System and method for overlay error reduction

Reflective optical element for a radiation beam

Mirror for a microlithographic projection exposure apparatus, and m...

Projection exposure method and projection exposure apparatus for mi...

Projection system and mirror and radiation source for a lithographi...

Optical lithography system for patterning semiconductor devices and...

Projection exposure method and projection lens with setting of the...

Optical element having a coating for influencing heating radiation...

Lithographic method and apparatus

Control equipment and control method of stepper

Optical manipulator, projection lens and projection exposure apparatus

Mirror, in particular for a microlithographic projection exposure a...

Optical imaging arrangement with actively adjustable metrology supp...

Optical device, projection optical system, exposure apparatus using...

Optical system, and method

Projection exposure method and projection exposure apparatus for mi...

Optical imaging arrangement with a piezoelectric device

Patents Applicationslast 30 patents

THERMO-MECHANICAL ACTUATOR

OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD

DEFORMABLE MIRROR SYSTEM

CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LI...

OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...

OPTICAL APPARATUS, METHOD FOR SETTING A TARGET DEFORMATION, AND LIT...

PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT...

ILLUMINATION CORRECTION APPARATUS

OPTICAL ASSEMBLY, METHOD FOR DEFORMING AN OPTICAL ELEMENT, AND PROJ...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

A METHOD AND APPARATUS FOR CALCULATING A SPATIAL MAP ASSOCIATED WIT...

METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...

OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...

MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY

MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING DEFORMABLE LENS PL...

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD

LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE

THERMO-MECHANICAL ACTUATOR